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2012年:
(1)DUANBaoXing&YANGYinTang.BreakdownvoltageanalysisforthenewRESURFAlGaN/GaNHEMTs,SciChinaInfSci,VOL.55(2),2012:473-479.SCI:000299517500022SCIENCECHINA-INFORMATIONSCIENCES
(2)BaoxingDuan,YintangYang.NewAl0.25Ga0.75N/GaNHEMTsstructurewiththepartialsilicondoping,Micro&NanoLetter,vol.7(1),2012,pp.9-11.SCI:000300299500003;EI:20120814802093
(3)BaoxingDuanandYintangYang.ADevelopmentSummarizationofthePowerSemiconductorDevicesΠ,IETETechnicalReview,vol.29(1),JAN-FEB2012,pp.36-43.SCI:000301060600003;EI:20121214868209
(4)DuanBao-Xing(段宝兴),YangYin-Tang(杨银堂).BreakdownvoltageanalysisofAl0.25Ga0.75N/GaNhighelectronmobilitytransistorswiththepartialsilicondopinginAlGaNla[ant]yer,ChinesePhysicsB,2012,21(5),PP.057201(1-8).SCI:000303999000084;EI:20122015021430
(5)BaoxingDuanandYintangYang.TheapplicationoftheelectricfieldmodulationandchargeshieldingeffectstotheHighVoltageSiLDMOS,IETETechnicalReview,vol.29(4),Jul-Aug2012,pp.276-281.
(6)段宝兴杨银堂陈敬.F离子注入新型Al0.25Ga0.75N/GaNHEMT器件耐压分析.物理学报ActaPhys.Sin.Vol.61,No.22(2012)227302(1-7).
(7)段宝兴杨银堂陈敬.新型Si3N4层部分固定正电荷AlGaN/GaNHEMTs器件耐压分析.物理学报ActaPhys.Sin.Vol.62,No.24(2012)247302(1-6).
(8)段宝兴,杨银堂.新型RESURFAlGaN/GaNHEMTs器件耐压分析.中国科学:信息科学,2012,42:770-777
(9)ZhangXian-jun,YangYin-tang,DuanBao-Xing,ChenBin,ChaiChang-chunandSongKun.New4HSiliconCarbideme[ant]talSemiconductorFieldEffectTransistorwiththeBufferla[ant]yerbetweentheGateandChannel.ChinesePhysicsB,2012,21(1):017201-1~7(SCI:000300258200064,EI:20120514738302)
(10)ZhangXian-Jun,YangYin-Tang,DuanBao-Xing,ChaiChang-Chun,SongKunandChenBin.Modelingofthedraininducedbarrierloweringeffectandoptimizationfordual-channel4Hsiliconcarbideme[ant]talsemiconductorfieldeffecttransistor.ChinesePhysicsB,2012,21(3):037303-1~5(SCI:000301341400068;EI:20121214877879)
2011年:
(1)BaoxingDuanandYintangYang.LowSpecificOn-ResistancePowerMOSTransistorwithMulti-la[ant]yerCarrierAccumulationbreaksthelimitlineofsilicon.IEEETRANSACTIONSONELECTRONDEVICES,VOL.58(7),2011:2057-2060.SCI:000291952900031;EI:20112614093036
(2)DUANBaoXing&YANGYinTang.Straincoefficientmeasurementforthe(100)uniaxialstrainsiliconbyRamanspectroscopy,SciChinaInfSci,VOL.54(8),2011:1762-1768.SCI:000293188100020;
(3)BaoxingDuan,YintangYang.PowerVDMOSTransistorwiththeStepOxideTrenchBreakstheLimitLineofSilicon,Micro&NanoLetter,vol.6(9),2011,pp.777-780.SCI:000295320400010;EI:12288398
(4)BaoxingDuan,YintangYang.REBULFSuperJunctionMOSFETwithN+buriedla[ant]yer,Micro&NanoLetter,vol.6(11),2011,pp.881-883.SCI:000298136300002
(5)BaoxingDuanandYintangYang.ADevelopmentSummarizationofthePowerSemiconductorDevices,IETETechnicalReview,vol.28(6),NOV-DEC2011,pp.503-510.SCI:000298626700006
2010年:
(1)BaoxingDuan,YintangYang,BoZhang.HighVoltageREBULFLDMOSwithN+-Buriedla[ant]yer《Solid-StateElectronics》,VOL.54;p:685-688,2010.
(2)段宝兴,杨银堂.利用Raman光谱测定硅(100)晶面单轴应变的应变系数.《中国科学:信息科学》.2010.40:1033-1038.
(3)段宝兴,杨银堂.CMOS双层可变功函数金属栅技术.《功能材料与器件学报》.2010.16(2):158-162.
(4)段宝兴,杨银堂.应变硅的应变量表征技术.《功能材料与器件学报》.2010.16(4):323-328.
(5)杨银堂耿振海段宝兴贾护军余涔任丽丽.具有部分超结的新型SiCSBD特性分析.《物理学报》.2010,59(1):566-570.
