个人简介
学术经历
1997年-1998年University of California, Berkeley, Chemistry Dept. 化学系，博士后
1996年-1996年美国University of Akron, Polymer Science 高分子系，博士后
1992年-1995年日本Tokyo institute of technology 高分子化学，博士
1990年-1992年日本京都大学，高分子化学硕士
1984年-1988年中山大学，有机合成学士
工作经历
2015年-至今复旦大学，教授、国家高层次人才
2014年-2015年TOK美国，Fellow
2001年-2014年美国Intel公司，光刻工艺研发工程师&FMO材料研发主管
1998年-2000年美国ROHM&HAAS公司，高级研究员
研究领域
先进半导体芯片制造用的高端光刻胶、光刻材料和相关工艺集成的研究（微电子方向）
90nm～5nm节点高端半导体光刻材料的研发
探索Moore's Law的材料极限，研发下一代10～5 nm分辨率的光刻材料DSA
研究DSA的图像化工艺和plasma刻蚀工艺
纳米器件的设计和加工
纳米材料的精密设计和合成 （材料方向）
新型纳米材料、器件的研发，序列可控聚合物及其纳米复合材料的研究
近期论文
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Xuemiao Li; Jie Li; Chenxu Wang; Yuyun Liu; Hai Deng*, Fast self-assembly of polystyrene-b-poly(fluoro methacrylate) into sub-5 nm microdomains for nanopatterning applications, Journal Of Materials Chemistry C, 2019, 7(9): 2535-2540.被引用次数：34
Chenxu Wang; Xuemiao Li; Hai Deng*, Synthesis of a Fluoromethacrylate Hydroxystyrene Block Copolymer Capable of Rapidly Forming Sub-5 nm Domains at Low Temperatures, ACS Macro Letters, 2019, 8(4): 368-373.被引用次数：42
Hui Cao; Le Dai; Yuyun Liu; Xuemiao Li; Zhenyu Yang; Hai Deng*, Methacrylic Block Copolymers Containing Liquid Crystalline and Fluorinated Side Chains Capable of Fast Formation of 4 nm Domains, Macromolecules, 2020, 53(20): 8757-8764.被引用次数：11
Xuemiao Li; Hai Deng*, Poly(2-vinylpyridine) b poly(fluorinated methacrylate) Block Copolymers Forming 5 nm Domains Containing Metallocene,Acs Applied Polymer Materials, 2020, 2(8): 3601-3611.被引用次数：12
Hai Deng*; Jianuo Zhou; Xuemiao Li; Zhenyu Yang, Si containing block copolymers quickly assemble into sub-6 nm domains, Polymer Chemistry, 2022, 13(43): 6098-6107.
Min Cao; Hai Deng*, Synthesis and Properties of Polyol Copolymer with Alternating Methacrylate–Vinyl Ether Backbone, Macromolecular Rapid Communications, 2022, 44(5): 2200796.
