个人简介

¨ Ph. D Department of Chemistry, The University of Western Ontario, London, Ontario, Canada ¨ B. Sc & M. Sc School of Chemistry and Chemical Engineering, Soochow University, Soochow, P. R. China

研究领域

Physical Chemistry

Research interests are in the applications of laser analytical and spectroscopic techniques. Of particular interest is the investigation of the structures, energetics and dynamics of radicals and intermediates formed in the processes of Hot Wire Chemical Vapor Deposition (HW-CVD) of semiconductor thin films. HW-CVD is a new technology to produce device quality silicon-based thin films, which are found to have large potential in low-cost optoelectronic devices (e.g. solar cells) and thin film transistors. A lot of effort has been made to understand the mechanism of thin film growth in HW-CVD, however the processes remain poorly understood. It is our goal to provide insight into the fundamental chemistry and physics involved in HW-CVD processes and to apply the scientific findings to optimize the thin film formation process to get superior quality films in industrial settings. The experimental techniques include supersonic jet / molecular beam, vacuum ultraviolet (VUV) single-photon ionization (SPI) / time-of-flight mass spectrometry (TOF-MS), resonance-enhanced multiphoton ionization (REMPI) spectroscopy, laser induced fluorescence (LIF), and zero-kinetic energy (ZEKE) photoelectron / mass analyzed threshold ionization (MATI) spectroscopy. VUV SPI / TOF-MS is an ideal and universal tool to identify important gas-phase radical intermediates generated in the HW-CVD processes. The spectroscopic properties of these radicals, including the electronic, vibrational and rotational structures of neutral and ionic species, ionization potentials etc., can be probed by REMPI, LIF, ZEKE / MATI techniques. It is anticipated that many of the species to be studied will be new.

