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1.Y. Guo, H. Zhu*, X. Niu, W. Zhang, Z. Li, J. Chen, Y. Mai, Influence of Substrate Temperature on LPCVD ZnO Thin Film and Cu(In, Ga)Se2 Thin Film Solar Cells, Advanced Engineering Materials, (2016) n/a-n/a.
2.D. Zhou, H. Zhu*, X. Liang, C. Zhang, Z. Li, Y. Xu, J. Chen, L. Zhang, Y. Mai, Sputtered molybdenum thin films and the application in CIGS solar cells, Applied Surface Science, 362 (2016) 202-209.
3.H. Zhu, Y. Mai, B. Lai, M. Wan, Y. Huang, L. Zhang,Annealing and Etching Treatments on ZnO:Al Films Deposited by Middle Frequency Sputtering at Room Temperature,Physica Status Solidi A, 211/7(2014)1589-1595.
4.H. Zhu, Y. Huang, Y. Mai, Y. Wang, J. Yin, Y. Feng, T. He, J. Gao, Z. Wang, L. Lan, J. Ni, F. Guan, Y. Bai, Y. Ma, M. Wan, Study of silicon thin film solar cells with different back reflectors, Physica Status Solidi A,210(2013)1143-1148.
5.H. Zhu, Y. Mai, M. Wan, J. Gao, Y. Wang, T. He, Y. Feng, J. Yin, J. Du, J. Wang, R. Sun, Y. Huang, Study of back reflectors for thin film silicon solar cells, Thin Solid Films, 539(2013)284-289.
6.H. Zhu, Y. Feng, L. Zhang, B. Lai, T. He, D. Liu, Y. Wang, J. Yin, Y. Ma, Y. Huang, H. Jia, Y. Mai, Investigation of the stability of boron-doped zinc oxide films grown by low-pressure chemical vapor deposition, Physica Status Solidi A,209 (2012) 1259-1265.
7.H. Zhu, J. Hüpkes, E. Bunte, S.M. Huang, Reactive sputtering of ZnO:Al thin films from rotatable dual metallic targets,Applied Surface Science, 259 (2012) 582-589.
8.H. Zhu, J. Hüpkes, E. Bunte, S.M. Huang, Study of ZnO:Al films for silicon thin film solar cells, Applied Surface Science, 261 (2012) 268-275.
9.H. Zhu, H. Jia, D. Liu, Y. Feng, L. Zhang, B. Lai, T. He, Y. Ma, Y. Wang, J. Yin, Y. Huang, Y. Mai, Study of thermal stability of ZnO:B films grown by LPCVD technique, Applied Surface Science, 258 (2012) 6018-6023.
10.H. Zhu, E. Bunte, J. Hüpkes, S.M. Huang, Sputtering of ZnO:Al films from dual tube targets with tilted magnetrons, Thin Solid Films, 519 (2011) 2366-2370.
11.H. Zhu, J. Hüpkes, E. Bunte, J. Owen, S.M. Huang, Novel etching method on high rate ZnO:Al thin films reactively sputtered from dual tube metallic targets for silicon based solar cells,Solar Energy Materials and Solar Cells, 95 (2011) 964-968.
12.H. Zhu, J. Hüpkes, E. Bunte, A. Gerber, S.M. Huang, Influence of working pressure on ZnO:Al films from tube targets for silicon thin film solar cells, Thin Solid Films, 518 (2010) 4997-5002.
13.H. Zhu, J. Hüpkes, E. Bunte, S.M. Huang, High rate reactive magnetron sputtering of ZnO:Al films from rotating metallic targets, Surface & Coatings Technology, 205 (2010) 773-779.
14.H. Zhu, J. Hüpkes, E. Bunte, S.M. Huang, Oxygen influence on sputtered high rate ZnO:Al films from dual rotatable ceramic targets, Applied Surface Science, 256 (2010) 4601-4605.
15.H. Zhu, E. Bunte, J. Hüpkes, H. Siekmann, S.M. Huang, Aluminium doped zinc oxide sputtered from rotatable dual magnetrons for thin film silicon solar cells, Thin Solid Films,517 (2009) 3161-3166.
16.H.B. Zhu, X.D. Li, S.Y. Huang, C.X. Jin, Z. Sun, Y.W. Chen, S.M. Huang, Preparation of indium tin oxide films by radio frequency magnetron sputtering under low vacuum level, Surface Review and Letters, 13 (2006) 833-840.