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梅显秀.The corrosion and oxidation resistance improvement of DZ4 Ni-based superalloy irradiated by high int[J],Advanced materials research,2022,538-541:276-280
张治国.Zr-N films prepared by MW-ECR PE-UNB balanced magnetron sputtering:plasma diagnostics and structure [J],Wuli Xuebao/Acta Physica Sinica,2022,54(7):3257-3262
Yu, Jiaxin.Radial nanofretting behaviors of ultrathin carbon nitride film on silicon substrate[J],TRIBOLOGY INTERNATIONAL,2022,44(11):1400-1406
徐军.Structrual and Electrical Properties of Reactive Magnetron Sputtered Yttrium-doped HfO2 Films[J],Chinese Physics B,2022,27(4):481031-481036
Araujo, C. Moyses.Room temperature ferromagnetism in pristine MgO thin films[J],APPLIED PHYSICS LETTERS,2022,96(23)
王静.Nanomechanical and Electrochemical Properties of Diamond-Like Carbon (DLC) Films Deposited by Plas[J],Plasma Science and Technology,2022,12(4):461-465
Li, Jian-quan.Comparative measurement of plasma potential with tube probe and Langmuir probe[J],AIP Advances,2022,8(11)
Wang, Hanghang.Continuous compositional spread investigation of SiC-based thin films prepared by MW-ECR plasma en[J],Plasma Science and Technology,2022,22(3)
Kapilashrami, Mukes.Coexistence of ultraviolet photo-response and room-temperature ferromagnetism in polycrystalline Z[J],MATERIALS LETTERS,2022,64(11):1291-1294
Li, Jianquan.Automatic emissive probe apparatus for accurate plasma and vacuum space potential measurements[J],Plasma Science and Technology,2022,20(2)
Li, Jian-quan.A comparative study of emissive probe techniques for vacuum space potential measurements[J],真空,2022,155:566-571
Li, Jian-Quan.Accurate space potential measurements using an emissive probe in high pressure plasma and neutral [J],PLASMA PHYSICS AND CONTROLLED FUSION,2022,61(10)
高鹏.Ultra-Thin Silicon Carbon Nitride Film: a Promising Protective Coating for Read/Write Heads in Mag[J],Chinese Physics Letters,2022,26(6)
Kapilashrami, Mukes.Transition from ferromagnetism to diamagnetism in undoped ZnO thin films[J],APPLIED PHYSICS LETTERS,2022,95(3)
Ding Wan-Yu.Ultra-thin a-SiNx protective overcoats for hard disks and read/write heads[J],Chinese Physics B,2022,18(4):1570-1573
徐军.The effect of N2 flow rate on discharge characteristics of microwave electron cyclotron resonance pl[J],PHYSICS OF PLASMAS,2022,16(53502):1-5
Zhang, Dongqing.Investigation of settlement monitoring method based on distributed Brillouin fiber optical sensor[J],MEASUREMENT,2022,134:118-122
zhangyu.Investigation of temperature-dependent ferroelectric Properties of Y-doped HfO2 thin film prepared b[J],真空,2022,195(5):109506-109506
张玉.Investigation of temperature-dependent ferroelectric properties of Y-doped HfO2 thin film prepared[J],真空,2022,179
Li, Jian-quan.Improved inflection point method of emissive probe for accurate measurement of plasma potential[J],JOURNAL OF VACUUM SCIENCE TECHNOLOGY A,2022,34(6)
Bai Yujing.Improvement of the Harmonic Technique of Probe for Measurements of Electron Temperature and Ion De[J],Plasma Science and Technology,2022,18(1):58-61
Ding, Wanyu.Influence of N-2 flow rate on the mechanical properties of SiNx films deposited by microwave elect[J],THIN SOLID FILMS,2022,518(8):2077-2081
