个人简介

B.S., University of Kansas, 1979 Ph.D., California Institute of Technology, 1983 Postdoctoral Associate, Stanford University, 1983-1985

研究领域

Organic

Organometallic Chemistry, Chemical Vapor Deposition, Catalysis, Nanoscience Our research involves applications of organometallic chemistry to problems in materials deposition and catalysis. Recent areas of research include organometallic precursors for the chemical vapor deposition of inorganic films that are of interest for manufacture of semiconductor devices and OLEDs, precursors for deposition of nanostructures, and heterobimetallic catalysts for the electrochemical oxidation of alcohols with applications to fuel cells.

近期论文

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"Understanding the Electron Stimulated Surface Reactions of Organometallic Complexes to Enable Design of Precursors for Electron Beam Induced Deposition," Spencer, J.; Rosenberg, S.; Barclay, M.; Wu, Y.-C.; McElwee-White, L.; Fairbrother, D.H., Appl. Phys. A., 2014, 117, 1631-1644. "Mechanism-Based Design of Precursors for MOCVD," McElwee-White, L.; Koller, J.; Kim, D.; Anderson, T.J., ECS Transactions, 2009, 25(8), 161-171. "Design of Precursors for the CVD of Inorganic Thin Films," McElwee-White, L. Dalton Trans., 2006, 5327 - 5333. Deposition of Nanostructures from Organometallic Precursors "Aerosol-Assisted Chemical Vapor Deposition of Tungsten Oxide Films and Nanorods from Oxo Tungsten(VI) Fluoroalkoxide Precursors," Kim, H.; Bonsu, R.O.; O’Donohue, C.; Korotkov, R.Y.; McElwee-White, L.; Anderson, T.J., ACS Appl. Mater. Interfaces, 2015, 7, 2660–2667. "Partially Fluorinated Oxo-alkoxide Tungsten (VI) Complexes as Precursors for Deposition of WOx Nanomaterials," Bonsu, R.O.; Kim, H.; O’Donohue, C.; Korotkov, R.Y.; McClain, K.R.; Abboud, K.A.; Ellsworth, A.A.; Walker, A.V.; Anderson, T.J.; McElwee-White, L., Dalton Trans., 2014, 43, 9226-9233. "Surface Plasmon Mediated Chemical Solution Deposition of Gold Nanoparticles on a Nanostructured Silver Surface," Qiu, J.; Wu, Y.-C.; Wang, Y.-C.; Engelhard, M.H.; McElwee-White, L.; Wei, W.D., J. Am. Chem. Soc. 2013, 135, 38-41. (invited paper) "Synthesis of WN(NMe2)3 as a Precursor for the Deposition of WNx Nanospheres," McClain, K.R.; O’Donohue, C.; Shi, Z.; Walker, A.V.; Abboud, K.A.; Anderson, T.; McElwee-White, L., Eur. J. Inorg. Chem., 2012, 4579–4584. Precursors for Deposition of Thin Films "Low Temperature Deposition of WNxCy Cu Diffusion Barriers using WN(NEt2)3 as a Single-Source Precursor," O’Donohue, C.T.; McClain, K.R.; Koley, A.; Revelli, J.C.; McElwee-White, L.; Anderson, T.J., ECS J. Solid State Sci. Tech., 2015, 4, N3180-N3187. "Tungsten Oxytetrachloride and (Acetonitrile)Tetrachlorotungsten Imido Complexes," Reitfort-Baysal, L.L.; Wilder, C.B.; McElwee-White, L., Mijares, K. S., Karcher, J. D. and Maatta, E. A., in Inorganic Syntheses: Volume 36; John Wiley & Sons, Inc.: 2014, p. 142-146. "Tungsten Nitrido Complexes as Precursors for Low Temperature Chemical Vapor Deposition of WNxCy Films as Diffusion