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[1]L.Yan,P.-F.Liu,T.Bo,J.R.Zhang,M.H.Tang,Y.G.Xiao,*andB.-T.Wang,EmergenceofsuperconductivityinaDiracnodal-lineCu2Simonolayer:abinitiocalculations.JournalofMaterialsChemistryC,7,10926-10932,2019.
[2]L.Yan,T.Bo,W.X.Zhang,P.-F.Liu,Z.S.Lu,Y.G.Xiao,*M.H.Tang,andB.-T.Wang,Novelstructuresoftwo-dimensionaltungstenborideandtheirsuperconductivity.PhysicalChemistryChemicalPhysics,21,15327-15338,2019.
[3]H.C.Dong,J.Z.Li,M.G.Chen,H.W.Wang,X.C.Jiang,Y.G.Xiao*,B.Tian,andX.X.Zhang,High-throughputproductionofZnO-MoS2-grapheneheterostructuresforhighlyefficientphotocatalytichydrogenevolution.Materials,12(2233),1-12,2019.
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[5]Y.G.Xiao,D.B.Ma,J.Wang,G.Li,S.A.Yan,W.L.Zhang,Z.Li,andM.H.Tang,Animprovedmodelforthesurfacepotentialanddraincurrentinnegativecapacitancefieldeffecttransistors.RSCAdvances,6,103210-103214,2016.
[6]Y.G.Xiao,J.Wang,D.B.Ma,Z.Li,andM.H.Tang,EffectofzirconiumortitaniumcomponentonelectricalpropertiesofPbZr1-xTixO3gatednegativecapacitanceferroelectricfield-effecttransistors.MaterialsResearchExpress,3,105902(1-6),2016.
[7]Y.G.Xiao,J.Wang,D.B.Ma,M.H.Tang,Z.Li,Aninterfacechargemodelforferroelectricfieldeffecttransistor.IntegratedFerroelectrics,17(1),54-62,2016.
[8]Y.G.Xiao,M.H.Tang,J.C.Li,C.P.Cheng,B.Jiang,H.Q.Cai,Z.H.Tang,X.S.Lv,andX.C.Gu,Temperatureeffectonelectricalcharacteristicsofnegativecapacitanceferroelectricfield-effecttransistors.AppliedPhysicsLetters,100(8),083508,2012.
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[10]Y.G.Xiao,Z.J.Chen,M.H.Tang,Z.H.Tang,S.A.Yan,J.C.Li,X.C.Gu,Y.C.Zhou,andX.P.Ouyang,Simulationofelectricalcharacteristicsinnegativecapacitancesurrounding-gateferroelectricfield-effecttransistors.AppliedPhysicsLetters,101(25),253511,2012.
[11]Y.G.Xiao,M.H.Tang,Y.Xiong,J.C.Li,C.P.Cheng,B.Jiang,H.Q.Cai,Z.H.Tang,X.S.Lv,X.C.Gu,andY.C.Zhou,Useofnegativecapacitancetosimulatetheelectricalcharacteristicsindouble-gateferroelectricfield-effecttransistors.CurrentAppliedPhysics,12,1591-1595,2012.
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[13]Y.G.Xiao,M.H.Tang,J.C.Li,B.JiangandJ.He,Theinfluenceofferroelectric-electrodeinterfacelayerontheelectricalcharacteristicsofnegative-capacitanceferroelectricdouble-gatefield-effecttransistors.MicroelectronicsReliability,52(4),757-760,2012.
[14]Y.G.Xiao,M.H.Tang,H.Y.Xu,J.He,Ferroelectricpropertiesandleakagebehaviorinpoly(vinylidenefluoride-trifluoroethylene)ferroelectricthinfilmswithadditivediethylphthalate.IntegratedFerroelectrics,125(1),89-97,2011.