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(1) Xiumei Zhang, Haiyan Nan,Shaoqing Xiao*, Xi Wan, Xiaofeng Gu*, Aijun Du, Zhenhua Ni and Kostya (Ken) Ostrikov, Transition metal dichalcogenides bilayer single crystals by reverse-flow chemical vapor epitaxy, Nature Communications 2019, 10, 598.(影响因子12.353)
(2) X. M. Zhang, H. Y. Nan,S. Q. Xiao*, X. Wan, Z. H. Ni, X. F. Gu* and K. Ostrikov, Shape-uniform, High-quality Monolayer MoS2Crystals for Gate-tuneable Photoluminescence, ACS Applied Materials & Interfaces,2017, 9, 42121-42130(影响因子8.097)(中科院分区1区)
(3) S. Q. Xiao*,S. Xu* and K. Ostrikov*, Low-temperature Plasma Processing for Si Photovoltaics, Materials Science and Engineering R-Reports 2014, 78, 1(影响因子:24.480)(中科院分区1区)
(4) Haiyan Nan, Jie Jiang,Shaoqing Xiao*, Zhirong Chen, Zhongzhong Luo, Xiumei Zhang, Han Qi, Xiaofeng Gu, Xinran Wang and Zhenhua Ni*, Soft Hydrogen plasma induced phase transition in monolayer and few-layer MoTe2, Nanotechnology 2019, 30, 034004.(影响因子:3.404)(中科院分区二区)
(5) Xiaoya Wang, Haiyan Nan*, Wei Dai, Qin Lin, Zheng Liu, Xiaofeng Gu, Zhenhua Ni,Shaoqing Xiao*, Optical studies of the thermal stability of InSe nanosheets, Applied Surface Science 2019, 467-468, 860-867. (影响因子:4.439)(中科院分区二区)
(6) Xiumei Zhang,Shaoqing Xiao*, Haiyan Nan, Xi Wan, Xiaofeng Gu* and Kostya (Ken) Ostrikov, Controllable One-step Growth of Bilayer MoS2-WS2/WS2 Heterostructures by Chemical Vapor Deposition, Nanotechnology 2018, 29, 455707.(影响因子:3.404)(中科院分区二区)
(7) Haiyan Nan, Zhirong Chen, Jie Jiang, Jiaqi Li, Weiwei Zhao, Zhenhua Ni, Xiaofeng Gu andShaoqing Xiao*, The effect of Graphene on surface plasmon resonance of metal nanoparticles, Physical Chemistry Chemical Physics 2018, 20, 25078-25084.(影响因子:3.906)(中科院分区二区)
(8) Xiumei Zhang,Shaoqing Xiao*, Lihong Shi, Haiyan Nan, Xi Wan, Xiaofeng Gu, Zhenhua Ni and Kostya (Ken) Ostrikov, Large-size Mo1-xWxS2and W1-xMoxS2(x=0-0.5) monolayers by confined-space chemical vapor deposition, Applied Surface Science 2018, 457, 591-597.(影响因子:4.439)(中科院分区二区)
(9) Ping Wang,Shaoqing Xiao*, Rui Jia*, Hengchao Sun, Xiaowan Dai, Guoyu Su and Ke Tao, 18.88%-efficient multi-crystalline silicon solar cells by combining Cu-catalyzed chemical etching and post-treatment process, Solar Energy 2018, 169, 153-158.(影响因子:4.374)(中科院分区二区)
(10)L. F. Zhang, S. P. Feng,S. Q. Xiao*, G. Shen, X. M. Zhang, H. Y. Nan, X. F. Gu and K. Ostrikov, Layer-controllable graphene by plasma thinning and post-annealing,Applied Surface Science, 2018, 441, 639-646(影响因子:3.387)(中科院分区2区)
(11)Di Cai,Shaoqing Xiao*, Haiyan Nan, Xiaofeng Gu and Kostya (Ken) Ostrikov, Robust fabrication of quantum dots on few-layer MoS2by soft hydrogen plasma and post-annealing, Particle & Particle Systems Characterization 2018, 35, 1800060.(影响因子:4.384)(中科院分区二区)
(12)J. J. Liu, Y. Yao,S. Q. Xiao*and X. F. Gu,Review of status developments of high-efficiency crystalline silicon solar cells,Journal of Physics D: Applied Physics2018, 51, 123001 (影响因子:2.588)(中科院分区2区)
(13)Y. Yao, X. Y. Xu, X. M. Zhang, H. P. Zhou, X. F. Gu andS. Q. Xiao*Enhanced efficiency in HIT solar cells by gradient doping,Materials Science in Semiconductor Processing, 2018, 77, 16-23(影响因子:2.359)
(14)Y. F. Sha,S. Q. Xiao*, X. M. Zhang, F. Qin and X. F. Gu,Layer-by-layer thinning of MoSe2 by soft and reactive plasma etching, Applied Surface Science, 2017, 411, 182-188.(影响因子:3.387)(中科院分区2区)
(15)S. Q. Xiao*,P. Xiao, X. C. Zhang, D. W. Yan, F. Qin, Z. H. Ni*, X. F. Gu, J. H. Zhao and K. Ostrikov*, Atomic-layer soft plasma etching of MoS2, Scientific Reports 2016,6,19945 (影响因子:4.259)
(16)S. Q. Xiao*, S. Xu*, X. F. Gu, D. Y. Song, H. P. Zhou and K. Ostrikov, Chemically active plasmas for surface passivation of Si Photovoltaics, Catalysis Today, 2015, 252, 201 (影响因子:4.636)(中科院分区2区)
(17)S. Q. Xiao*, J. J. Zhou, S. Y. Huang, P. Xiao, X. F. Gu, D. W. Yan and S. Xu, Highly textured conductive and transparent ZnO films for HIT solar cell applications, Journal of Physics D: Applied Physics 2015, 48, 305105(中科院分区2区)
(18)H. P. Zhou, S. Xu*,S. Q. Xiao*and Y. Xiang, Nanocrystalline silicon embedded in silicon suboxide synthesized in high-density inductively coupled plasma, Journal of Physics D: Applied Physics 2015, 48, 445302(中科院分区2区)
(19)S. Q. Xiao*and S. Xu, High-efficiency Silicon Solar Cells-Materials and Device Physics, Critical Reviews in Solid State and Materials Sciences 2014, 39, 277 (影响因子:6.455)(中科院分区2区)