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个人简介

教育背景 2005/7-2011/6,中国科学院微电子研究所,微电子与固体电子学,硕博连读/工学博士 1998/7-2002/6,东南大学,应用物理系,学士 工作简历 2014/12–至今:中国科学院微电子研究所,智能感知研发中心,副研究员; 2011/07–2014/12:中国科学院微电子研究所,集成电路先导工艺研发中心,助理研究员; 2002/07-2004/05:无锡华润上华半导体有限公司,工艺工程师

研究领域

MEMS传感器和微纳工艺技术

近期论文

查看导师新发文章 (温馨提示:请注意重名现象,建议点开原文通过作者单位确认)

1.Designoptimizationandperformanceanalysisofdeformedopticalreadoutfocalplanearray,JianyuFu,HaipingShang*,HaitaoShi,ZhigangLi,OuYi,DapengChenandQingchuanZhangJ.Micromech.Microeng.,25(2015)065012(9pp),2015 2.Improvingstressstabilityinlow-pressurechemicalvapordepositedsilicondioxidefilmsbyionimplantation,JianyuFu,HaipingShang*,Changqingxie,ZhigangLi,DapengChen,ThinSolidFilms,598(2016)103–108,2016 3.Opticalsensitivitynon-uniformityanalysisandoptimizationofatiltopticalreadoutfocalplanearray,JianyuFu,HaipingShang,HaitaoShi,ZhigangLi,YiOu,DapengChenandQingchuanZhang",J.Micromech.Microeng,26(2016)025001(10pp),2016 4.Thermalannealingeffectsonthestressstabilityinsilicondioxidefilmsgrownbyplasma-enhancedchemicalvapordeposition,JianyuFu*,HaipingShang,ZhigangLi,WeibingWang,DapengChen,MicrosystTechnol,(2017)23:2753–2757,2017 5.新型金属源/漏工程新进展,尚海平,徐秋霞,微电子学,第38卷,第4期,2008年2008 6.镍硅化物工艺新进展,尚海平,徐秋霞,微电子学,第39卷,第6期,2009年,2009 7.Two-stepNiSilicideprocessandinfluenceofprotectiveN2gas,ShangHaiping,XuQiuxia*,JournalofSemiconductors,Volume30,Issue9,2009,096002-1,2009 8.AdjustmentofNiSi/n-SiSBHbypost-silicideofdopantsegregationprocess,JournalofSemiconductors,ShangHaiping,XuQiuxia*,JournalofSemiconductors,Volume30,Issue10,2009,106001-4,2009 9.SBHadjustmentcharacteristicofthedopantsegregationprocessforNiSi/n-SiSJDs,ShangHaiping,XuQiuxia*,JournalofSemiconductors,Volume31,Issue5,2010,056001-6,2010 10.Eliminationofinitialstress-inducedcurvatureinamicromachinedbi-materialcomposite-layeredcantilever,RuiwenLiu、BinbinJiao、YanmeiKong、ZhigangLi、HaipingShang、DikeLu、ChaoqunGaoandDapengChen,J.Micromech.Microeng.23(2013)095019(12pp),2013 11.Lowatomicnumbersiliconnitridefilmsfortransmissionelectronmicroscopy,JianyuFu,*,WenjuanXiong,*,HaipingShang,RuiwenLiu,JunfengLi,WeibingWang,WenwuWangandDapengChen,MaterialsScienceinSemiconductorProcessing,89(2019)1–5,2019 12.Asubstrate-freeopticalreadoutfocalplanearraywithaheatsinkstructure,LiuRmwen、KongYanmei、JiaoBinbin、LiZhigang、ShangHaiping、LuDike、GaoChaoqun、ChenDapengandZhangQingchuan,JournalofSemiconductors,Volume34,Number2,2013 13.FeasibilityStudyofAll-SiCPressureSensorFabricationwithoutDeepEtching,FengwenMu、YechaoSun、HaipingShang、YinghuiWang、TadatomoSuga、eibingWangandDapengChen,ICEP-IAAC2018,2018 14.Mercury-platediridium-basedmicroelectrodearraysfortracemetaldetection,ZhiCao,HaipingShang*,YinghuiWang,andWeibingWang,ICEPT2018,2018 15.Mercury-platediridium-basedmicroelectrodearraysfortracemetaldetection,ZhiCao,HaipingShang*,YinghuiWang,andWeibingWang,IEEETransactionsonMagnetics,2018 16.Gel-Integratedmercury-platedmicroelectrodearraysfortracemetaldetection,ZhiCao,HaipingShang*,YinghuiWang,andWeibingWang,ICEP2019,2019

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