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[1]Li, Hong.Nonlocal electron kinetics and spatial transport in radio-frequency two-chamber inductively couple[J],JOURNAL OF APPLIED PHYSICS,2022,121(23)
[2]张钰如.Numerical investigation of low pressure inductively coupled plasma sources: A review[J],ACTA PHYSICA SINICA,2022,70(9)
[3]王应杰.Numerical investigation of radio-frequency negative hydrogen ion sources by a three-dimensional flui[J],CHINESE PHYSICS B,2022,30(9)
[4]徐翔.Phase-shift effect in capacitively coupled plasmas with two radio frequency or very high frequency[J],JOURNAL OF APPLIED PHYSICS,2022,108(4)
[5]张钰如.Plasma characteristics in an electrically asymmetric capacitive discharge sustained by multiple ha[J],PLASMA SOURCES SCIENCE TECHNOLOGY,2022,27(5)
[6]Wen, Ying-Ying.Secondary electron effect on sustaining capacitively coupled discharges: A hybrid modeling investi[J],AIP Advances,2022,9(5)
[7]Liu, Jian-Kai.Simulations of electromagnetic effects in large-area high-frequency capacitively coupled plasmas w[J],PHYSICS OF PLASMAS,2022,27(2)
[8]Liu, Jiankai.Simulations of standing wave effect, stop band effect, and skin effect in large-area very high frequ[J],PLASMA SCIENCE & TECHNOLOGY,2022,23(3)
[9]高飞.Spatial distributions of plasma parameters in inductively coupled hydrogen discharges with an expa[J],PHYSICS OF PLASMAS,2022,24(7)
[10]赵凯.Suppression of nonlinear standing wave excitation via the electrical asymmetry effect[J],PLASMA SOURCES SCIENCE TECHNOLOGY,2022,29(12)
[11]赵书霞.Equivalent circuit effects on mode transitions in H2 inductively coupled plasmas[J],Physcis of Plasmas,2015,22(4):43508-43508
[12]张钰如.Effect of phase angle on plasma characteristics in electrically asymmetric capacitive discharge[J],物理学报,2018,67(22):225203-
[13]张钰如.Experimental and numerical investigations on time-resolved characteristics of pulsed inductively cou[J],JOURNAL OF VACUUM SCIENCE TECHNOLOGY A,2017,35(2):21301-21301
[14]徐雨.常压等离子体对柔性多孔材料表面处理均匀性的研究进展[J],物理学报,2022,70(09):116-127
[15]孙晓艳.Modulation of the plasma uniformity by coil and dielectric window structures in an inductively coupl[J],Plasma Sci. Technol.,2021,23:95404-
[16]赵凯.Suppression of nonlinear standing wave excitation via the electrical asymmetry effect[J],Plasma Sources Sci. Technol,2021,29:124001-
[17]王英杰.Numerical investigation of radio-frequency negative hydrogen ion sources by a three-dimensional flui[J],Chin. Phys. B,2021,30:95205-
[18]刘建凯.Simulations of standing wave effect, stop band effect, and skin effect in large-area very high frequ[J],Plasma Sci. Technol.,2021,23:35401-
[19]佟磊.Hybrid simulation of radio frequency biased inductively coupled Cl2 plasmas[J],Phys. Plasmas,2021,28:53512-
[20]张钰如.低气压感性耦合等离子体源模拟研究进展[J],物理学报,2021,70:95206-
[21]王英杰.Influence of magnetic filter field on the radiofrequency negative hydrogen ion source of neutral bea[J],Plasma Sci. Technol.,2021,23:115602-
[22]张钰如.How to balance computational cost and accuracy of the model for negative hydrogen ion sources? A lev[J],Plasma Sources Sci. Technol,2021,30:75028-
[23]梁英爽.Investigation of active species in lowpressure capacitively coupled N2/Ar plasmas[J],Phys. Plasmas,2021,28:13510-