Hai Deng; Douglas L. Gin*; Ryan C. Smith, Polymerizable Lyotropic Liquid Crystals Containing Transition-Metal and Lanthanide Ions: Architectural Control and Introduction of New Properties into Nanostructured Polymers, Journal Of The American Chemical Society, 1997, 120(14): 3522-3523.被引用次数：108
Hai Deng; Hans Winkelbach; Kazuyoshi Taeji; Walter Kaminsky; Kazuo Soga*, Synthesis of High-Melting, Isotactic Polypropene withC2- andC1-Symmetrical Zirconocenes, Macromolecules, 1996, 29(20): 6371-6376.被引用次数：39
Hai Deng; Shokyoku Kanaoka; Mitsuo Sawamot*; Toshinobu Higashimura*, Synthesis of Star-Shaped Poly(p-Alkoxystyrenes) by Living Cationic Polymerization, Macromolecules, 1996, 29(5): 1772-1777.被引用次数：26
Hai Deng; Kazuo Soga*, Isotactic Polymerization of tert-Butyl Acrylate with Chiral Zirconocene, Macromolecules, 1996, 29(5): 1847-1848.被引用次数：67
Hai Deng; Takeshi Shiono; Kazuo Soga*, Isospecific Polymerization of Methyl Methacrylate Initiated by Chiral Zirconocenedimethyl/Ph3CB(C6F5)4 in the Presence of Lewis Acid, Macromolecules, 1995, 28(9): 3067-3073.被引用次数：158
Kazuo Soga*; Hai Deng; Takuya Yano; Takeshi Shiono, Stereospecific Polymerization of Methyl Methacrylate Initiated by Zirconocene dimethyl/B(C6F5)3 (or Ph3C B(C6F5)4)/Zn(C2H5)2, Macromolecules, 1994, 27(26): 7938-7940.被引用次数：140
Seung Wook Chang; Ramakrishnan Ayothi; Daniel Bratton; Da Yang; Nelson Felix; Heidi B.Cao; Hai Deng; Christopher K.Ober*, Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography, Journal of Materials Chemistry A, 2006, 16(15): 1470.被引用次数：110
Daniel Bratton; Ramakrishnan Ayothi; Hai Deng; Heidi B.Cao; Christopher K.Ober*, Diazonaphthoquinone Molecular Glass Photoresists: Patterning without Chemical Amplification, Chemistry of Materials, 2007, 19(15): 3780-3786.被引用次数：48
Anuja De Silva; Jin-Kyun Lee; Xavier André; Nelson M.Felix; Heidi B.Cao; Hai Deng; Christopher K.Ober*, Study of the Structure?Properties Relationship of Phenolic Molecular Glass Resists for Next Generation Photolithography, Chemistry of Materials, 2008, 20(4): 1606-1613.被引用次数：68
Le Dai; Hui Cao; Hai Deng*, Highly Ordered Methacrylate Block Copolymers Containing Liquid Crystal Side Chains, Journal Of Photopolymer Science And Technology, 2020, 33(5): 541-544.
Guangya Wu; Hai Deng*, High Etch Resistant Ferrocene-Containing Block Copolymers with 5 nm Patterning Capability, Journal Of Photopolymer Science And Technology, 2020, 33(5): 537-540.
Xuemiao Li; Zhilong Li; Le Dai; Hui Cao; Hai Deng*, Block Copolymers with a Fluoro-block for 5 nm DSA Patterning Application, Proceedings of SPIE, 2020, 11326: 113261E.
Hui Cao; Xuemiao Li; Yuyun Liu; Hai Deng*, Synthesis of Liquid Crystalline Block Copolymers Self-assembled into Sub-5 nm Microdomains, Journal Of Photopolymer Science And Technology, 2019, 32(3): 413-416.
Zhilong Li; Hai Deng*, Synthesis of Fluorine-containing Polyacrylamide Block Copolymer and Their Application for Rapidly Formation of Sub-10 nm Microdomains, Journal Of Photopolymer Science And Technology, 2019, 32(3): 389-393.
Xuemiao Li; Chenxu Wang; Jianuo Zhou; Zhenyu Yang; Yan Zhang; Hai Deng*, Ultra-Fast Block Copolymers for Sub-5 nm Lithographic Patterning, Journal Of Photopolymer Science And Technology, 2018, 31(4): 483-486.
Hai Deng*; Xuemiao Li; Yu Peng; Jianuo Zhou, Fast annealing DSA materials designed for sub-5 nm resolution, Proceedings of SPIE, 2018, 10586: 105861E.
Xuemiao Li; Jie Li; Hai Deng*, Synthesis and Directed Self-Assembly of Modified PS-b-PMMA for Sub-10 nm Nanolithography, Journal Of Photopolymer Science And Technology, 2017, 30(1): 83-86.
Hai Deng; Takeshi Shiono; Kazuo Soga*, Polymerization of methyl methacrylate with achiral 4B group metallocene compounds, Macromolecular Chemistry And Physics, 1995, 196(6): 1971-1980.被引用次数：46
Jie Li; Xuemiao Li; Hai Deng*, Design and synthesis of novel directed self-assembly block copolymers for sub-10nm lithography application, China Semiconductor Technology International Conference, 2017, 1-3.
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