Interface Tailoring of Heterogeneous Catalysts by Atomic Layer Deposition,ACS Catalysis

当前位置： X-MOL 学术 › ACS Catal. › 论文详情

Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)

Interface Tailoring of Heterogeneous Catalysts by Atomic Layer Deposition
ACS Catalysis ( IF 11.3 ) Pub Date : 2018-09-18 00:00:00 , DOI: 10.1021/acscatal.8b02659
Bin Zhang ₁ , Yong Qin ₁

Affiliation

The tailoring of the metal–oxide interface is an important strategy in the design and development of novel catalysts with superior catalytic performance. However, the structure and location of the metal–oxide interface on supported catalysts cannot be well controlled by traditional methods, and the structure–property relation is not clearly understood in most reactions. Therefore, it is highly desirable to develop new methods to precisely tailor the metal–oxide interface and thus achieve highly efficient catalysts and a fundamental understanding of the principle of interface catalysis. Atomic layer deposition (ALD), a high-level film-growth technology, is a promising and controllable approach to precisely design and tailor the metal–oxide interface on an atomic scale. In this Review, we present and discuss a series of recently developed ALD strategies for tailoring the metal–oxide interface of heterogeneous catalysts, such as overcoating, ultrathin modification, area-selective ALD, template-assisted ALD, and template- and sacrificial-layer-assisted ALD. These methods have been used to develop many catalysts with different structures, such as core–shell structures, inverse oxide/metal structures, oxide–nanotrapped metal structures, porous sandwich structures, multiply confined metal nanoparticles in oxide nanotubes, and multifunctional catalysts with multiple metal–oxide interfaces. Due to its advantages, ALD can be applied to reveal the catalytic mechanism of metal–oxide interfaces by deliberately designing catalysts with a clear structure, even in confined and synergetic environments. In general, the developed ALD approaches provide us with a toolkit for tailoring the metal–oxide interface and designing heterogeneous catalysts.

中文翻译：

原子层沉积法制备非均相催化剂的界面

在设计和开发具有优异催化性能的新型催化剂时，金属-氧化物界面的定制化是一项重要策略。但是，传统方法不能很好地控制负载型催化剂上金属-氧化物界面的结构和位置，并且在大多数反应中还不清楚结构-性质之间的关系。因此，迫切需要开发新的方法来精确地定制金属-氧化物界面，从而获得高效的催化剂以及对界面催化原理的基本理解。原子层沉积（ALD）是一种高级的膜生长技术，是一种有前途且可控的方法，可以在原子尺度上精确设计和定制金属-氧化物界面。在这篇评论中，我们提出并讨论了一系列最新的ALD策略，这些策略可用于定制多相催化剂的金属-氧化物界面，例如外涂层，超薄改性，区域选择性ALD，模板辅助ALD以及模板层和牺牲层辅助ALD。这些方法已被用于开发许多具有不同结构的催化剂，例如核-壳结构，逆氧化物/金属结构，氧化物-不带夹杂物的金属结构，多孔夹心结构，氧化物纳米管中的多种受限金属纳米颗粒以及具有多种金属的多功能催化剂-氧化物接口。由于其优势，ALD可以通过故意设计具有清晰结构的催化剂来揭示金属-氧化物界面的催化机理，即使在密闭和协同作用的环境中也是如此。一般来说，

更新日期：2018-09-18

点击分享查看原文

点击收藏

阅读更多本刊新发论文本刊介绍/投稿指南