个人简介
杨成韬,男,博士、教授、博士生导师,国家自然科学奖评审委员。1965年出生,长期以来在铁电薄膜材料与铁电集成器件、压电薄膜材料与器件、电子陶瓷材料与元器件方向做出了许多创新性研究和开发工作。 教育背景: 2001.09-2004.12 电子科技大学,材料物理与化学专业,工学博士学位 1989.09-1991.09 电子科技大学,电子材料与元器件专业,工学硕士学位 1983.09-1987.06 电子科技大学,应用化学专业,理学学士学位
研究领域
主要从事铁电薄膜材料及其在铁电薄膜存储器上应用、压电薄膜材料及其在声表面波器件、薄膜体声波器件上的应用、新型电子陶瓷材料等研究工作。
近期论文
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1. Structural and dielectric properties of Ba6−3xNd8+2xTi18O54 (x=2/3) thin films processed by sol–gel technique. Journal of Materials Science: Materials in Electronics, 2014: 1-6. 2. Effects of sputtering atmosphere on the properties of c-plane ScAlN thin films prepared on sapphire substrate. Journal of Materials Science: Materials in Electronics, 2014: 1-7. 3. Structure and electrical properties of AlN films prepared on PZT films by the DC reactive magnetron sputtering. Electronic Materials Letters, 2014. 10(1): 127-130. 4. Influence of rapid thermal annealing on structure and interfacial characteristic of ZnO thin films. Surface and Interface Analysis, 2013. 45(2): 672-676. 5. Influence of the PZT film thickness on the structure and electrical properties of the ZnO/PZT heterostructure. Journal of Materials Science: Materials in Electronics, 2013. 24(1): 160-165. 6. Preparation of highly c-axis oriented AlN films on Si substrate with ZnO buffer layer by the DC magnetron sputtering. Materials Letters, 2013. 90: 49-52. 7. Optimized Process of Mn2+-Doped Ba0. 5Sr0. 5TiO3 Thin Films on Platinum Coated Sapphire Substrates. Japanese Journal of Applied Physics, 2012. 51(3R): 035505. 8. Preparation and electrical properties of ZnO/PZT films by radio frequency reactive magnetron sputtering. Materials Letters, 2012. 83: 179-182.