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1. Xueyu Zhang, Aimin Wu*, Shaofei Shi, Fuwen Qin. Influence of Ar/H2 ratio on the characteristics of Boron-doped hydrogenated nanocrystalline silicon films prepared by electron cyclotron resonance plasma-enhanced chemical vapor depositon. Surface and Coatings Technology, 228:412-415. 2013. 2. Xueyu Zhang, Aimin Wu*, Shaofei Shi, Fuwen Qin, Jiming Bian. Influence of Ar/H2 ratio on the characteristics of phosphorus-doped hydrogenated nanocrystalline silicon films prepared by electron cyclotron resonance plasma-enhanced chemical vapor depositon. Thin Solid Films, 521: 181-184. 2012. 3. Xueyu Zhang, Aimin Wu, Hongyun Yue, Juan Hu, Lishi Wen. Preparation of p-type microcrystal Si:H films by ECR-PECVD. Materials Science Forum, 2010, 675-677: 1287-1290. EI
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