路新春 - 清华大学 - 机械工程系

个人简介

教育背景 1991.09-1994.03 中国科学院金属研究所材料腐蚀与防护，博士 1988.09-1991.01 吉林工业大学材料科学与工程，硕士 1984.09-1988.07 吉林工业大学材料科学与工程，学士工作履历 2013/01-至今, 清华大学，机械工程系，首席研究员 2003/01-2012/12,清华大学，精密仪器与机械学系，研究员 1996.04-2002.12，清华大学，精密仪器与机械学系，副研究员 1994.04-1996.03，清华大学，机械工程博士后、讲师奖励与荣誉国家自然科学奖（2018年）排名三中国高校自然科学一等奖（2010年）排名四国家科技进步二等奖（2008年）排名二教育部科技进步一等奖（2005年）排名二中国高校自然科学一等奖（2001年）排名五国家教委科技进步奖二等奖（1998年）排名二中国科学院自然科学三等奖（1998年）排名三

研究领域

微纳制造：纳米或亚纳米精度表面制造是纳米科技的重要领域，研究对象包括纳米精度表面制造的原理、工艺及装备，涉及到机械、材料、力学、化学、物理等多学科交叉。表面界面微/纳摩擦学理论和应用：纳米摩擦学是传统摩擦学的延伸，研究对象包括纳米表面界面的微纳米摩擦学行为与机理，纳米间隙润滑规律等。

近期论文

查看导师新发文章（温馨提示：请注意重名现象，建议点开原文通过作者单位确认）

Hegeng Mei, Xinchun Lu, The quantitative description between zeta potential and fluorescent particle adsorption on Cu surface, SURFACE AND INTERFACE ANALYSIS, 46(2014), 56-60 Zhimin Chai, Yuhong Liu, Xinchun Lu, Dannong He, Reducing Adhesion Force by Means of Atomic Layer Deposition of ZnO Films with Nanoscale Surface Roughness, ACS APPLIED MATERIALS & INTERFACES, 6(2014), 3325-3330 Zhimin Chai, Yuhong Liu, Xinchun Lu, Dannong He, Nanotribological Behavior of Ultra-thin Al2O3 Films Prepared by Atomic Layer Deposition, TRIBOLOGY LETTERS, 55(2014), 143-149 Jing Li, Yuhong Liu, Yuanjing Dai, Dachuan Yue, Xinchun Lu, Jianbin Luo, Achievement of a near-perfect smooth silicon surface, SCIENCE CHINA TECHNOLOGICAL SCIENCES, 56(2013),2847-2853 Tongqing Wang, Xinchun Lu, Dewen Zhao, Yongyong He, Jianbin Luo, Optimization of design of experiment for chemical mechanical polishing of a 12-inch wafer, MICROELECTRONIC ENGINEERING, 112(2013), 5-9 Jing Li, Yuhong Liu, Xinchun Lu, Jianbin Luo, Yuanjing Dai, Material Removal Mechanism of Copper CMP from a Chemical–Mechanical Synergy Perspective, TRIBOLOGY LETTERS, 49(2013), 11-19 Hongkai Li, Zilian Qu, Qian Zhao, Fangxin Tian, Dewen Zhao, Yonggang Meng, Xinchun Lu, A reliable control system for measurement on film thickness in copper chemical mechanical planarization system, REVIEW OF SCIENTIFIC INSTRUMENTS, 84(2013), 125101 Guiquan Han, Yuhong Liu, Xinchun Lu, Jianbin Luo, A flexible nanobrush pad for the chemical mechanical planarization of Cu/ultra-low-к materials, NANOSCALE RESEARCH LETTERS, 7(2012),1-5 Yan Pan, Yuhong Liu, Xinchun Lu, Guoshun Pan, Jianbin Luo, The Role of Hydroxyethyl Cellulose (HEC) in the Chemical Mechanical Planarization of Copper, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 159(2012), H329-H334 Zhimin Chai, Xinchun Lu, Dannong He, Atomic Layer Deposition of Zinc Oxide Films: Effects of Nanocrystalline Characteristics on Tribological Performance, SURFACE & COATINGS TECHNOLOGY, 207(2012), 361-366 Dewen Zhao, Yongyong He, Xinchun Lu, In situ measurement of fluid pressure at the wafer-pad interface during chemical mechanical polishing of 12-inch wafer, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 159(2011), H22-H28 Yating Huang, Dan Guo, Xinchun Lu, Jianbin Luo, Modeling of particle removal processes in brush scrubber cleaning, WEAR, 273(2011), 105-110