个人简介

Education B.S Seoul National University (1975) M.S KAIST (1977) Ph.D. Case Western Reserve University (1985) Career 1992∼present：Professor at KAIST 1988∼1992：Senior Researcher, LG Chem 1985∼1988:　Postdoctoral Fellow. IBM & University of Columbia 1981∼1985:　Postdoctoral Fellow. Case Western Reserve University Academes and Society ∼present : Member of the Korean Chemical Society, ∼present : Member of the American Chemical Society ∼present : Member of the Polymer Society of Korea 2006.01∼2007.12 : The President of Chungcheong Polymer Society of Korea 2008.01∼present : The councilor of Chungcheong Polymer Society of Korea

研究领域

Polymer Chemistry

Current research interests of our laboratory are mainly divided into four major areas; photosensitive polymers, block copolymers, bio-photoresist and polymers for display devices. Our works involve design of polymer structures for specific applications, synthesis, characterization and elucidation of the mechanisms. Research topics Photosensitive Polymers Block copolymers Bio-photoresist Polymers for display devices

近期论文

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“Room Temperature Processable Silicon-Containing Molecular Resist”, Ji Young Park, Myung Gi Kim, Jin-Baek Kim, Macromol. Rapid Commun. 2008, 29, 18, 1532. “Novel Top-Surface Imaging Process by Selective Chemisorption of Poly(dimethyl siloxane) on Diazoketo-Functionalized Single Component Photoresist”, Ramakrishnan Ganesan, Seul-Ki Youn, Jin-Baek Kim, Macromol. Rapid Commun. 2008, 29, 5, 437. “Photo-patternable electroluminescent blends of polyfluorene derivatives and charge-transporting molecules”, Ji Young Park, Jonghee Lee and Jin-Baek Kim, European Polymer Journal 2008, 44, 12, 3981. “Simple micropatterning of biomolecules on a diazoketo-functionalized photoresist”, Ramakrishnan Ganesan, So Young Yoo, Jae-Hak Choi, Sang Yup Lee and Jin-Baek Kim, Journal of Material Chemistry 2008,, 18, 703. “Silicon-containing Bilayer Resist Based on a Single Component Nonchemically Amplified Resist System”, Ji Young Park and Jin-Baek Kim, Chemistry Letters 2008, 37, 9, 920. “Room Temperature Processable Organic-Inorganic Hybrid Photolithographic Materials Based on a Methoxysilane Cross-Linker”, Ji Young Park and Jin-Baek Kim, Polymer Journal 2008, 40, 7, 663. “Photobleachable silicon-containing molecular resist for deep UV lithography” Jin-Baek Kim*, Ramakrishnan Ganesan, Jae-Hak Choi, Hyo-Jin Yun, Young-Gil Kwon, Kyoung-Seon Kim and Tae-Hwan Oh, Journal of Material Chemistry 2006, 16, 3448.