Bai, Yu-jing.Influence of the bias signal amplitude and frequency on the harmonic probe measurements in plasma [J],PHYSICS OF PLASMAS,2022,23(8)
Su, Yuanjun.Hydrogen plasma induced crystallization of Si thin films by remote inductively coupled plasma sour[J],SURFACE COATINGS TECHNOLOGY,2022,206(14):3159-3164
Zhang, Yu.Facing-target mid-frequency magnetron reactive sputtered hafnium oxide film: Morphology and electr[J],JOURNAL OF THE KOREAN PHYSICAL SOCIETY,2022,68(5):679-685
Kapilashrami, Mukes.Experimental evidence for ferromagnetism at room temperature in MgO thin films[J],JOURNAL OF PHYSICS CONDENSED MATTER,2022,22(34)
Zhang, Yu.Effects of Hf buffer layer at the Y-doped HfO2/Si interface on ferroelectric characteristics of Y-[J],CERAMICS INTERNATIONAL,2022,44(11):12841-12846
Su Yuanjun.Effects of growth temperature on mu c-Si:H films prepared by plasma assistant magnetron sputtering[J],Rare Metals,2022,31(2):193-197
Liu, Zhichun.EFFECT OF NITROGEN-DOPED CONCENTRATION ON THE TCR OF ITO THIN FILMS AT HIGH TEMPERATURE[A],2021 34TH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS (MEMS 2021),2022,856-859
Zeng, Qiyong.Development of NiCr/NiSi thin-film thermocouple sensor for workpiece temperature measurement in ch[J],JOURNAL OF MANUFACTURING SCIENCE AND ENGINEERING TRANSACTIONS OF THE ASME,2022,128(1):175-179
张昱.Investigation of temperature-dependent ferroelectric Properties of Y-doped HfO2 thin film prepared b[J],Vacuum,2021,195(5):109506-109506
Zhang, Yu,Xu, Jun,Wang, Hang-Hang,Lu, Wen-Qi,Choi, Chi-Kyu,Zhou, Da-Yu.Effects of Hf buffer layer at the Y-doped HfO2/Si interface on ferroelectric characteristics of Y-[J],CERAMICS INTERNATIONAL,2018,44(11):12841-12846
Han, Dao-Man,Liu, Yong-Xin,Gao, Fei,Wang, Xiang-Yu,Li, Ang,Xu, Jun,Jing, Zhen-Guo,Wang, You-Nian.Observation of the standing wave effect in large-area, very-high-frequency capacitively coupled pl[J],JOURNAL OF APPLIED PHYSICS,2018,123(22)
Han, Dao-Man,Liu, Yong-Xin,Gao, Fei,Liu, Wen-Yao,Xu, Jun,Wang, You-Nian.Measurements of argon metastable density using the tunable diode laser absorption spectroscopy in [J],CHINESE PHYSICS B,2018,27(6)
Zhang, Yu,Xu, Jun,Zhou, Da-Yu,Wang, Hang-Hang,Lu, Wen-Qi,Choi, Chi-Kyu.Structural and electrical properties of reactive magnetron sputtered yttrium-doped HfO2 films[J],CHINESE PHYSICS B,2018,27(4)
Li, Jianquan,Lu, Wenqi,Xu, Jun,Gao, Fei,Wang, Younian.Automatic emissive probe apparatus for accurate plasma and vacuum space potential measurements[J],PLASMA SCIENCE & TECHNOLOGY,2018,20(2)
徐军,周大雨,陆文琪.Structrual and Electrical Properties of Reactive Magnetron Sputtered Yttrium-doped HfO2 Films[J],Chinese Physics B,2018,27(4):481031-481036
Li, Jian-Quan,Lu, Wen-Qi,Xu, Jun,Gao, Fei,Wang, You-Nian.Automatic emissive probe apparatus for efficient plasma potential measurements[J],REVIEW OF SCIENTIFIC INSTRUMENTS,2017,88(11):115106
李建泉,陆文琪,徐军.基于虚拟仪器的自动发射探针诊断装置[A],2017,1
韩道满,高飞,刘永新,徐军,王友年.甚高频大面积容性放电中电磁效应的实验研究[A],2017,1
Li, Jian-quan,Xu, Jun,Bai, Yu-jing,Lu, Wen-qi,Wang, You-nian.Improved inflection point method of emissive probe for accurate measurement of plasma potential[J],JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2016,34(6)
