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左春彦,高飞,戴忠玲,王友年.高功率微波输出窗内侧击穿动力学的PIC/MCC模拟研究[J],物理学报,2018,22:340-350
左春彦,高飞,戴忠玲,王友年.高功率微波输出窗内侧击穿动力学的PIC/MCC 模拟研究[J],物理学报,2018,67(22):267-278
戴忠玲,董婉,宋远红,王友年.Effect of ion bombardment time on the profile of atomic layer etching[A],2018
董婉,王喜凤,宋远红,戴忠玲,王友年.Effect of plasma uniformity on etching profiles[A],2018
董婉,戴忠玲,宋远红,王友年.ALE of SiO2 by alternating CF4 plasma with energetic Ar+ plasma beams[A],2018
Ma, Xiaoqin,Zhang, Saiqian,Dai, Zhongling,Wang, Younian.Study on atomic layer etching of Si in inductively coupled Ar/Cl-2 plasmas driven by tailored b...[J],PLASMA SCIENCE & TECHNOLOGY,2017,19(8,SI)
张赛谦,杨雪,戴忠玲,王友年.反应物输运与Ar/C4F8等离子体中SiO2刻蚀的精度控制[A],2017,1
王喜凤,宋远红,戴忠玲,王友年.射频容性耦合SiH4/Ar放电中反转电场及电子能量分布的模拟[A],2017,1
戴忠玲,王友年.Study on atomic layer etching of Si in inductively coupled Ar/Cl2 plasmas driven by tailored bias...[J],Plasma Sci. Technol.,2017,19(6):85502-85502
戴忠玲,王友年.Numerical study of atomic layer precision control for SiO2 etching[A],2017
戴忠玲,王友年.Accuracy control of SiO2 etching in inductively coupled CF4/Ar plasmas[A],2017
Sui Jiaxing,Zhang Saiqian,Liu Zeng,Yan Jun,Dai Zhongling.A Multi-Scale Study on Silicon-Oxide Etching Processes in C4F8/Ar Plasmas[J],PLASMA SCIENCE & TECHNOLOGY,2016,18(6):666-673
Wang Xifeng,Wang Younian,Dai Zhongling,Zhao Shuxia,Song Yuanhong.Hybrid Simulation of Duty Cycle Influences on Pulse Modulated RF SiH4/Ar Discharge[J],PLASMA SCIENCE & TECHNOLOGY,2016,18(4):394-399
戴忠玲,王友年.Simulation of atomic layer etching of Si in inductively coupled argon/chlorine plasmas with tailo...[A],2016,51-51
刘佳,阎军,戴忠玲,宋亦旭.C4F8/AR混合气体刻蚀SiO2的多目标优化研究[A],2015,319-320
Liu Zeng,Wang Younian,He Caiqiang,Dai Zhongling.Effects of Tailed Pulse-Bias on Ion Energy Distributions and Charging Effects on Insulating Sub...[J],PLASMA SCIENCE & TECHNOLOGY,2015,17(7):560-566
戴忠玲,王友年.Atomic layer etching of SiO2 under Ar/C4F8 plasmas with pulsed bias[A],2015
戴忠玲,王友年.脉冲调制射频放电余辉期直流电压对离子能量分布的调控[A],2015
You Zuowei,Dai Zhongling,Wang Younian.Simulation of Capacitively Coupled Dual-Frequency N-2, O-2, N-2/O-2 Discharges: Effects of Exte...[J],PLASMA SCIENCE & TECHNOLOGY,2014,16(4):335-343
Hao Meilan,Dai Zhongling,Wang Younian.Effects of Low-Frequency Source on a Dual-Frequency Capacitive Sheath near a Concave Electrode[J],PLASMA SCIENCE & TECHNOLOGY,2014,16(4):320-323
戴忠玲,王友年.Atomic Layer Etching of Silicon and Silicon Dioxide Under Pulsed RF Substrate Bias[A],2014,1(1):33-33
Zhang, Sai-Qian,Dai, Zhong-Ling,Song, Yuan-Hong,Wang, You-Nian.Effect of reactant transport on the trench profile evolution for silicon etching in chlorine pl...[J],VACUUM,2014,99:180-188
Bi, Zhen-Hua,Dai, Zhong-Ling,Zhang, Yu-Ru,Liu, Dong-Ping,Wang, You-Nian.Effects of reactor geometry and frequency coupling on dual-frequency capacitively coupled plasm...[J],PLASMA SOURCES SCIENCE & TECHNOLOGY,2013,22(5)
张赛谦,戴忠玲,宋远红,王友年.双频容性耦合Ar/CF4等离子体中双频源参数对刻蚀微观不均匀性影响的研究[A],2013,252-252
张赛谦,戴忠玲,宋远红,王友年.双频容性耦合Ar/CF_4等离子体中双频源参数对刻蚀微观不均匀性影响的研究[A],2013,1
Dai, Zhong-Ling,Zhang, Sai-Qian,Wang, You-Nian.Study on feature profile evolution for chlorine etching of silicon in an RF biased sheath[J],17th International Conference on Surface Modification of Materials by Ion Beams (SMMIB),2013,89(,SI):197-202
Zhang Saiqian,Dai Zhongling,Wang Younian.Ion Transport to a Photoresist Trench in a Radio Frequency Sheath[J],PLASMA SCIENCE & TECHNOLOGY,2012,14(11):958-964
Dai Zhongling,Yue Guang,Wang Younian.Simulations of Ion Behaviors in a Photoresist Trench During Plasma Etching Driven by a Radio-Fr...[J],PLASMA SCIENCE & TECHNOLOGY,2012,14(3):240-244
Zhao Zhanqiang,Dai Zhongling,Wang Younian.Feature Profile Evolution During Etching of SiO2 in Radio-Frequency or Direct-Current Plasmas[J],PLASMA SCIENCE & TECHNOLOGY,2012,14(1):64-70
