Hoffman, David - University of Houston - Department of Chemistry

个人简介

Postdoctoral Associate, Indiana University, 1982-84 Ph.D., Cornell University, 1982 B.S., Miami University (Ohio), 1977

研究领域

Inorganic and Materials Chemistry The research in my group is centered on synthesis. Our studies emphasize the synthesis of main group and transition metal organometallic and metal-organic compounds and the preparation of inorganic thin films from molecular precursors by using the technique of chemical vapor deposition. Inorganic thin films are technologically important materials used, for example, in the manufacture of microelectronic and optical devices, and chemical vapor deposition is a simple, economical, and technologically flexible method for preparing the films. Research projects in my group typically involve three components: The design, synthesis, and complete characterization of new molecular compounds for use as thin film precursors; the preparation of films using home-built chemical vapor deposition apparatus; and extensive film characterization studies using a variety of analytical techniques (e.g., X-ray photoelectron spectroscopy, scanning electron microscopy, backscattering spectrometry, FT-IR and UV-VIS spectroscopy, etc.). Fundamental synthetic and reactivity studies related to the precursor syntheses are often coupled to the projects. In addition, design and fabrication work is usually necessary to modify an existing chemical vapor deposition apparatus or build a new apparatus when a project is started. Current research projects include the synthesis of main group and transition metal alkoxide, main group thiolate and sulfide, and transition metal amide and hydrazide complexes for use as precursors to the corresponding oxide, sulfide, and nitride films, respectively.

近期论文

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"Synthesis of Indium Amide Compounds," J. Kim, S. G. Bott, and D. M. Hoffman, Inorg. Chem., 37, 3835 (1998). "Indium Tris(alkylthiolate) Compounds," S. Suh and D. M. Hoffman, Inorg. Chem., 37, 5823-5826 (1998). "Synthesis and Structures of Gallium Alkylthiolate Compounds," S. Suh, J. H. Hardesty, T. A. Albright, and D. M. Hoffman, Inorg. Chem., 38, 1627 (1999). "Indium Fluoroalkoxide Complexes," L. A. Mîinea, S. Suh, and D. M. Hoffman, Inorg. Chem., 38, 4447 (1999). "Chemical Vapor Deposition of Gallium Sulfide Thin Films," S. Suh and D. M. Hoffman, Chem. Mater., 12, 2794 (2000). "Synthesis of Aluminum and Gallium Fluoroalkoxide Compounds and the Low Pressure Metal-Organic Chemical Vapor Deposition of Gallium Oxide Films," L. A. Mîinea, S. Suh, J. -R. Liu, W. -K.Chu, and D. M. Hoffman, J. Mater. Chem., 9, 929 (1999). "General Synthesis of Homoleptic Indium Alkoxide Complexes and the Chemical Vapor Deposition of Indium Oxide Films," S. Suh and D. M. Hoffman, J. Am. Chem. Soc., 122, 9396 (2000). "Low Pressure Chemical Vapor Deposition of Fluorine-Doped Indium Oxide Films from an Indium Alkoxide Complex," L. A. Mîinea and D. M. Hoffman, J. Mater. Chem., 10, 2392 (2000). "Synthesis of Homoleptic Gallium Alkoxide Complexes and the Chemical Vapor Deposition of Gallium Oxide Films," M. Valet and D. M. Hoffman, Chem. Mater., in press.