杜惊雷 - 四川大学

个人简介

1979-1983年，南开大学物理系，理学学士； 1985-1988年，中国科学院长春光学精密机械研究所光学专业，理学硕士； 1996-1999年，四川大学物理科学与技术学院光学专业，理学博士。自1985年以来，先后从事激光技术、信息光学、微纳加工技术和微纳光子学等领域的理论和实验研究工作，并于1996年到四川大学物理科学与技术学院任教至今，其中2001-2002年间，曾在英国卢瑟福实验室、新加坡南洋理工大学进行微纳光学方面的学术研究。目前，已在数字光刻、表面等离子激元光刻、远场超分辨成像技术、生物医学光子学技术、纳米光子结构在有机光电子器件应用等方面，主持/主研国家自然科学基金等科研项目20余项。在学术刊物上发表论文120余篇，SCI收录论文约50篇。

研究领域

1. 金属/介质纳米结构光调控的理论和实验研究 2. 纳米光学结构加工方法和Metamaterals制备技术的研究 3. 纳米光子学在生物大分子成像中的应用研究 4. 光自旋霍尔效应、有机自旋电子学等

近期论文

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1. Y. Hou, S. Li, Y. Su, X. Huang, Y. Liu, L. Huang, Y. Yu, F. Gao, Z. Zhang, J. Du. Design and fabrication of three-dimensional chiral nanostructures based on stepwise glancing angle deposition technology. Langmuir. 2013, 29(3): 867-872. 2. Z. Y. Zhang, S. Ye, S. H. Li, Z. Yang, J. L. Du, F. H. Gao, R. Y. Shi, B. C. Yang, X. W. Guo. Fabrication of nanopore array based on the nanometer silver pore-mirror device. Microelectronic Engineering. 2012, 98: 151-154. 3. X. H. Sun, L. P. Xia, J. L. Du, S. Y. Yin, C. L. Du. A hybrid long-range surface plasmon waveguide comprising a narrow metal stripe surrounded by the low-index dielectric regions. Optics Communications. 2012, 285(21-22): 4359-4363. 4. S. Shi, Z. Y. Zhang, J. L. Du, Z. Yang, R. Y. Shi, S. H. Li, F. H. Gao. Surface-plasmon-polaritons-assisted nanolithography with dual-wavelength illumination for high exposure depth. Optics Letters. 2012, 37(2): 247-249. 5. Y. D. Hou, S. H. Li, S. Ye, S. Shi, M. G. Zhang, R. Y. Shi, J. L. Du, C. L. Du. Using self-assembly technology to fabricate silver particle array for organic photovoltaic devices. Microelectronic Engineering. 2012, 98: 428-432. 6. Y. K. Zhang, J. L. Du, X. Z. Wei, L. F. Shi, Q. L. Deng, X. C. Dong, C. L. Du. Resolution and stability analysis of localized surface plasmon lithography on the geometrical parameters of soft mold. Applied Optics. 2011, 50(13): 1963-1967. 7. S. Ye, Y. D. Hou, R. Y. Zhu, S. L. Gu, J. Q. Wang, Z. Y. Zhang, S. Shi, J. L. Du. Synthesis and Photoluminescence Enhancement of Silver Nanoparticles Decorated Porous Anodic Alumina. Journal of Materials Science & Technology. 2011, 27(2): 165-169. 8. L. L. Tang, J. C. Yin, G. S. Yuan, J. L. Du, H. T. Gao, X. C. Dong, Y. G. Lu, C. L. Du. General conformal transformation method based on Schwarz-Christoffel approach. Optics Express. 2011, 19(16): 15119-15126. 9. S. Shi, Z. Y. Zhang, R. Y. Shi, X. Y. Niu, S. H. Li, M. Li, J. Q. Wang, J. L. Du, F. H. Gao, C. L. Du. Analysis of fabricating arbitrary nanoscale patterns by LSPP direct writing lithography with two-dimensional metal hole-array. Microelectronic Engineering. 2011, 88(8): 1931-1934. 10. X. P. Li, S. Shi, Z. Y. Zhang, J. Q. Wang, S. H. Li, F. H. Gao, R. Y. Shi, J. L. Du, C. L. Du, Y. X. Zhang. Experimental analysis of solid immersion interference lithography based on backside exposure technique. Microelectronic Engineering. 2011, 88(8): 2509-2512. 11. Y. K. Zhang, X. C. Dong, J. L. Du, X. Z. Wei, L. F. Shi, Q. L. Deng, C. L. Du. Nanolithography method by using localized surface plasmon mask generated with polydimethylsiloxane soft mold on thin metal film. Optics Letters. 2010, 35(13): 2143-2145. 12. J. Q. Wang, H. M. Liang, X. Y. Niu, J. L. Du, S. Ye, Z. Y. Zhang. Enhancing exposure depth for surface-plasmon polaritons interference nanolithography by waveguide modulation. Journal of Applied Physics. 2010, 108(1): 014308. 13. S. Shi, Z. Y. Zhang, M. Y. He, X. P. Li, J. Yang, J. L. Du. Analysis of surface-plasmon-polaritons-assisted interference imaging by using silver film with rough surface. Optics Express. 2010, 18(10): 10685-10693. 14. X. Y. Niu, Y. M. Qi, J. Q. Wang, Z. Y. Zhang, J. L. Du, Y. K. Guo, R. Y. Shi, M. Gong. Approach of enhancing exposure depth for evanescent wave interference lithography. Microelectronic Engineering. 2010, 87(5-8): 1168-1171. 15. M. Y. He, Z. Y. Zhang, S. Shi, J. L. Du, X. P. Li, S. H. Li, W. Y. Ma. A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique. Optics Express. 2010, 18(15): 15975-15980. 16. H. M. Liang, H. B. Wang, X. Y. Zhao, J. L. Du, J. G. Yang, Y. Ma, J. B. Li, S. L. Hu. High efficiency picosecond pulse C(6)H(12) Raman laser amplified by DCM fluorescence. Laser Physics. 2009, 19(3): 424-427. 17. Z. Y. Zhang, J. L. Du, X. W. Guo. High-efficiency transmission of nanoscale information by surface plasmon polaritons from near field to far field. Journal of Applied Physics. 2007, 102(7): 074301. 18. B. L. Luo, C. C. Wang, J. L. Du, C. Ma, Y. K. Guo, J. Yao. Design and analysis of phase gratings for laser beams coherent combination. Microelectronic Engineering. 2006, 83(4-9): 1368-1371. 19. X. W. Guo, J. L. Du, Y. K. Guo, J. Yao. Large-area surface-plasmon polariton interference lithography. Optics Letters. 2006, 31(17): 2613-2615. 20. S. J. Liu, J. L. Du, X. Duan, B. L. Luo, X. G. Tang, Y. K. Guo, Z. Cui, C. L. Du, J. Yao. Enhanced Dill exposure model for thick photoresist lithography. Microelectronic Engineering. 2005, 78-79: 490-495.