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1.Feng Wenran*, Song Jiali, RenYashuang, Chen Fei, Hu Jifei, Yu Sensen, Zhao Hongchun, Tang Yiyun, Huang Song. Structural and optical evolution in Pb100–xAgxSe (x= 3, 6, 9 and 12) thin films by chemical bath deposition J. Alloy. Compd., 770, 649–654 (2019).
2.SongJiali, FengWenran*, RenYashuang, ZhengDanning, Dong Haitao, Zhu Ran, Yi Liya, Hu Jifei. Columnar Te-doped-PbSe thin films on glass for infrared photoelectric detection.Vacuum, 155, 1–6 (2018).
3.FengWenran*, Song Jiali, RenYashuang, Yi Liya, Hu Jifei, Zhu Ran, Dong Haitao. Structural, morphological, electrical and optical properties of PbSe thin films sputtered at various pressures. Physica E, 102, 153–159 (2018).
4.FengWenran*, Zhou Hai, Chen Fei. Impact of thickness on crystal structure and optical properties for thermally evaporated PbSe thin films. Vacuum, 114, 82–85 (2015).
5.FengWenran*, Wang Xiaoyang, Chen Fei, Liu Wan, Zhou Hai, Wang Shuo, Li Haoran. Influence of substrate temperature on structural, morphological and electrical properties of PbSe film deposited by radio frequency sputtering. Thin Solid Films, 578, 25–30 (2015).
6.FengWenran*, Wang Xiaoyang, Zhou Hai, Chen Fei. Effects of sputtering power on properties of PbSenanocrystalline thin films deposited by RF magnetron sputtering. Vacuum, 109, 108–111 (2014).
7.FengWenran*, Zhou Hai, Yang Si-ze. Nano-indentation and wear-resistance behaviors of TiCN films by pulsed plasma, Mater.Sci. Eng., A, 527, 4767–4770 (2010).
8.FengWenran*, Zhou Hai, Yang Si-ze. Gas pressure dependence of composition in Ta–Ti–N films prepared by pulsed high energy density plasma.Mater. Chem. Phys., 124, 287–290 (2010).
9.Feng Wenran*, Chen Guangliang, Li Li, LvGuohua, Zhang Xianhui, NiuErwu, Liu Chizi, Yang Si-ze. Characteristics of (Ti,Ta)N thin films prepared by using pulsed high energy density plasma. J. Phys. D: Appl. Phys., 40, 4228–4233 (2007).
10.Feng Wenran*, Chen Guangliang, Zhang Yan, GuWeichao, Zhang Guling, NiuErwu , Liu Chizi, Yang Si-ze. Preparation of Ta(C)N films by pulsed high energy density plasma. J. Phys. D: Appl. Phys., 2132–2137, 40 (2007).
11.Feng Wenran*, Liu Chizi, Chen Guangliang, Zhang Guling, GuWeichao, NiuErwu, Yang Si-Ze. Titanium carbonitride films on cemented carbide cutting tool prepared by pulsed high energy density plasma. Appl. Surf. Sci., 253, 4923-4927 (2007).
12.FengWenran*, Yan Dianran, He Jining, Zhang Guling, Chen Guangliang, GuWeichao, Yang Size. Microhardness and toughness of the reactive plasma sprayed TiN coating. Appl. Surf. Sci., 243, 204–213 (2005).
13.FengWenran*, Yan Dianran, He Jining, Li Xiangzhi, Dong Yanchun. Reactive plasma sprayed TiN coating and its tribological properties. Wear, 258, 806–811 (2005).
14.Lv Guohua, Chen Huan, GuWeichao, FengWenran, Li Li, NiuErwu, Zhang Xianhui, Yang Si-Ze. Effects of graphite additives in electrolytes on the microstructure and corrosion resistance of alumina PEO coatings.Curr. Appl. Phys., 9, 324–328 (2009).
15.ChenGuangliang, Chen Shihua, FengWenran, Chen, Wenxing, Yang Si-ze. Surface modification of the nanoparticles by an atmospheric room-temperature plasma fluidized bed. Appl. Surf. Sci., 254, 3915–3920 (2008).
16.Li Li, NiuErwu, LvGuohua, FengWenran, GuWeichao, Chen Guangliang, Zhang Guling, Fan Songhua, Liu Chizi, Yang Si-ze. Preparation and microstructure of tantalum nitride thin film by cathodic arc deposition. Chin. Phys. Lett., 23, 3018-3021 (2006).
17.Chen Guangliang, Zhao Wenjun, Chen Shihua, Zhou Mingyan, FengWenran, GuWeichao, Yang Si-ze. Preparation of nanocones for immobilizing DNA probe by a low-temperature plasma plume.Appl. Phys. Lett., 89, 121501 (2006).
18.ChenGuangliang, Chen Shihua, Zhou Mingyan, FengWenran, GuWeichao, Yang Size. The preliminary discharging characterization of a novel APGD plume and its application in organic contaminant degradation. Plasma Sources Sci. Technol., 15, 603 (2006).
19.Gu Weichao, LvGuohua, Chen Huan, Chen Guangliang, FengWenran, Yang Si-Ze. Characterisation of ceramic coatings produced by plasma electrolytic oxidation of aluminum alloy.Mater.Sci. Eng., A, 447, 158–162 (2007).
20.冯文然*, 阎殿然,何继宁,陈光良,顾伟超,张谷令,刘赤子,杨思泽.反应等离子喷涂纳米TiN涂层的显微硬度及微观结构研究. 物理学报,54,2399–2402 (2005).