Leung, Tong - University of Waterloo - Department of Chemistry

个人简介

Tong Leung's research interests include the design and fabrication of new molecular and nanoscale materials, and the manipulation of their structure-property-performance relations for emerging applications. His laboratory houses the Waterloo Advanced Technology Laboratory (WATLab), a premier materials research facility with state-of-the-art surface and nanomaterials research tools in microscopy, spectromicroscopy, fabrication, lithography, and rapid prototyping. WATLab is also the home of one of the very few helium ion microscopes and ion beam lithography systems in the world. As Canada's first and only such facility with both of these unique tools, WATLab offers sub-nanometer surface imaging and lithography capabilities second to none in the world. Green energy: solar cells and hydrogen generation Biosensing and environmental remediation using hybrid nanomaterials Quantum electronics Surface chemical physics Ultra-large scale computational chemistry Scientific Co-Director, Quantum-Nano Centre (QNC) Fabrication Lab, University of Waterloo, 2010-present Director of Operation, QNC Metrology, University of Waterloo, 2010-present Director, Waterloo Advanced Technology Laboratory (WATLab), University of Waterloo, 1999-present Member of the Editorial Board, The Journal of Electron Spectroscopy and Related Phenomena, Elsevier Science, 1997-present Associate Editor, Materials Express, American Scientific Publishers, 2011-14 Special Issue Editor, VUVX-2010 Conference Proceedings in “Special Issue: Advances in Vacuum Ultraviolet and X-ray Physics”, J. Electron Spectrosc. Relat. Phenomen. Vol. 184, No. 3-6 (2011), 2011 Member of the Organizing Committee, 37th International Conference on Vacuum Ultraviolet and X-ray Physics (VUVX-2010), Vancouver, B.C., 2010 1984 Ph.D. Chemistry, University of British Columbia, BC 1980 B.Sc., Combined Honours in Physics and Chemistry, University of British Columbia, BC

研究领域

Tong Leung's laboratory is one of the very few multidisciplinary laboratories in Canada. His mission is to develop a basic understanding of radiation-matter interactions for applications in the research and design of new molecular and nanoscale materials. The laboratory is fully equipped with several electron impact and surface science systems for studying novel processes on silicon single-crystal surfaces, and novel nanostructured materials. The laboratory also houses the premier materials research facility, Waterloo Advanced Technology Lab (WATLab), in Canada's Technology Triangle, equipped with a wide range of state-of-the-art surface and nanomaterials research tools in microscopy (HR-XRD, SEM, EDX, OIM, AFM,VT-SPM, HIM), spectromicroscopy (Imaging ESCA, SAM, UPS, SIMS, Auger Microprobe, optical microscopy fleet), fabrication (ECD, CVD, MBE, PLD), lithography (EBL,Nanoman, IBL), and rapid prototyping (for bottom-up device manufacturing) for conducting exploratory studies in all emerging areas of nanotechnology and nanosciences. As the home of one of the very few helium ion microscopes and ion beam lithography systems in the world, WATLab offers sub-nanometer surface imaging and novel rapid prototyping capability second to none in the world.

近期论文

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N. Moghimi, F.R. Rahsepar, K. T. Leung, Coord. Chem. Rev. 320-321 (2016) 82-99. “Supported binary hybrid nanomaterials and their applications" F.R. Rahsepar, N. Moghimi, K. T. Leung, Acc. Chem. Res. 49 (2016) 942-51. “Surface-mediated hydrogen bonding of proteinogenic alpha-amino acids on silicon" M. Abd-Ellah, N. Moghimi, L. Zhang, J. P. Thomas, D. McGillivray, S. Srivastava, K.T. Leung, Nanoscale 8 (2016) 1658-64. “Plasmonic gold nanoparticles for ZnO-nanotube photoanodes in dye-sensitized solar cell application” Md A. Rahman, S. Bazargan, S. Srivastava, X. Wang, M. Abd-Ellah, J. P. Thomas, N.F. Heinig, D. Pradhan , K.T. Leung, Energy Environ. Sci. 8 (2015) 3363-73. “Defect-rich decorated TiO2 nanowires for super-efficient photoelectrochemical water splitting driven by visible light” M. Abd-Ellah, S. Bazargan, J. P. Thomas, Md A. Rahman, S. Srivastava, X. Wang, N. F. Heinig, K.T. Leung, Adv. Electronic Mater. 1 (2015) 1500032 (6 pp). “Hierarchical Tin Oxide Nanostructures for Dye-Sensitized Solar Cell Application”