谭伟,徐军,王行行,陆文琪.射频反应磁控溅射制备AlN多晶薄膜及其择优取向研究[J],真空科学与技术学报,2016,36(10):1092-1098
Bai, Yu-jing,Lu, Wen-qi,Li, Jian-quan,Xu, Jun,Wang, You-nian.Influence of the bias signal amplitude and frequency on the harmonic probe measurements in plasma [J],PHYSICS OF PLASMAS,2016,23(8)
Zhang, Yu,Xu, Jun,Wang, You-Nian,Choi, Chi Kyu,Zhou, Da-Yu.Facing-target mid-frequency magnetron reactive sputtered hafnium oxide film: Morphology and electr[J],JOURNAL OF THE KOREAN PHYSICAL SOCIETY,2016,68(5):679-685
Bai Yujing,Li Jianquan,Xu Jun,Lu Wenqi,Wang Younian,Ding Wanyu.Improvement of the Harmonic Technique of Probe for Measurements of Electron Temperature and Ion De[J],PLASMA SCIENCE & TECHNOLOGY,2016,18(1):58-61
Mei, X.,Fu, J.,Liu, X.,Xu, J.,Wang, Y..The corrosion and oxidation resistance improvement of DZ4 Ni-based superalloy irradiated by high int[J],Advanced Materials Research,2012,538-541:276-280
朱明,苏元军,范鹏辉,徐军.等离子体源辅助磁控溅射法低温(200℃)制备多晶硅薄膜[J],真空,2012,49(3):47-50
Su, Yuanjun,Xu, Jun,Dong, Chuang,Lu, Wenqi.Hydrogen plasma induced crystallization of Si thin films by remote inductively coupled plasma sour[J],SURFACE & COATINGS TECHNOLOGY,2012,206(14):3159-3164
Pang Jianhua,Lu Wenqi,Xin Yu,Wang Hanghang,He Jia,Xu Jun.Plasma Diagnosis for Microwave ECR Plasma Enhanced Sputtering Deposition of DLC Films[J],PLASMA SCIENCE & TECHNOLOGY,2012,14(2):172-176
Su Yuan-Jun,Xu Jun,Zhu Ming,Fan Peng-Hui,Dong Chuang.Hydrogenated poly-crystalline silicon thin films deposited by inductively coupled plasma assisted [J],ACTA PHYSICA SINICA,2012,61(2)
苏元军,董闯,范鹏辉,朱明,徐军.利用等离子体辅助脉冲磁控溅射实现多晶硅薄膜的低温沉积[J],物理学报,2011,61(2):499-508
Yu, Jiaxin,Zhang, Shuang,Qian, Linmao,Xu, Jun,Ding, Wangyu,Zhou, Zhongrong.Radial nanofretting behaviors of ultrathin carbon nitride film on silicon substrate[J],6th International Symposium on Fretting Fatigue (ISFF),2011,44(11):1400-1406
Wang, Jinxue,Liu, Min,Guo, Xinwen,Wu, Hongyu,Xu, Jun,Lu, Wenqi.Gas-phase propene epoxidation over Ag/TS-1 prepared by plasma sputtering[J],REACTION KINETICS MECHANISMS AND CATALYSIS,2011,102(2):447-457
Kapilashrami, Mukes,Xu, Jun,Rao, K. V.,Belova, Lyuba,Carlegrim, Elin,Fahlman, Mats.Experimental evidence for ferromagnetism at room temperature in MgO thin films[J],JOURNAL OF PHYSICS-CONDENSED MATTER,2010,22(34)
孙文立,徐军,陆文琪.等离子体增强磁控溅射沉积碳化硅薄膜的化学结构与成膜机理[J],物理化学学报,2010,26(8):2311-2316
Kapilashrami, Mukes,Xu, Jun,Biswas, Anis,Tamaki, Takahiko,Sharma, Parmanand,Rao, K. V.,Belova, Lyuba.Coexistence of ultraviolet photo-response and room-temperature ferromagnetism in polycrystalline Z[J],MATERIALS LETTERS,2010,64(11):1291-1294
Araujo, C. Moyses,Ahuja, Rajeev,Gehring, Gillian A.,Rao, K. V.,Kapilashrami, Mukes,Jun, Xu,Jayakumar, O. D.,Nagar, Sandeep,Wu, Yan,Arhammar, Cecilia,Johansson, Borje,Belova, Lyubov.Room temperature ferromagnetism in pristine MgO thin films[J],APPLIED PHYSICS LETTERS,2010,96(23)
Ding, Wanyu,Dong, Chuang,Deng, Xinlu,Lu, Wenqi,Xu, Jun.Influence of N-2 flow rate on the mechanical properties of SiNx films deposited by microwave elect[J],THIN SOLID FILMS,2010,518(8):2077-2081
王明娥,陆文琪,孙文立,徐军,董闯.同轴双放电腔微波ECR等离子体源增强非平衡磁控溅射制备SiN_x薄膜研究[A],2009,1
孙文立,光磊,陆文琪,徐军.沉积偏压及N2流量对a-CNx膜成分、结构和性能的影响[A],2009,1
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