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[1]Pu Zhang,Di Lin,Yongqiao Zhu,Wenzhe Cai,Dawei Li,Cheng Xu*,In-situ high temperature laser-induced damage of sol-gel Ta2O5 films with different dual additives,Thin Solid Films,2020,693:137723.
[2]Wenzhe Cai,Yingtian Yang,Yongqiao Zhu,Dawei Li,Cheng Xu*,Preparation of high laser-induced damage threshold sol-gel Nb2O5 films with different additives,Optik,2020,206:164306.
[3]Yongqiao Zhu,Ming Ma,Pu Zhang,Wenzhe Cai,Dawei Li,Cheng Xu*,Preparation of sol-gel ZrO2 films with high laser-induced damage threshold under high temperature,Opt.Express,2019,27:37568-37578.
[4]Cheng Xu,Binbin Zhang,Aurelia Chi Wang,Wenzhe Cai,Yunlong Zi,Peizhong Feng,Zhong Lin Wang,Effects of metal work function and contact potential difference on electron thermionic emission in contact electrification,Adv.Funct.Mater.,2019,29:1903142.
[5]Cheng Xu,Binbin Zhang,Aurelia Chi Wang,Haiyang Zou,Guanlin Liu,Wenbo Ding,Changsheng Wu,Ming Ma,Peizhong Feng,Zhiqun Lin,Zhong Lin Wang,Contact-electrification between two identical materials:curvature effect,ACS Nano,2019,13:2034−2041.
[6]Cheng Xu,Aurelia Chi Wang,Haiyang Zou,Binbin Zhang,Chunli Zhang,Yunlong Zi,Lun Pan,Peihong Wang,Peizhong Feng,Zhiqun Lin,Zhong Lin Wang,Raising the working temperature of a triboelectric nanogenerator by quenching down electron thermionic emission in contact-electrification,Adv.Mater.,2018,30:1803968.
[7]Cheng Xu,Yunlong Zi,Aurelia Chi Wang,Haiyang Zou,Yejing Dai,Xu He,Peihong Wang,Yi-Cheng Wang,Peizhong Feng,Dawei Li,Zhong Lin Wang,On the electron-transfer mechanism in the contact-electrification effect,Adv.Mater.,2018,30:1706790.
[8]Di Lin,Cheng Xu*,Ming Ma,Weitong Shan,Peizhong Feng,Dawei Li,Exploration of the key parameters in sol-gel preparation of Ta2O5 films with high laser damage resistance,Optoelectron.Adv.Mat.,2017,11:357-363.
[9]Ming Ma,Cheng Xu*,Di Lin,Huanhuan Sun,Enzhu Lin,Peizhong Feng,Yinghuai Qiang,Dawei Li,Temperature effect on the nanosecond laser-induced damage of TiO2 films with two additives,J.Optoelectron.Adv.M.,2017,19:189-196.
[10]Cheng Xu,Dawei Li,Heliang Fan,Jianxin Deng,Jianwei Qi,Peng Yi,Yinghuai Qiang,Effects of different post-treatment methods on optical properties,absorption and nanosecond laser-induced damage threshold of Ta2O5 films,Thin Solid Films,2015,580:12-20.
[11]Cheng Xu,Dawei Li,Heliang Fan,Jianwei Qi,Jianxin Deng,Shuai Yang,Peng Yi,Yinghuai Qiang,Laser-induced damage of Ta2O5 films obtained from TaCl5 precursor and annealed at different temperatures,Appl.Surf.Sci.,2015,344:137-145.
[12]Cheng Xu,Di Lin,Jinan Niu,Yinghuai Qiang,Dawei Li,Chunxian Tao,Preparation of Ta-doped TiO2 using Ta2O5 as the doping source,Chin.Phys.Lett.,2015,32:088102.
[13]Cheng Xu,Heliang Fan,Dawei Li,Jianwei Qi,Shuai Yang,Yinghuai Qiang,Comparative studies on the laser-induced damage of TiO2 films with different additives and thickness,Optik,2015,126:5478-5482.
[14]Cheng Xu,Ming Ma,Huanhuan Sun,Di Lin,Peizhong Feng,Jianwei Qi,Yinghuai Qiang,Dawei Li,Chunxian Tao,Study on the relationship between laser-induced damage threshold and microscopic properties of Ta2O5 films by the combination of experiment and simulation,Optoelectron.Adv.Mat.,2015,9:1337-1341.
[15]Cheng Xu,Di Lin,Peizhong Feng,Dawei Li,Heliang Fan,Jianwei Qi,Jinan Niu,Yinghuai Qiang,Influencing factors in the laser-induced damage threshold of Ta2O5 films prepared with different methods,J.Optoelectron.Adv.M.,2015,17:1739-1746.
[16]Cheng Xu,Jiaojiao Jia,Di Yang,Heliang Fan,Yinghuai Qiang,Jiongtian Liu,Guohang Hu,Dawei Li,Nanosecond laser-induced damage at different initial temperatures of Ta2O5 films prepared by dual ion beam sputtering,J.Appl.Phys.,2014,116:053102.
[17]Cheng Xu,Peng Yi,Heliang Fan,Jianwei Qi,Shuai Yang,Yinghuai Qiang,Jiongtian Liu,Dawei Li,Preparation of high laser-induced damage threshold Ta2O5 films,Appl.Surf.Sci.,2014,309:194-199.
