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Ma Xiao, Xu Dongsheng, Ji Peiyu, Jin Chenggang, et al., Vacuum, 2019, 6, 164: 355-360.
Haiyun Tan, Jin Chenggang, et al., Phys. Plasmas 26, 052107 (2019).
Haiyun Tan, Jin Chenggang, et al., IEEE Transactions on Plasma Science, 2019, 3, 47(8): 3986 - 3990.
Meili Cui, Jin Chenggang, et al., Optik, 2018, 2, 154: 280-285.
Chen Jiali, Ji Peiyu, Jin Chenggang, et al., Plasma Science and Technology, 2018, 12, 13, 21(025502).
Tan Haiyun, Jin Chenggang, et al., IEEE Transactions on Plasma Science, 2018, 3, 46(3): 539-544.
Ji Peiyu, Yu Jun, Huang Tianyuan, Jin Chenggang, et al., Plasma Science and Technology, 2018, 2, 20(2): 025505-025505.
Huang Tianyuan, Jin Chenggang*, et al., IEEE Transactions on Plasma Science 2018, 46(4): 895-899.
Zhang Guilu, Huang Tianyuan, Jin Chenggang*, et al., Plasma Science and Technology 2018.
Jin, Chenggang, et al., Journal of Applied Physics, 2017, 122(17): 173301.
Huang Tianyuan, Jin Chenggang*, et al., PLASMA CHEMISTRY AND PLASMA PROCESSING. 2017,37(4):1237-1247.
Yang Jiaqi, Hu Yibo, Jin Chenggang, et al., Thin Solid Films, 2017, 9, 1, 637: 9-13.
Huang TianYuan, Jin Chenggang*, et al., Science China Physics, Mechanics & Astronomy, 2016,59(4).
Jin Chenggang*, et al., Plasma Processes and Polymers, 2015,12(10):1061-1068.
Jin Chenggang, et al., Journal of Materials Chemistry C, 2014, 2(16):2992-2997.
Jin Chenggang, et al., Journal of Physics D: Applied Physics. 2013,46(48).
Jin Chenggang, et al., Materials Chemistry and Physics, 2013,139(2-3):506-510.
Jin Chenggang, et al., Applied Physics A-Materials Science & Processing. 2012,109(1):173-179.
Jin Chenggang, et al., Thin Solid Films 524 (1) 39-43 (2012).
Jin Chenggang, et al., Applied physics A 106:961–966 (2012)
Jin Chenggang, et al., Vacuum 86 1078-1082 (2012).
Jin Chenggang, et al., IEEE Transactions on Plasma Science, 99 11 (2011).
Jin Chenggang, et al., Physica E 43 1863–1866 (2011).
Jin Chenggang, et al., Thin Solid Films 518 (8) 2152-2156 (2010).
Jin Chenggang, et al., Applied Surface Science 255 (2009) 4711–4715.
Jin Chenggang, et al., J. Phys. D: Appl. Phys. 41 (2008) 035005.
Jin Chenggang, et al., Research Letters in Physical Chemistry, 760650 (2008).
Jin Chenggang, et al., Frontiers of Materials Science in China, 1 (2):158-161 (2007).
金成刚,吴雪梅,诸葛兰剑. 《SiC稀磁半导体材料的研究进展》,微纳电子技术2007年第十二期(1053)。
BAI Yang (柏洋),JIN Chenggang (金成刚),et al., Plasma Sci. Technol., 15(10): 1002-1005 (2013).
Y. Yang, Jin Chenggang, et al., Materials Chemistry and Physics 142, 479-483 (2013).
Y. Yang, C.G. Jin, Jin Chenggang, et al., J. Phys. D: Appl. Phys. (2013).
T. Yu, Jin Chenggang, et al., Vacuum 16 1321–1327 (2013).
T. Yu, Jin Chenggang, et al., Vacuum 92 58–64 (2013).
T. Yu, Jin Chenggang, et al., J. Appl. Phys. 113, 044105 (2013).
T. Yu, Jin Chenggang, et al., Surf. Interface Anal. 44 395 (2012).
T. Yu, Jin Chenggang, et al., Applied Surface Science 258 2953–2958 (2012)
T.Y. Huang, Jin Chenggang, et al., Advanced Materials Research, (in press).
H Y Zhang, X M Yang, T Yu, Jin Chenggang, et al., J. Phys. D: Appl. Phys. 46 435102 (2013).