Adomaitis, Raymond A. - University of Maryland - Chemical and Biomolecular Engineering

个人简介

Ph.D., Illinois Institute of Technology, 1988

研究领域

Aerosol and nanoparticle technology.

近期论文

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Travis, C. D. and R. A. Adomaitis, "Modeling ALD Surface Reaction and Process Dynamics using Absolute Reaction Rate Theory,'' Submitted for publication (2012). Adomaitis, R. A. and A. Schwarm "Systems and Control Challenges in Photovoltaic Manufacturing Processes - A Modeling Strategy for Passivation and Anti-reflection Films,'' Proc. CPC VIII, Savannah, GA (2012). Adomaitis, R. A. "A Ballistic Transport and Surface Reaction Model for Simulating Atomic Layer Deposition Processes in High Aspect-Ratio Nanopores,'' Chemical Vapor Deposition, 17 (2011) 353-365, DOI: 10.1002/cvde.201106922. Adomaitis, R. A. "Ballistic Transport and Reaction Modeling of Atomic Layer Deposition Manufacturing Processes,'' Proc. 2011 IFAC World Congress, Milan (2011). Arana-Chavez, D., E. Toumayan, F. Lora, C. McCaslin, and R. A. Adomaitis "Modeling the Transport and Reaction Mechanisms of Copper Oxide CVD,'' Chemical Vapor Deposition 16 (2010) 336-345, DOI: 10.1002/cvde.201006873. Adomaitis, R. A. "Development of a Multiscale Model for an Atomic Layer Deposition Process,'' J. Crystal Growth 312 (2010) 1449-1452, DOI: 10.1016/j.jcrysgro.2009.12.041. Guglietta, G. T. Wanga, R. Pati, S. Ehrman, and R. A. Adomaitis "Chemical Vapor Deposition of Copper Oxide Films for Photoelectrochemical Hydrogen Production,'' Proc. of SPIE Vol. 7408 740807-1, Solar Hydrogen and Nanotechnology IV, F. Osterloh, Ed. (2009). Dwivedi, V. and R. A. Adomaitis "Multiscale Simulation and Optimization of an Atomic Layer Deposition Process in a Nanoporous Material,'' ECS Transactions 25 (2009) 115-122, DOI: 10.149/1.3207582. Leon, M. del Pilar and R. A. Adomaitis "Full Wafer Mapping and Response Surface Modeling Techniques for Thin Film Deposition Processes,'' J. Crystal Growth 311 (2009) 3399-3408. Oliver, J. D., B. H. Ponczak, R. P. Parikh, and R. A. Adomaitis "Uniformity Improvement of Planetary Epitaxial Growth Processes through Analysis of Intentionally Stalled SiC Wafers,'' Mat. Sci. Forum, 615-617 (2009) 101-104. Adomaitis, R. A. "The Nearest Uniformity Producing Profile (NUPP) Optimization Criterion for Thin-Film Processing Applications,'' J. Process Control 18 (2008) 922-930. Sreenivasan, R., R. A. Adomaitis, and G. W. Rubloff "A Comparative Study of Reactor Designs for the Production of Graded Films with Applications to Combinatorial CVD,'' J. Crystal Growth 310 (2008) 270-283. Adomaitis, R. A. "Intentionally Patterned and Spatially Non-Uniform Film Profiles in Chemical Vapor Deposition Processes,'' Surface and Coatings Technology 201 (2007) 9025-9029. Cai, Y., L. Henn-Lecordier, G. W. Rubloff, R. Sreenivasan, J.-O. Choo, and R. A. Adomaitis, "Multiplexed Mass Spectrometric Sensing in a Spatially Programmable Chemical Vapor Deposition System,'' J. Vac. Sci. Tech. B 25 (2007) 1288-1297. Adomaitis, R. A., I. G. Kevrekidis, and R. de la Llave, "A Computer-Assisted Study of Global Dynamic Transitions for a Non-Invertible System,'' Int. J. Bifurcation Chaos 17 (2007) 1305-1321. Adomaitis, R. A. "The Trouble with Spurious Eigenvalues,'' Int. J. Bifurcation Chaos 17 (2007) 1375-1381. Parikh, R. P., R. A. Adomaitis, J. D. Oliver, and B. H. Ponczak "Implementation of a Geometrically-based Criterion for Film Uniformity Control in a Planetary SiC CVD Reactor System,'' J. Process Control 17 (2007) 477-488. Parikh, R. P., R. A. Adomaitis, M. E. Aumer, D. Partlow, D. Thomson, and G. W. Rubloff ``Validating Gallium Nitride Growth Kinetics Using a Precursor Delivery Showerhead as a Novel Chemical Reactor,'' J. Crystal Growth 296 (2006) 15-26. Sreenivasan, R. R. A. Adomaitis, and G. W. Rubloff :A Demonstration of Spatially Programmable Chemical Vapor Deposition: Model-Based Uniformity/Non-uniformity Control.'' J. Vac. Sci. Tech. B 24 (2006) 2706-2715. Chen, J. and R. A. Adomaitis "An Object-Oriented Framework for Modular Chemical Process Simulation with Semiconductor Processing Applications,'' Computers & Chem. Eng, 30 (2006) 1354-1380. Parikh, R. P. and R. A. Adomaitis "An Overview of Gallium Nitride Growth Chemistry and its Effect on Reactor Design: Application to a Planetary Radial-Flow CVD System,'' J. Crystal Growth 286 (2006) 259-278. Cho, S. G. W. Rubloff, M. E. Aumer, D. B. Thomson, D. P. Partlow, R. Parikh, and R. A. Adomaitis "In-situ Chemical Sensing in AlGaN/GaN HEMT MOCVD Process for Real-Time Prediction of Product Crystal Quality and Advanced Process Control,'' J. Vac. Sci. Tech. B 23 (4) (2005) 1386-1397. Choo, J. O., R. A. Adomaitis, L. Henn-Lecordier, Y. Cai, and G. W. Rubloff "Development of a Spatially Controllable Chemical Vapor Deposition Reactor with Combinatorial Processing Capabilities,'' Review of Scientific Instruments, 76, 062217 (2005). Adomaitis, R. A. "Identification of a Deposition Rate Profile Subspace Corresponding to Spatially-Uniform Films in Planetary CVD Reactors: A New Criterion for Uniformity Control,'' Computers & Chem. Eng, 29 (2005) 829-837. Choo, J. O., R. A. Adomaitis, G. W. Rubloff, L. Henn-Lecordier, and Y. Liu "Simulation-Based Design and Experimental Evaluation of a Spatially Controllable Chemical Vapor Deposition Reactor,'' AIChE Journal, 51 (2005) 572-584.