[24]孙晓艳.Fluid simulation of the superimposed dual-frequency source effect in inductively coupled discharges[J],Phys. Plasmas,2021,28:113504-
[25]梁英爽.Investigation of voltage effect on reaction mechanisms in capacitively coupled N2 discharges[J],Journal of Applied Physics,2021,127:133301-
[26]Sun, Xiao-Yan.Effect of radio frequency bias on plasma characteristics of inductively coupled argon discharge ba[J],CHINESE PHYSICS B,2021,29(9)
[27]张钰如.Influence of the Material Dielectric Constant on Plasma Generation inside Catalyst Pores[J],JOURNAL OF PHYSICAL CHEMISTRY C,2021,120(45):25923-25934
[28]张钰如.How to address the issue of uniformity in large area capacitively coupled plasmas? A modeling inve[J],PLASMA SOURCES SCIENCE & TECHNOLOGY,2021,29(8)
[29]Liu, Jian-Kai,Zhang, Yu-Ru,Zhao, Kai,Wen, De-Qi,Wang, You-Nian.Simulations of electromagnetic effects in large-area high-frequency capacitively coupled plasmas w[J],PHYSICS OF PLASMAS,2020,27(2)
[30]Liang, Ying-Shuang,Liu, Yong-Xin,Zhang, Yu-Ru,Wang, You-Nian.Investigation of voltage effect on reaction mechanisms in capacitively coupled N-2 discharges[J],JOURNAL OF APPLIED PHYSICS,2020,127(13)
[31]Zhang, Yu-Ru,Zhao, Zhuan-Zhuan,Xue, Chan,Gao, Fei,Wang, You-Nian.Ion energy and angular distributions in planar Ar/O-2 inductively coupled plasmas: hybrid simulati[J],JOURNAL OF PHYSICS D-APPLIED PHYSICS,2019,52(29)
[32]Wen, Ying-Ying,Song, Yuan-Hong,Wang, You-Nian,Zhang, Yu-Ru,Jiang, Ge.Secondary electron effect on sustaining capacitively coupled discharges: A hybrid modeling investi[J],AIP ADVANCES,2019,9(5)
[33]Gao, Fei,Lv, Xiang-Yun,Zhang, Yu-Ru,Wang, You-Nian.Complex transients of input power and electron density in pulsed inductively coupled discharges[J],JOURNAL OF APPLIED PHYSICS,2019,126(9)
[34]Bogaerts, Annemie,Wang, Weizong,Zhang, Quan-Zhi,Zhang, Yu-Ru,Van Laer, Koen.Burning questions of plasma catalysis: Answers by modeling[J],CATALYSIS TODAY,2019,337(,SI):3-14
[35]Sun, Xiao-Yan,Zhang, Yu-Ru,Chai, Sen,Wang, You-Nian,He, Jian-Xin.Fluid simulation of the plasma uniformity in pulsed dual frequency inductively coupled plasma[J],PHYSICS OF PLASMAS,2019,26(4)
[36]Zhang, Yu-Ru,Hu, Yan-Ting,Gao, Fei,Song, Yuan-Hong,Wang, You-Nian.Plasma characteristics in an electrically asymmetric capacitive discharge sustained by multiple ha[J],PLASMA SOURCES SCIENCE & TECHNOLOGY,2018,27(5)
[37]Zhang, Yu-Ru,Neyts, Erik C.,Bogaerts, Annemie.Enhancement of plasma generation in catalyst pores with different shapes[J],PLASMA SOURCES SCIENCE & TECHNOLOGY,2018,27(5)
[38]Gao, Fei,Zhang, Yu-Ru,Li, Hong,Liu, Yang,Wang, You-Nian.Spatial distributions of plasma parameters in inductively coupled hydrogen discharges with an expa[J],PHYSICS OF PLASMAS,2017,24(7)
[39]Li, Hong,Liu, Yang,Zhang, Yu-Ru,Gao, Fei,Wang, You-Nian.Nonlocal electron kinetics and spatial transport in radio-frequency two-chamber inductively couple[J],JOURNAL OF APPLIED PHYSICS,2017,121(23)
[40]Wen, De-Qi,Zhang, Yu-Ru,Lieberman, Michael A.,Wang, You-Nian.Ion Energy and Angular Distribution in Biased Inductively Coupled Ar/O-2 Discharges by Using a Hyb[J],PLASMA PROCESSES AND POLYMERS,2017,14(4-5,SI)
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