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个人简介

University of California, Berkeley, Calif.; Ph. D. in Chemistry, March 1983. Yale University, New Haven, Conn.; B.S. in Chemistry, May 1977.

研究领域

Surface Chemistry Nanotechnology/Materials Physical Renewable Energy

Surface Chemistry, Thin Film Growth & Nanostructure Engineering

近期论文

查看导师新发文章 (温馨提示:请注意重名现象,建议点开原文通过作者单位确认)

S.M. George, "Atomic Layer Deposition: An Overview", Chem. Rev. 110, 111 (2010). A.C. Dillon, A.W. Ott, S.M. George, and J.D. Way, "Surface Chemistry of Al2O3 Deposition Using Al(CH3)3 and H2O in a Binary Reaction Sequence", Surf. Sci. 322, 230 (1995). A.W. Ott, J.W. Klaus, J.M. Johnson and S.M. George, "Al2O3 Thin Film Growth on Si(100) Using Binary Reaction Sequence Chemistry", Thin Solid Films 292, 135 (1997). B.B. Burton, D.N. Goldstein and S.M. George, "Atomic Layer Deposition of MgO Using Bis(ethylcyclopentadienyl)magnesium and H2O", J. Phys. Chem. C 113, 1939 (2009). B.B. Burton, A.R. Lavoie and S.M. George, "Tantalum Nitride Atomic Layer Deposition Using Tris(diethylamido)(tert-butylimido)tantalum and Hydrazine", J. Electrochem. Soc. 155, D508 (2008). J.W. Klaus, S.J. Ferro and S.M. George, "Atomic Layer Deposition of Tungsten Using Sequential Surface Chemistry with a Sacrificial Stripping Reaction", Thin Solid Films 360, 145 (2000). R.K. Wind, F.H. Fabreguette, Z.A. Sechrist and S.M. George, "Nucleation Period, Surface Roughness and Oscillations in Mass Gain per Cycle during W Atomic Layer Deposition on Al2O3", J. Appl. Phys. 105, 074309 (2009). S.M. George, B. Yoon and A.A. Dameron, "Surface Chemistry for Molecular Layer Deposiiton of Organic and Hybrid Organic-Inorganic Polymers", Acc. Chem. Res. 42, 498 (2009). N.M. Adamczyk, A.A. Dameron and S.M. George, "Molecular Layer Deposition of Poly(p-phenylene terephthalamide) Films Using Terephthaloyl Chloride and p-Phenylenediamine", Langmuir 24, 2081 (2008). A.A. Dameron, D. Seghete, B.B. Burton, S.D. Davidson, A.S. Cavanagh, J.A. Bertrand and S.M. George, "Molecular Layer Deposition of Alucone Polymer Films Using Trimethylaluminum and Ethylene Glycol", Chem. Mater. 20, 3315 (2008). P. F. Carcia, R.S. McLean, M. D. Groner, A. A. Dameron and S. M. George, Al2O3 ALD and SiN PECVD Films as Gas Diffusion Ultra-barrier on Polymer Substrates, J. Appl. Phys. 106, 023533 (2009). Y.S. Jung, A.S. Cavanagh, A.C. Dillon, M.D. Groner, S.M. George and S.H. Lee, "Enhanced Stability of LiCoO2Cathodes in Lithium-ion Batteries Using Surface Modification by Atomic Layer Deposition", J. Electrochem. Soc. 157, A75 (2010). Y.S. Jung, A.S. Cavanagh, A.C. Dillon, M.D. Groner, S.M. George and S.H. Lee, "Ultrathin Direct Atomic Layer Deposition on Composite Electrodes is Critical for Highly Durable and Safe Li-Ion Batteries ", Adv. Mater. 22, 2172 (2010). L. Baker, A.S. Cavanagh, D. Seghete, S.M. George, A.J.M. Mackus, W.M.M. Kessels, Z.Y. Liu and F.T. Wagner, “Nucleation and Growth of Pt Atomic Layer Deposition on Al2O3 Substrates Using (Methylcyclopentadienyl)-Trimethyl Platinum and O2 Plasma”, Journal of Applied Physics (In Press). S.K. Sarkar, J.Y. Kim, D.N. Goldstein, N.R. Neale, K. Zhu, C.M. Elliott, A.J. Frank and S.M. George, "In2S3 Atomic Layer Deposition and Its Application as a Sensitizer on TiO2 Nanotube Arrays for Solar Energy Conversion", J. Phys. Chem. C 114, 8032 (2010). J.W. Elam, M.D. Groner and S.M. George, "Viscous Flow Reactor with Quartz Crystal Microbalance for Thin Film Growth by Atomic Layer Deposition", Rev. Sci. Instrum. 73, 2981 (2002). J.A. McCormick, B.L. Cloutier, A.W. Weimer and S.M. George, "Rotary Reactor for Atomic Layer Deposition on Large Quantities of Nanoparticles", J. Vac. Sci. Technol. A 25, 67 (2007). J.D. Ferguson, A.W. Weimer and S.M. George, "Atomic Layer Deposition of Ultrathin and Conformal Al2O3 Films on BN Particles", Thin Solid Films 371, 95 (2000).

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