Barriers for Cu Metallization," McClain, K.R.; O’Donohue, C.; Koley, A.; Bonsu, R.O.; Abboud, K.A.; Revelli, J.C.; Anderson, T.J.; McElwee-White, L., J. Am. Chem. Soc. 2014, 136, 1650-1662. "Experimental and Computational Studies of the Homogeneous Thermal Decomposition of the Tungsten Dimethylhydrazido Complex Cl4(CH3CN)W(NNMe2)," Lee, J.; Kim, D.; Kim, O.H.; Anderson, T.J.; Koller, J.; Denomme, D.; Habibi, S.Z.; Ehsan, M.; Eyler, J.R.; McElwee-White, L., J. Electrochem. Soc., 2012, 159, H545-H553. "Deposition of WNxCy from the Tungsten Piperidylhydrazido Complex Cl4(CH3CN) W(N-pip) as a Single-Source Precursor," Kim, D.; Kim, O.H.; Ajmera, H.M.; Anderson, T.J.; Koller, J.; Abboud; K.A.; McElwee-White, L., J. Electrochem. Soc., 2011, 158, H618-H625. "Analysis of the Homogeneous Thermal Decomposition of the Tungsten Dimethylhydrazido Complex Cl4 (CH3CN)W(NNMe2) Using in situ Raman Spectroscopy and DFT Calculations," Lee, J.; Kim, D.; Kim, O.H.; Anderson, T.J.; Koller, J.; Denomme, D.; Habibi, S.Z.; McElwee-White, L., ECS Transactions, 2010, 28(15), 15-26. "Chemical Vapor Deposition of WNxCy using Tungsten Piperidyhydrazido Complex Cl4(CH3CN)W(N-pip): Deposition, Characterization and Diffusion Barrier Evaluation," Kim, D.; Kim, O.H.; Anderson, T.J.; Koller, J.; McElwee-White, L.; Leu, L.C.; Tsai, J.M.; Norton, D.P., J. Vac. Sci. Technol., 2009, 27, 943-950. "Deposition of WNxCy Using the Allylimido Complexes Cl4(RCN)W(NC3H5): Effect of NH3 on Film Properties," Ajmera, H.M.; Heitsch, A.T.; Bchir, O.J.; Anderson, T.J.; Reitfort, L.L.; McElwee-White, L., J. Electrochem. Soc., 2008, 155, H829-H835. "Computational Study of the Gas Phase Reactions of Isopropylimido and Allylimido Tungsten Precursors for Chemical Vapor Deposition of Tungsten Carbonitride Films: Implications for the Choice of Carrier Gas," Won, Y.S.; Kim, Y.S.; Anderson, T.J.; McElwee-White, L., Chem. Mater., 2008, 20, 7246–7251. "Synthesis and Characterization of Diorganohydrazido(2-) Tungsten Complexes," Koller, J.; Ajmera, H.M.; Abboud, K.A.; Anderson, T.J.; McElwee-White, L., Inorg. Chem., 2008, 47, 4457-446. "Homogeneous Decomposition of Aryl- and Alkylimido Precursors for the CVD of Tungsten Nitride: A Combined Density Functional Theory and Experimental Study," Won, Y.S.; Kim, Y.S.; Anderson, T.J.; Reitfort, L.L.; Ghiviriga, I.; McElwee-White, L., J. Am. Chem. Soc., 2006, 128, 13781-13788. "The Tungsten Allylimido Complexes Cl4(RCN)W(NC3H5) as Single-source CVD Precursors for WNxCy Thin Films. Correlation of Precursor Fragmentation to Film Properties," Bchir, O.J.; Green, K.M.; Ajmera, H.M.; Zapp, E.A.; Anderson, T.J.; Brooks, B.C.; Reitfort, L.L.; Powell, D.H.; Abboud, K.A.; McElwee-White, L., J. Am. Chem. Soc., 2005, 127, 7825-7833. Heterobimetallic Catalysts for the Electrooxidation of Alcohols "Heterobimetallic Complexes of Polypyridyl Ligands Containing Paramagnetic Centers: Synthesis and Characterization by IR and EPR," Goforth, S.K.; Walroth, R.C.; Angerhofer, A.; McElwee-White, L., Inorg. Chem., 2013, 52 (24), 14116–14123.