个人简介
1985年加入国家同步辐射衍射光学元件组，长期从事同步辐射软X射线波带片、光栅的研制，从事X射线透射光栅、全息离子束光栅研制，承担和组织多项863大口径光栅项目，先后研制了大型离子束刻蚀机、旋涂机、弯月面涂胶机、灰化机等系列微细加工设备，目前担任惯约重大专项子项衍射光学元件攻关负责人。
持续专注光栅在光谱仪器、高性能激光加工、VR等领域的应用研究。
研究领域
1、同步辐射光学/光栅
2、强激光应用/大口径高阈值衍射元件
3、微细加工/设备研发及加工工艺
近期论文
查看导师最新文章
（温馨提示：请注意重名现象，建议点开原文通过作者单位确认）
1) Optimum inductiverly coupled plasma etching of fused silica to remove subsurface damage layer - Applied Surface Science - 2015 -
2) Terrace morphology on fused silica surfaces by Ar+ ion bombardment with Mo co-deposition. - Appl.Phys.Lett. - -
3) High-accuracy alignment of the grating pattern along silicon <1 1 2> directions using a short rectangular array. - Journal of Micromechanics and Microengineering. - -
4) Near-field holography enhanced with antireflection coatings-an improved method for fabricating diffraction gratings - Chinese Opt. Lett. - -
5) Investigation on morphology and evolution process of plasma induced pitting damage during the ICP etching of fused silica - Vacuum - -
6) 弯月面涂胶均匀性改进 - 强激光与粒子束 - -
7) Alignment method for fabricating a parallel flat-field grating used in soft x-ray region - Appl.Opt. - -
京公网安备 11010802027423号