当前位置: X-MOL首页全球导师 海外导师 › Long, Brian

研究领域

Catalysis, Environmental Chemistry, Materials Chemistry, Synthetic Chemistry

近期论文

查看导师最新文章 (温馨提示:请注意重名现象,建议点开原文通过作者单位确认)

Njiojob, C. N.; Rhinehart, J. L.; Bozell, J. J.; Long, B. K. "Synthesis of Enantiomerically Pure Lignin Dimer Models for Catalytic Selectivity Studies" J. Org. Chem, 2015, 80, 1771. DOI: 10.1021/jo502685k Bell, W. K.; Rawlings, B. M.; Long, B. K.; Webb, R. C.; Keitz, B. K.; Häußling, L.; Willson, C. G. "Poling and crosslinking processes in NLO polymers" J. Poly. Sci., A 2014, 52, 2769. DOI: 10.1002/pola.27298 Rhinehart, J. L.; Mitchell, N. A.; Long, B. K. "Enhancing α-Diimine Catalysts for High-Temperature Ethylene Polymerization" ACS Catalysis 2014, 4, 2501. DOI: 10.1021/cs500694m Rhinehart, J. L.; Brown, L. A.; Long, B. K. "A Robust Ni(II) α-Diimine Catalyst for High Temperature Ethylene Polymerization" J. Am. Chem. Soc. 2013, 135, 16316. DOI: 10.1021/ja408905t Bruce, R. L.; Lin, T.; Phaneuf, R. J.; Oehrlein, G. S.; Bell, W.; Long, B.; Willson C. G., “Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma” J. Vac. Sci. Tech., B 2010, 28, 751. DOI: 10.1116/1.3455496 Bruce, R. L.; Weilnboeck, F.; Lin, T.; Phaneuf, R. J.; Oehrlein, G. S.; Long, B. K.; Willson, C. G.; Vegh, J. J.; Nest, D.; Graves, D. B., “Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films” J. Appl. Phys. 2010, 107, 084310. DOI: 10.1063/1.3373587. Nest, D.; Chung, T-Y.; Végh, J. J.; Graves, D. B.; Bruce, R. L.; Lin, T.; Phaneuf, R. J.; Oehrlein, G. S.; Long, B. K.; Willson, C. G., “Role of polymer structure and ceiling temperature in polymer roughening and degradation during plasma processing: a beam system study of P4MS and PαMS” J. Phys. D: Appl. Phys. 2010, 43, 085204. DOI: 10.1088/0022-3727/43/8/085204. Costner, E.; Long, B. K.; Navar, C.; Jockusch, S.; Lei, X.; Zimmerman, P.; Campion, A.; Turro, N.; Willson, C. G., "Fundamental Optical Properties of Linear and Cyclic Alkanes: VUV Absorbance and Index of Refraction" J. Phys. Chem. A 2009, 113, 9337. DOI: 10.1021/jp903435c. Bruce, R. L.; Engelmann, S.; Lin, T.; Kwon, T.; Phaneuf, R.; Oehrlein, G. S.; Long, B. K.; Willson, C.; Végh, J.; Nest, D.; Graves, D. B.; Alizadeh, A., “Investigation of Plasma-Polymer Interactions for Patterning Nanostructures” J. Vac. Sci. Tech., B 2009, 27, 1142. DOI: 10.1116/1.3136864 Végh, J. J.; Nest, D.; Graves, D. B.; Bruce, R.; Engelmann, S.; Kwon, T.; Phaneuf, R. J.; Oehrlein, G. S.; Long, B. K.; Willson, C. G., “Molecular dynamics simulations of near-surface modification of polystyrene: Bombardment with Ar+ and Ar+/radical chemistries” J. Appl. Phys. 2008, 104, 034308. DOI: 10.1063/1.2963708. Heath, W. H.; Palmieri, F.; Adams, J. R.; Long, B. K.; Chute, J.; Holcombe, T.; Zieren, S.; Truitt, M. J.; White, J. L.; Willson, C. G., “Degradable Cross-Linkers and Strippable Imaging Materials for Step-and-Flash Imprint Lithography” Macromolecules 2008, 41, 719. DOI: 10.1021/ma702291k. Végh, J. J.; Nest, D.; Graves, D. B.; Bruce, R.; Engelmann, S.; Kwon, T.; Phaneuf, R.; Oehrlein, G. S.; Long, B. K.; Willson, C., “Near-Surface Modification of Polystyrene by Ar+: Molecular Dynamics Simulations and Experimental Validation” Appl. Phys. Lett. 2007, 91, 233113. DOI: 10.1063/1.2821226. Palmieri, F.; Adams, J.; Long, B. K.; Heath, W.; Tsiartas, P.; Willson, C. G., “Strippable Imprint Resist Cross-Linkers for Step and Flash Imprint Lithography®” ACS Nano 2007, 1, 307. DOI: 10.1021/nn7001079. Long, B. K.; Keitz, B. K.; Willson, C. G., “Materials for Step and Flash Imprint Lithography (S-FIL®)” J. Mat. Chem. 2007, 17, 3575. DOI: 10.1039/b705388f. Featured on the cover of issue #34 (September 14, 2007). Grayson, S. M.; Long, B. K.; Kusomoto, S.; Osborn, B. P.; Callahan, R. P.; Chambers, C. R.; Willson, C. G., “Synthesis and Characterization of Norboranediol Isomers and Their Fluorinated Analogues” J. Org. Chem. 2006, 71, 341-344. DOI: 10.1021/jo0513156. Non-Peer Reviewed Publications, Preprints, and Proceedings Rawlings, B. M.; Long, B. K.; Keitz, B. K.; Webb, R. C.; Willson, C. G., “Photoactive cross-linkable polymers for nonlinear optical applications” Abstracts of Papers, 10th International Conference on Nonlinear Optics 2008. Long, B. K.; Keitz, B. K.; Webb, R. C.; Willson, C. G., “Photocross-linkable polymers for electro-optic applications” POLY Preprints 2008, 49, 264. Costner, E.; Matsumoto, K.; Taylor, J. C.; Long, B. K.; Wojtczak, W.; Willson, C. G., “New High Index Fluids: Exploiting Anomalous Dispersion for Immersion Lithography” Proc. SPIE, Int. Soc. Opt. Eng. (Pt. 1) 2008, 6923. DOI: 10.1117/12.772979.

推荐链接
down
wechat
bug