Black, Kate - University of Liverpool

个人简介

Dr Kate Black gained her PhD in Material Science at the University of Liverpool in 2008. She then went on to join the University of Cambridge as a Research Associate in the Centre for Advance Photonic and Electronics, principally working on the development of novel materials for supercapacitors. In 2013 Kate became a Lecturer in the Centre for Materials and Structures at the University of Liverpool, School of Engineering. Kate’s research interests are primarily focused on the development of novel functional materials, using inkjet printing, for the manufacture of electronic and optoelectronic devices. Her main area of expertise is in the development of novel Reactive Organo-Metallic inks (ROM) which are particle-free and can be exploited to produce a wide a variety of functional materials, such as conductors, insulators and semiconductors. Membership of the EPSRC Early Career Forum in Manufacturing Research (EPSRC 2014) Assesments officer for Mechanical Engineering Chairman for Liverpool Women in Science and Engineering (LivWiSE) Athena SWAN steering group for the School of Engineering

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Silver Ink Formulations for Sinter-free Printing of Conductive Films Non-Newtonian Leidenfrost Drops Complexes with Donor-Functionalized Alkoxide Ligands: Improved Precursors for Chemical Vapor Deposition of CeO 2. Dimethylzinc adduct chemistry revisited: MOCVD of vertically aligned ZnO nanowires using the dimethylzinc 1,4-dioxane adduct Effect of deposition temperature on the properties of CeO2 films grown by atomic layer deposition SrHfO3 Films Grown on Si(100) by Plasma-Assisted Atomic Layer Deposition A New Method for the Growth of Zinc Oxide Nanowires by MOCVD using Oxygen-Donor Adducts of Dimethylzinc In situ preparation of network forming gold nanoparticles in agarose hydrogels Investigation of New 2,5-Dimethylpyrrolyl Titanium Alkylamide and Alkoxide Complexes as Precursors for the Liquid Injection MOCVD of TiO2. The optical properties of vertically aligned ZnO nanowires deposited using a dimethylzinc adduct Deposition of TiO2 films by liquid injection ALD using new titanium 2,5-dimethylpyrrolyl complexes GaN, AlGaN, HfO 2 based radial heterostructure nanowires MOCVD and ALD of CeO2 Thin Films using a Novel Monomeric CeIV Alkoxide Precursor Permittivity enhancement and dielectric relaxation of doped hafnium and zirconium oxide γ-Al2O3 nanoparticle production by arc-discharge in water: In situ discharge characterization and nanoparticle investigation. Deposition of Pr- and Nd-aluminate by liquid injection MOCVD and ALD using single-source heterometallic alkoxide precursors Deposition of ZrO2 and HfO2 thin films by liquid injection MOCVD and ALD using ansa-metallocene zirconium and hafnium precursors MOCVD of ZnO thin films for potential use as compliant layers for GaN on Si Permittivity enhancement of hafnium dioxide high- κ films by cerium doping Growth of HfO2 by liquid injection MOCVD and ALD using new hafnium-cyclopentadienyl precursors Liquid injection MOCVD and ALD of ZrO2 using Zr-cyclopentadienyl precursors Liquid injection ALD and MOCVD of lanthanum aluminate using a bimetallic alkoxide precursor.