曾理江 - 清华大学 - 精密仪器系

个人简介

教育背景 1979.09－1983.08 北京工业学院（现北京理工大学），光学工程系，本科 1983.09－1986.08 北京工业学院（现北京理工大学），光学工程系，硕士 1986.09－1989.08 清华大学，精仪系，博士工作履历 1989.09－1992.03 航天部207所，高级工程师 1992.04－1993.03 日本工业技术院（现产业技术综合研究所）计量研究院，客员研究员 1993.04－1997.09 日本科技厅，科学事业振兴事业团，研究员 1997.10－至今　清华大学精仪系，1998年提升教授

研究领域

主要研究包括大尺寸光栅的制作技术，光栅的离子束刻蚀及实时监测技术，中阶梯光栅的制作，光栅掩膜的无损检测，光栅参数高精度测量等。也包括光栅在计量中的应用，如二维光栅尺，基于光栅的外差调制技术，外差型傅立叶变换光谱仪等。

近期论文

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2022 Chenlu Xu, Yuxuan Zhao, and Lijiang Zeng, Low-stray-light gratings fabricated with scanning exposure method based on Lloyd's mirror for high contrast near-eye display in augmented reality, Applied Optics, Vol. 61, No. 19，5626 (2022) 2021 Yuxuan Zhao , Lijiang Zeng,* and Lifeng Li，Application of broad-beam scanning exposure to fabricate low-wavefront-error holograpphic gratings, Optical Engineering, 60(4),047105 (2021) 2020 Vunam Le, Guanhao Wu* and Lijiang Zeng，Coma optimization in single spherical collimating lens based dual-beam exposure system，Optical Engineering，59(9), 094103 (2020). Qimeng Wang, Xinyu Mao and Lijiang Zeng, Improved 2D continuously variable output couplers for an exit pupil expander fabricated through ion beam etching, Applied Optics, 59, 6203 (2020) Vunam Le, Guanhao Wu* and Lijiang Zeng，A single collimation lens based dual-beam exposure system for fabricating long-period grating，Optics Communications 460, 125139 (2020) Xinyu Mao, Chaoming Li,?, Keqiang Qiu,?, Lijiang Zeng， Lifeng Li, Xinrong Chen, Jianhong Wu, Zhengkun Liu, Shaojun Fu, Yilin Hong，Design and fabrication of 1300-line/mm polarization-independent reflection gratings for spectral beam combining，Optics Communications 458, 124883 (2020) 2019 Xinwei Chen and Lijiang Zeng, Aberration-reduced spherical concave grating holographically recorded by a spherical wave and a toroidal wave for Rowland circle Mounting, Optics Express, 27(3), 3294-3304 (2019) 2018 Xinwei Chen and Lijiang Zeng, Astigmatism-reduced spherical concave grating holographically recorded by a cylindrical wave and a plane wave for Rowland circle mounting, Applied Optics, 57, 257281-06 (2018) Xinyu Mao and Lijiang Zeng, Design and fabrication of crossed gratings with multiple zero-reference marks for planar encoders, Measurement science and technology, 29, 025204 (2018) 2017 Donghan Ma and Lijiang Zeng, Reducing the stray light of holographic gratings by shifting the substrate a short distance in the direction parallel or perpendicular to the exposure interference fringes, Chin. Opt. Lett. 15(10), 100501(2017) Donghan Ma, Shiwei Wang, and Lijiang Zeng, Wavefront aberration of plane diffraction gratings fabricated in a Lloyd's mirror interferometer, J. Micro/Nanolith. MEMS MOEMS 16(2), 023503 (2017) Donghan Ma, Yuxuan Zhao and Lijiang Zeng，Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment，Scientific reports, 7: 926 | DOI:10.1038/s41598-017-01099-3 (2017) Hengyan Zhou, Lijiang Zeng，Optical mosaic method for orthogonally crossed gratings by utilizing information about both main periodic directions simultaneously, Optics Communications 385, 181–187 (2017)