[18]Cheng Xu,Peng Yi,Heliang Fan,Jianwei Qi,Yinghuai Qiang,Jiongtian Liu,Chunxian Tao,Dawei Li,Correlations between the oxygen deficiency and the laser damage resistance of different oxide films,Appl.Surf.Sci.,2014,289:141-144.
[19]Cheng Xu,Shuai Yang,Zheng Wang,Jianxin Deng,Yulong Zhao,Heliang Fan,Yinghuai Qiang,Dawei Li,Laser-induced damage threshold of TiO2films with different preparation methods and annealing temperatures,Chin.Phys.Lett.,2014,31:074207.
[20]Cheng Xu,Shuai Yang,Yinghuai Qiang,Jiongtian Liu,Jianyong Ma,Wide band polarization independent reflector based on guided mode resonance effect in three-level silicon-based element,Opt.Laser Technol.,2013,45:42-45.
[21]Cheng Xu,Shuai Yang,Yinghuai Qiang,Jiongtian Liu,Jianyong Ma,Wide band polarization independent reflector based on guided mode resonance effect in germanium grating,Optik,2013,124:3033-3035.
[22]Cheng Xu,Shuai Yang,Shenghui Zhang,Jinan Liu,Yinghuai Qiang,Jiongtian Liu,Dawei Li,Temperature dependence of optical properties,chemical composition,structure and laser damage in Ta2O5 films,Chin.Phys.B,2012,21:114213.
[23]Cheng Xu,Shuai Yang,Jifei Wang,Jinan Liu,Hao Ma,Yinghuai Qiang,Jiongtian Liu,Dawei Li,Chunxian Tao,Effect of oxygen vacancy on the band gap and nanosecond laser-induced damage threshold of Ta2O5films,Chin.Phys.Lett.,2012,29:084207.
[24]Cheng Xu,Linmin Xu,Yinghuai Qiang,Yabo Zhu,Jiongtian Liu,Jianyong Ma,Excellent polarization independent reflector based on guided mode resonance effect,Chin.Phys.B,2011,20:104210.
[25]Cheng Xu,Linmin Xu,Hanzhuo Zhang,Yinghuai Qiang,Yabo Zhu,Jiongtian Liu,Jianda Shao,Comparative studies on the laser damage resistance of Ta2O5 and Nb2O5films performed under different electron beam currents,Chin.Phys.Lett.,2011,28:064211.
[26]Cheng Xu,Yulong Zhao,Yinghuai Qiang,Yabo Zhu,Litong Guo,Jianda Shao,Comparison of laser-induced damage in Ta2O5 and Nb2O5 single-layer films and high reflectors,Chin.Opt.Lett.,2011,9:013102.
[27]Cheng Xu,Yinghuai Qiang,Yabo Zhu,Tingting Zhai,Litong Guo,Yulong Zhao,Jianda Shao,Zhengxiu Fan,Laser-induced damage threshold at different wavelengths of Ta2O5 films annealed over a wide temperature range,Vacuum,2010,84:1310-1314.
[28]Cheng Xu,Yinghuai Qiang,Yabo Zhu,Litong Guo,Jianda Shao,Zhengxiu Fan,Laser damage mechanisms of amorphous Ta2O5films at 1064,532 and 355 nm in 1-on-1 regime,Chin.Phys.Lett.,2010,27:114205.
[29]Cheng Xu,Yinghuai Qiang,Yabo Zhu,Jianda Shao,Zhengxiu Fan,Jinhong Han,Effects of deposition parameters on laser-induced damage threshold of Ta2O5 films,Opt.Laser Technol.,2010,42:497-502.
[30]Cheng Xu,Hongcheng Dong,Lei Yuan,Hongbo He,Jianda Shao,Zhengxiu Fan,Investigation of annealing effects on the laser-induced damage threshold of amorphous Ta2O5 films,Opt.Laser Technol.,2009,41:258-263.
[31]Cheng Xu,Qiling Xiao,Jianyong Ma,Yunxia Jin,Jianda Shao,Zhengxiu Fan,High temperature annealing effect on structure,optical property and laser-induced damage threshold of Ta2O5 films,Appl.Surf.Sci.,2008,254:6554-6559.
[32]Cheng Xu,Jianyong Ma,Yunxia Jin,Hongbo He,Jianda Shao,Zhengxiu Fan,Influence of different substrates on laser induced damage thresholds at 1064 nm of Ta2O5 films,Chin.Phys.Lett.,2008,25:1321-1324.
[33]Cheng Xu,Xiao Li,Hongcheng Dong,Yunxia Jin,Jianda Shao,Zhengxiu Fan,Laser induced damage threshold at 355 and 1064 nm of Ta2O5films of different phases,Chin.Phys.Lett.,2008,25:3300-3303.
[34]Cheng Xu,Dawei Li,Jianyong Ma,Yunxia Jin,Jianda Shao,Zhengxiu Fan,Influence of SiO2 additional layers on the laser induced damage threshold of Ta2O5 films,Opt.Laser Technol.,2008,40:545-549.
[35]Cheng Xu,Hongcheng Dong,Jianyong Ma,Yunxia Jin,Jianda Shao,Zhengxiu Fan,Influences of SiO2 protective layers and annealing on the laser-induced damage threshold of Ta2O5 films,Chin.Opt.Lett.,2008,6:228-230.
[36]Cheng Xu,Jianke Yao,Jianyong Ma,Yunxia Jin,Jianda Shao,Laser-induced damage threshold in n-on-1 regime of Ta2O5 films at 532,800 and 1064 nm,Chin.Opt.Lett.,2007,12(5):727-729.
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