2009年:
(1)BaoxingDuan,YintangYang,BoZhangandXufengHong.FoldedAccumulationLDMOST(FALDMOST):NewPowerMOSTransistorwithVeryLowSpecificOn-resistance.《IEEEELECTRONDEVICELETTERS》,VOL.30NO.12;p:1329-1331,2009.SCI:000272044500027;EI:20094912524366
(2)BaoxingDuan,YintangYangandBoZhang.NewSuperJunctionLDMOSwithN-TypeChargesCompensationla[ant]yer.《IEEEELECTRONDEVICELETTERS》,VOL.30NO.3;p:305-307,2009.SCI:000263920400032;EI:20091311980826
(3)段宝兴,杨银堂.利用KeatingModel计算Si(1-x)Gex及非晶硅的拉曼频移.《物理学报》.Vol.58(10)p:7114-7118,2009.SCI:000270876900073
2008年:
(1)BaoxingDuan,YangYintang,ZhangBoandLiZhaoji,AnUltra-lowSpecificOn-ResistanceVDMOSwithaStepOxide-BypassedTrenchStructure,《ChineseJournalofSemiconductors》,2008,29(04):677-681.EI:20082111273098
(2)ChengJian-Bing,ZhangBo,DuanBao-XingandLiZhao-Ji.ANovelSuper-JunctionLateralDouble-Diffusedme[ant]tal-Oxide-SemiconductorFieldEffectTransistorwithn-TypeStepDopingBufferla[ant]yer.《ChinesePhysicsLetters》2008,25:262-265.SCI:000252613500071
2007年:
(1)DUANBao-Xing(段宝兴),ZHANGBo(张波),LIZhao-Ji(李肇基).NewCMOSCompatibleSuperJunctionLDMOSTwithN-TypeBuriedla[ant]yer,《ChinesePhysics》,Vol.16pp:3754-3759,2007.SCI:000251993200033;EI:20080111007031
(2)DUANBao-Xing(段宝兴),ZHANGBo(张波),LIZhao-Ji(李肇基).NewPowerLateralDoubleDiffusedme[ant]tal-Oxide-SemiconductorTransistorwithaFoldedAccumulationla[ant]yer.《ChinesePhysicsLetters》2006,24(5):1342-1345.SCI:000246659400060
(3)BaoxingDuan,BoZhangandZhaojiLi.NewLateralSuperJunctionMOSFET’swithN+-Floatingla[ant]yeronaHigh-resistanceSubstrate.《ChineseJournalofSemiconductors》,2007,28(02):166-170.EI:20071510544658
(4)段宝兴,黄勇光,张波,李肇基.REBULFLDMOS实验结果及具有部分N+浮空层结构的分析.《半导体学报》.2007,28(08):85-89.EI:20073710810194
(5)段宝兴,张波,李肇基.高压SOILDMOS设计的新技术-电场调制及电荷对局域场的屏蔽效应在高压SOILDMOS设计中的应用.《微电子学》,2007(4):459-465.
2006年:
(1)BaoxingDuan,BoZhang,ZhaojiLi.NewThin-FilmPowerMOSFET’SwithaBuriedOxideDoubleStepStructure.《IEEEELECTRONDEVICELETTERS》,VOL.27.NO.5;p:377-379,2006。SCI:000237602300022;EI:2006199865621
(2)段宝兴,张波,李肇基.双面阶梯埋氧型SOI结构的耐压分析.《半导体学报》,2006,27(05):886-891.EI:20063310068440
(3)段宝兴,张波,李肇基.一种新的低导通电阻折叠硅SOILDMOS,《半导体学报》.2006,27(10):1814-1817.EI:20064910289685
(4)段宝兴,张波,李肇基.功率半导体器件发展概述.《电力电子与应用》.2006,No.1:11-18.
(5)张波,段宝兴,李肇基.具有N+浮空层的体电场降低LDMOS结构耐压分析,《半导体学报》.2006,27(04):730-734.EI:2006259949138
2005年:
(1)BaoxingDuan,BoZhangandZhaojiLi.ANewPartialSOIPowerDeviceStructurewithP-typeBuriedla[ant]yer,《Solid-StateElectronics》,Vol49/12pp1965-1968.2005.SCI:000234233800016;EI:2005499521772
(2)段宝兴,张波,李肇基.阶梯埋氧型SOI结构的耐压分析.《半导体学报》,2005,26(7):1396-1400.EI:2005329290478
(3)段宝兴,张波,李肇基.埋空隙PSOI结构的耐压分析.《半导体学报》,2005,26(9):1818-1822.EI:2006029637021
(4)段宝兴,张波,李肇基.具有P型埋层PSOI结构的耐压分析.《半导体学报》,2005,26(11):2149-2153.EI:2006119760614
2004年:
(1)段宝兴,谢华,王暄.热处理对无机纳米聚酰亚胺复合物热激电流谱的影响.《哈尔滨理工大学学报》,2004,06:124-125.
国际国内会议:
(1)BaoxingDuan,BoZhangandZhaojiLi.ANewReducedBulkField(REBULF)High-VoltageLDMOSwithN+-Floatingla[ant]yer.IEEEProceedingofICCCAS06,2006,pp.2709-2712.EI:20081011132218;ISIP:000241262903124
(2)BaoxingDuan,BoZhangandZhaojiLi.ANewSuperJunctionLDMOSwithN+-Floatingla[ant]yer.IEEEProceedingofIPEMC’06,2006,pp.70-73.EI:20082511328113
(3)BaoxingDuan,BoZhangandZhaojiLi.NewConceptforImprovingCharacteristicsofHigh-VoltagePowerDevicesbyBuriedla[ant]yersModulationEffect.IEEEProceedingofICSICT’06,2006,pp.239-241.EI:20073110725193
(4)段宝兴,张波,李肇基.一种埋层阶梯型SOI结构的耐压分析.第六届全国SOI技术研讨会.
(5)段宝兴,张波,李肇基.功率半导体器件发展概述.2006中国电工技术学会电力电子学会第十届学术年会.
(6)黄勇光,段宝兴,罗萍.超薄硅层REBULFLDMOS的工艺仿真和设计.四川省电子学会半导体与集成技术专委会2006年度学术年会论文集.2006,10-13.