Zhang Hong,Dai Zhongling,Wang Younian.Characteristics of a Collisional Sheath Biased by a Dual Frequency Source[J],PLASMA SCIENCE & TECHNOLOGY,2011,13(5):513-518
Dai, Zhong-Ling,Yue, Guang,Wang, You-Nian.Study on mechanism of etching in low pressure radio-frequency plasmas[J],Joint Meeting of the 10th Asia-Pacific Conference on Plasma Science and Technology (APCPST 2010)/153rd Symposium on Plasma Science for Materials (SPSM 2010),2011,11(5):S121-S125
赵占强,戴忠玲,王友年.射频等离子体刻蚀SiO2的数值研究[A],2011,163-163
赵占强,戴忠玲,王友年.射频等离子体刻蚀SiO_2的数值研究[A],2011,1
Dai Zhong-Ling,Wang You-Nian.Nonlinear Plasma Dynamics in Electron Heating of Asymmetric Capacitive Discharges with a Fluid ...[J],CHINESE PHYSICS LETTERS,2011,28(7)
Dai Zhongling,Hao Meilan,Wang Younian.Study of Characteristics of the Radio-Frequency Sheath over a Substrate with a Circular Trench[J],PLASMA SCIENCE & TECHNOLOGY,2011,13(1):50-54
戴忠玲,王友年.Study on Feature Profile Evolution for Chlorine Etching of Silicon in a RF Biased Sheath[A],2011
戴忠玲,王友年.Simulation of ion behavior in a photoresist trench during metal etching driven by a radio-frequen...[A],2011
戴忠玲,王友年.Study on Nonlinear Plasma Dynamics in Electron Heating of Asymmetric Capacitive Discharges with a...[J],CHIN.PHYS.LETT,2011,28(10):75202-75202
戴忠玲,王友年.Simulation of ion behavior in a photoresist trench during metal etching driven by a radio-frequen...[A],2010,648-648
戴忠玲,王友年.Study on Nonlinear Resonance of Electron Heating in Asymmetric Capacitive Discharges with a Time-...[A],2010,55(7)
Hao Mei-Lan,Dai Zhong-Ling,Wang You-Nian.Simulation of Dual Frequency Capacitive Sheath over a Concave Electrode in Low Pressure[J],CHINESE PHYSICS LETTERS,2009,26(12)
毕振华,戴忠玲,徐翔,李志成,王友年.CF_4/Ar混合气体放电特性的数值模拟[A],2009,1
张弘,戴忠玲,王友年.基于水平集方法的刻蚀剖面演化的研究[A],2009,1
郝美兰,戴忠玲,王友年.带柱形凹槽电极表面双频偏压等离子体鞘层物理特性的研究[A],2009,2
Xu, Xiang,Ge, Hao,Wang, Shuai,Dai, Zhongling,Wang, Younian,Zhu, Aimin.Influence of the low-frequency source parameters on the plasma characteristics in a dual freque...[J],PROGRESS IN NATURAL SCIENCE,2009,19(6):677-684
Dai Zhongling,Liu Chuansheng,Wang Younian.Two-Dimensional Simulation of a Dual Frequency Sheath Near an Electrode with a Cylindrical Hole[J],PLASMA SCIENCE & TECHNOLOGY,2009,11(3)
Bi, Zhen-Hua,Dai, Zhong-Ling,Xu, Xiang,Li, Zhi-Cheng,Wang, You-Nian.Numerical results for the Ar and CF(4) mixture gas in a dual frequency capacitively coupled pla...[J],PHYSICS OF PLASMAS,2009,16(4)
戴忠玲,王友年.Two-Dimensional Simulation of a Dual Frequency Sheath Near an[J],Plasma Sci. Technol,2009,11(3):1-7
戴忠玲,徐翔,王友年.Numerical results for the Ar and CF4 mixture gas in a dual frequency capacitively coupled plasma ...[J],Phys. Plasmas,2009,16(4):43510-43510
Liu, Yu,Dai, Zhong-Ling,Wang, You-Nian.Dust particle properties in a dual-frequency driven sheath[J],CHINESE PHYSICS LETTERS,2008,25(4):1372-1375
Jiang, Wei,Xu, Xiang,Dai, Zhong-Ling,Wang, You-Nian.Heating mechanisms and particle flow balancing of capacitively coupled plasmas driven by combin...[J],PHYSICS OF PLASMAS,2008,15(3)
Dai Zhong-Ling,Liu Chuan-Sheng,Wang You-Nian.Comparison between dual radio frequency- and pulse-driven sheath near insulating substrates[J],CHINESE PHYSICS LETTERS,2008,25(2):632-635
戴忠玲,王友年.The characteristics of a collisional dual frequency sheath over an electrode with a cylindrical h...[A],2008
王帅,徐翔,戴忠玲,王友年.双频电容耦合等离子体物理特性的一维流体力学/Monte-Carlo混合模拟[A],2007,15
戴忠玲,毛明,王友年.等离子体刻蚀工艺的物理基础[J],物理,2006,35(8):693-698
Wang Y.-N.,Dai Z.-L..Simulations of Ion Transport in a Collisional Radio-Frequency Plasma Sheath[A],2003,185-
戴忠玲,王友年,马腾才.射频等离子体鞘层动力学模型[J],物理学报,2001,50(12):2398-2402
Dai Z.-L.,Wang Y.-N.,Ma T.-C.Teng-Cai.Dynamical model of the radio-frequency plasma sheath[J],Wuli Xuebao/Acta Physica Sinica,2001,50(12):2402-
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