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Heteroleptic titanium alkoxides as single-source precursors for MOCVD of micro-structured TiO2 Adding the right (or left) twist to tris-chelate complexes - coordination chemistry of chiral oxazolylphenolates with M3+ ions (M = Al or lanthanide) Thermal Stability of Neodymium Aluminates High-kappa Dielectric Deposited by Liquid Injection MOCVD Using Single-Source Heterometallic Alkoxide Precursors A general and convenient route to oxazolyl ligands Atomic layer deposition of TaN and Ta3N5 using pentakis(dimethylamino)tantalum and either ammonia or monomethylhydrazine Ce(IV) Complexes with Donor-Functionalized Alkoxide Ligands: Improved Precursors for Chemical Vapor Deposition of CeO 2 Effect of deposition temperature on the properties of CeO2 films grown by atomic layer deposition Providing Recordings of Chemistry Teaching A new Yb3+-catalyzed pinacol and imine-coupling reaction Chapter 8. Chemical Vapour Deposition of Metal Oxides for Microelectronics Applications MOCVD and ALD of CeO2 Thin Films using a Novel Monomeric CeIV Alkoxide Precursor Deposition of ZrO(2) and HfO(2) thin films by liquid injection MOCVD and ALD using ansa-metallocene zirconium and hafnium precursors Permittivity enhancement of hafnium dioxide high-kappa films by cerium doping Deposition of Lanthanum Zirconium Oxide High-k Films by Liquid Injection ALD and MOCVD Deposition of Pr- and Nd-aluminate by liquid injection MOCVD and ALD using single-source heterometallic alkoxide precursors Deposition of lanthanum zirconium oxide high-kappa films by liquid injection atomic layer deposition Growth of HfO2 by Liquid Injection MOCVD and ALD Using New Hafnium-Cyclopentadienyl Precursors Molecular design of improved precursors for the MOCVD of oxides used in microelectronics Precursors for MOCVD and ALD of rare earth oxides-complexes of the early lanthanides with a donor-functionalized alkoxide ligand Requirements of precursors for MOCVD and ALD of rare earth oxides Atomic Layer Deposition and Properties of Lanthanum Oxide and Lanthanum-Aluminum Oxide Films Liquid injection ALD and MOCVD of lanthanum aluminate using a bimetallic alkoxide precursor MOCVD and ALD of high-kappa dielectric oxides using alkoxide precursors Deposition of HfO2 and ZrO2 films by liquid injection MOCVD using new monomeric alkoxide precursors Deposition of HfO2 films by liquid injection MOCVD using a new monomeric alkoxide precursor, [Hf(dmop)(4)]