近期论文

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Y. J. Shi*, L. Tong, S. Mulmi (2016), Characterization of Thin Film Deposits on Tungsten Filaments in Catalytic hemical Vapor Depsoition Using 1,1-Dimethylsilacyclobutane, J. Vac. Sci. Technol. A, 34, 051517-1 - 051517-7. (DOI: 10.1116/1.4961932) (Featured Article and Cover Article) E. Owusu-Ansah, Y. M . Wang, Y. J. Shi* (2016), A Theoretical Study of the Structures and ELectronic Transitions of Small Silicon Nitride Clusters (SinNm, n + m ≤ 4), J. Mol. Spectros. in press. (DOI: 10.1016/j.jms.2016.08.005) R. Toukabri, Y. J. Shi* (2016), Hydrogen Elimination from the Dissociation of Methyl-substituted Silanes on Tungsten and Tantalum Surfaces, Can. J. Chem. 94, 265-272, Calgary 50th Anniversary Special Issue. (DOI: 10.1139/cjc-2015-0166) I. Badran, W. H. Kan, Y. J. Shi* (2015), Structure Changes in Tungsten and Tantalum Wires in Catalytic Chemical Vapor Deposition Using 1,3-Disilacyclobutane, J. Phys. Chem. C, 119, 19134 - 19142. (DOI:10.1021/acs.jpcc.5b04613) I. Badran, Y. J. Shi* (2015), Gas-phase Reaction Kinetics of 1,3-Disilacyclobutane in a Hot-wire Chemical Vapor Deposition Reactor, Thin Solid Films, 595, 2390243. (DOI: 10.1016/j.tsf.2015.06.055) E. Owusu-Ansah, C. A. Horwaood, H. A. El-Sayed, V. I. Birss, Y. J. Shi* (2015), A Method for the Formation of Pt Metal Nanoparticle Arrays Using Nanosecond Pulsed Laser Dewetting, Appl. Phys. Lett. 106, 203103-1 - 203103-5, 2015. (DOI: 10.1063/1.4921528) H. A. El-Sayed, C. A. Horwaood, E. Owusu-Ansah, Y. J. Shi, V. I. Birss* (2015), Gold Nanoparticle Array Formation on Dimpled Ta Templates Using Pulsed Laser-induced Thin Film Dewetting, Phys. Chem. Chem. Phys. 17, 11062-11069, 2015. (DOI: 10.1039/c5cp00924c) I. Badran, Y. J. Shi* (2015), Promotion of Exocyclic Bond Cleavages in the Decomposition of 1,3-Disilacyclobutane in the Presence of a Metal Filament, J. Phys. Chem. A, 119, 590-600, 2015. (DOI: 10.1021/jp511716x) Y. J. Shi* (2015), Hot Wire Chemical Vapor Deposition Chemistry in the Gas Phase and on the Catalyst Surface with Organonsilicon Compounds, Acc. Chem. Res. 48, 163-173, 2015 (invited review). (DOI: 10.1021/ar500241x) R. Toukabri, Y. J. Shi* (2015), Effect of Pressure in the Gas-phase Chemistry when Using MMS and DMS in Hot-wire Chemical Vapor Deposition, Can. J. Chem. Western Special Issue,93, 82-90, 2015. (DOI: 10.1139/cjc-2014-0238) R. Toukabri, Y. J. Shi* Dominance of Silylene Chemistry in the Decomposition of Monomethyl-silane in the Presence of a Heated Metal Filament, J. Phys. Chem. A 118, 3866-3874, 2014. (DOI: 10.1021/jp502795u). R. Toukabri, Y. J. Shi*, Unraveling the Complex Chemistry using Dimethylsilane as a Precursor Gas in a Hot-wire Chemical Vapor Deposition, Phys. Chem. Chem. Phys. 16, 7896-7906, 2014. (DOI: 10.1039/c4cp00275j) R. Toukabri, Y. J. Shi*, Effect of Trimethylsilane Pressure on Gas-phase Reaction Chemistry in the Hot-Wire Chemical Vapour Deposition process, J. Vac. Sci. Technol. A, 31, 061606 -1 - 061606-8, 2013. (DOI: 10.1116/1.4825105) R. Toukabri, N. Al-Kadhi, Y. J. Shi*, Formation of Methyl Radicals from Decomposition of Methyl-substituted Silanes over Tungsten and Tantalum Filament surfaces, J. Phys. Chem. A, 117, 7697 - 7704, 2013. (DOI: 10.1021/jp404882t) Y. J. Shi*, I. Badran, A. Tkalych, W. H. Kan, V. Thangadurai, Growth of Tungsten Carbides using 1,1,3,3-tetramethyl-1,3-disilacyclobutane on a Heated Tungsten Filament, J. Phys. Chem. C, 117, 3389 - 3395, 2013. (DOI: 10.1021/jp3112777) I. Badran, A. Rauk, Y. J. Shi*, A Theoretical Study on the Ring Opening of 1,3-disilacyclobutane and H2 Elimination, J. Phys. Chem. A, 116, 11806 - 11816 , 2012. (DOI: 10.1021/jp3087122) I. Badran, T. D. Forster, R. Roesler, Y. J. Shi*, Competition of Silene/Silylene Chemistry with Free-radical Chain Reactions using 1-methylsilacyclobutane in the Hot-wire Chemical Vapor Deposition Process, J. Phys. Chem. A, 116, 10054-10062, 2012. (DOI: 10.1021/jp3055558) (Cover Article) A. M. Colcite, Y. J. Shi, K. K. Gleason*, Grafted Crystallined Poly-perfluoroacylate Thin Films for Superhydrophobic and Oleophobic Functional Coatings, Adv. Mater. 24, 4534-4539, 2012.(DOI: 10.1002/adma.201200682) Z. J. Cai, Y. J. Shi*, Asymmetrically Distorted Structures of Monosilacyclobutane and Disila-cyclobutane Radical Cations Studied by ab initio and Density Functional Theories, Can J. Chem. 90, 584-596, 2012. (DOI: 10.1139/V2012-035) A. M. Colcite, Y. J. Shi, K. K. Gleason*, Controlling the Degree of Crystallinity and the Preferred Crytallographic Orientation in poly-perfluorodecylacrylate thin films by initiated Chemical Vapor Deposition, Adv. Funct. Mat. 22, 2167-2176, 2012. (DOI: 10.1002/adfm.201103035)