个人简介
Alex Robinson qualified with a BSc (Hons) in Physics from the University of Birmingham in 1995. He obtained his PhD in 1999 for work on the development of materials for electron beam lithography performed at the Nanoscale Physics Research Laboratory of the University of Birmingham, and the Joint Research Center for Atom Technology in Japan. Following his PhD he investigated the modification of oxide surfaces using self assembled monolayer in a collaboration between the School of Chemistry at the University of Birmingham and BAe Systems, before returning to the Nanoscale Physics Research Laboratory to continue his research in lithography and microfabrication. He has recently taken up a Senior Research Fellowship in the Science City Research Alliance, based in the School of Chemical Engineering and the School of Chemistry at the Universities of Birmingham and Warwick respectively.
研究领域
His research interests have included modification of oxide surfaces using self assembled mono- and multilayers, coaxial field emission tips, and photoresist properties of amorphous low molecular weight materials, low energy electron beam resists, and chemically amplified molecular resists for electron beam and EUV lithography
近期论文
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Manyam, J, Manickam, M, Preece, JA, Palmer, RE, Robinson, APG, (2011), Plasma Etching of High-resolution Features in a Fullerene Molecular Resist, P. Soc. Photo-Opt. Inst., 7972, (In Press)
Song, MY, Lawton, JJ, Robinson, APG, Palmer, RE, (2010), Scanning probe energy loss spectroscopy with microfabricated coaxial tips, Phys. Rev. B, 81, 161411
Song, MY, Robinson, APG, Palmer, RE, (2010), Fabrication of co-axial field emitter tips for scanning probe energy loss spectroscopy, Nanotechnology, 21, 155304
Gibbons, FP, Manickam, M, Preece, JA, Palmer, RE, Robinson, APG, (2009), Direct Electron Beam Writing of Highly Conductive Wires in Functionalized Fullerene Films, Small, 5, 2750
Manyam, J, Manickam, M, Preece, JA, Palmer, RE, Robinson, APG, (2009), Low Activation Energy Fullerene Molecular Resist, P. Soc. Photo-Opt. Inst., 7273, 72733D
Gibbons, FP, Robinson, APG, Palmer, RE, Diegoli, S, Manickam, M, Preece, JA, (2008), Fullerene Resist Materials for the 32nm Node and Beyond, Adv. Funct. Mater., 18, 1977
Chen, X, Palmer, RE, Robinson, APG, (2008), A High Resolution Water Soluble Fullerene Molecular Resist For Electron Beam Lithography, Nanotechnology, 19, 275308
Zaid, HM, Robinson, APG, Palmer, RE, Manickam, M, Preece, JA, (2007), Chemical Amplification of a Triphenylene Molecular Electron Beam Resist, Adv. Funct. Mater., 17, 2522
Gibbons, FP, Zaid, HM, Manickam, M, Preece, JA, Palmer, RE, Robinson, APG (2007), A Chemically Amplified Fullerene Derivative Molecular Electron Beam Resist, Small, 3, 2076
Gibbons, FP, Robinson, APG, Palmer, RE, Manickam, M, Preece, JA, (2006), Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography, Small, 2, 1003