个人简介
博士，华中科技大学机械学院副教授，主要从事纳米制造中关键尺寸、3D形貌、以及套刻精度等参数光学测量方面的研究工作。作为主要研究人员，先后参加了国家863项目“高深宽比微纳深沟槽结构基于模型的红外反射谱测量方法与设备”、国家科技重大专项子课题“基于模型的光学临近校正技术”以及国家自然科学基金重大研究计划项目“基于广义椭偏仪的纳米结构三维形貌参数测量理论与方法研究”、国家重大科学仪器开发专项“宽光谱广义椭偏仪设备开发”等多项国家级科研课题。主持完成一项国家自然科学基金青年基金项目“基于红外椭偏光谱的高深宽比深沟槽结构侧壁形貌参数测量方法研究”。申请国家发明专利16项，发表学术论文20余篇。
开设课程
工程测试技术
软件技术基础
机械电子系统分析与设计
承担的科研项目：
1. 片上型光谱椭偏仪关键技术研究，华中科技大学自主创新基金，在研
2. 基于红外椭偏光谱的高深宽比深沟槽结构侧壁形貌参数测量方法研究，国家自然科学基金，结题
荣誉与奖项：
2013年获华中科技大学教学竞赛二等奖
2014年获华中科技大学教学竞赛一等奖
近期论文
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[1] Xu S, Zhang CW, Wei HQ, and Liu SY, A single-image method of aberration retrieval for imaging systems under partially coherent illumination, J. Opt. 16(7), 072001 ,2014.
[2] 陈修国, 刘世元, 张传维等，基于Mueller 矩阵椭偏仪的纳米压印模板与光刻胶光栅结构准确测量, 物理学报, 63(18): 180701, 2014.
[3] Chen XG, Zhang CW, Liu SY, Depolarization effects from nanoimprinted grating structures as measured by Mueller matrix polarimetry. APPLIED PHYSICS LETTERS, 103(15): 151605, 2013.
[4] Zhang CW, Liu SY, Shi TL, Tang ZR, Fitting-determined formulation of effective mediumapproximation for 3D trench structures in model-based infrared reflectrometry, JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A, 28(2): 263-271, 2011
[5] Zhang CW, Liu SY, Shi TL, Tang ZR, Improved model-based infrared reflectrometry for measuring deep trench structures, JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A, 26(11): 2327-2335, 2009
[6] Chen XG, Liu SY, Zhang CW, Jiang H, Improved measurement accuracy in optical scatterometry using correction-based library search. APPLIED OPTICS, 52(27): 6727-6734, 2013.
[7] Chen XG, Liu SY, Zhang CW, Jiang H, Measurement configuration optimization for accurate grating reconstruction by Mueller matrix polarimetry. JOURNAL OF MICRO/NANOLITTHGRAPHY, MEMS, AND MOEMS, 12(3): 033013, 2013.
[8] Chen XG, Liu SY, Zhang CW, Zhu JL, Improved measurement accuracy in optical scatterometry using fitting error interpolation based library search, MEASUREMET, 46(8): 2638-2646, 2013.
[9] Zhu JL, Liu SY, Zhang CW, Chen XG, Dong ZQ, Identification and reconstruction of diffraction structures in optical scatterometry using support vector machine method, JOURNAL OF MICRO/NANOLITHOGRAPHY, MEMS, AND MOEMS, 12(1): 013004, 2013
[10] Liu SY, Ma Y, Chen XG, Zhang CW, Estimation of the convergence order of rigorous coupled-wave analysis for binary gratings in optical critical dimension metrology, OPTICAL ENGINEERING, 51(8): 081504, 2012
[11] Liu W, Liu SY, Wu XF, Zhang CW, Parametric analytical model for off-axis illumination sources based on Sigmoid function, ACTA PHYSICA SINICA, 60(5): 054213, 2011
[12]Liu SY, Zhang CW, Shen HW, Gu HY, Model-based FTIR reflectometry measurement system for deep trench structures of DRAM, SPECTROSCOPY AND SPECTRAL ANALYSIS, 29(4): 935-939, 2009
[13] Liu SY, Gu HY, Zhang CW, Shen HW, A fast algorithm for reflectivity calculation of micro/nano deep trench structures by corrected effective medium approximation, ACTA PHYSICA SINICA, 57(9): 5996-6001, 2008
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