个人简介
科研经历
2016年8月-至今 华中科技大学材料科学与工程学院 副教授
2013年06月~2016年7月 华中科技大学材料科学与工程学院,工程师, 硕士生导师
教育背景
2007年09月~2013年01月工学博士材料科学与工程专业,北京科技大学
2003年09月~2007年07月工学学士材料物理与化学专业,北京科技大学
研究领域
低维光电功能材料的可控制备、器件集成与物性测试;
• 低维发光器件的构筑及界面态动态追踪;
• 微纳材料与器件的原位操控与表征分析。
近期论文
查看导师新发文章
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(1)Q. Zhang, H. Q. Li, L. Gan, Y. Ma, Y. Bando, D. Golberg* and T. Y. Zhai*, In situ fabrication and investigation of nanostructures and nanodevices, Chem. Soc. Rev., 2016, 45, 2694-2713. (IF=34.09)
(2)Q. Zhang, H. Q. Li, Y. Ma, T. Y. Zhai*, ZnSe nanostructures: synthesis, properties and applications,Prog. Mater. Sci.,2016, 83, 472-535. (IF=31.08)
(3) X. Zhou, Q. Zhang(co 1st author), L. Gan, X. Li, H. Q. Li, Y. Zhang, D. Golberg, T. Y. Zhai*, High performance solar-blind deep ultraviolet photodetector based on individual single-crystalline Zn2GeO4nanowires, Adv. Funct. Mater., 2016, 26, 704-712. (Back Cover) (IF= 11.805)
(4)Q. Zhang, C. Wei, X. Li, M. Hafeez, L. Gan, H. Q. Li, X. L. Wei, Y. S. Zhao, Y. Ma and T. Y. Zhai*, Polar-surface-driven growth of ZnS microsprings with novel optoelectronic properties, NPG Asia Mater., 2015, 7, e213. (IF=10.118)
(5) X. N. Xing, Q. Zhang(co 1st author), Z. Huang, Z. J. Lu, J. B. Zhang, H. Q. Li, H. B. Zeng, T. Y. Zhai*, Strain driven spectral broadending of Pb ion exchanged CdS nanowires, Small2016, 12, 874-881. (IF= 8.368)
(6)Q. Zhang, J. J. Qi, X. Li, Y. Zhang*, Diameter-dependent internal gain in ZnO micro/nanowires under electron beam irradiation, Nanoscale, 2011, 3, 3060-3063. (IF=6.223)
(7) Q. Zhang, J. J. Qi, X. Li, F. Yi, Z. Z. Wang, Y. Zhang*, Electrically pumped lasing from single ZnO micro/nanowire and poly(3,4-ethylenedioxythiophene): poly(styrenexulfonate) hybrid heterostructures, Appl. Phys. Lett., 2012, 101, 043119. (IF=3.794)
(8)Q. Zhang, J. J. Qi, Y. H. Huang, X. Li, Y. Zhang*, Tuning electronic transport of ZnO micro/nanowires by a transverse electric field, Appl. Phys. Lett.,2011, 99, 063105. (IF=3.844)
(9)Q. Zhang, J. J. Qi, Y. Yang, Y. H. Huang, X. Li and Y. Zhang*, Electrical breakdown of ZnO nanowires in metal-semiconductor-metal structure, Appl. Phys. Lett.,2010, 96, 253112. (IF=3.844)