Silane Deposition via Gas-Phase Evaporation and High-Resolution Surface Characterization of the Ultrathin Siloxane Coatings,Langmuir

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Silane Deposition via Gas-Phase Evaporation and High-Resolution Surface Characterization of the Ultrathin Siloxane Coatings
Langmuir ( IF 3.7 ) Pub Date : 2018-08-07 00:00:00 , DOI: 10.1021/acs.langmuir.8b01044
Walid-Madhat Munief _{1,

2} , Florian Heib ₃ , Felix Hempel _{1,

2} , Xiaoling Lu _{1,

4} , Miriam Schwartz ₂ , Vivek Pachauri _{1,

4} , Rolf Hempelmann _{3,

5} , Michael Schmitt ₆ , Sven Ingebrandt _{1,

2,

4}

Affiliation

Siloxane coatings for surfaces are essential in many scientific and industrial applications. We describe a straightforward gas-phase evaporation technique in inert atmosphere and introduce a practical and reliable silanization protocol adaptable to different silane types. The primary aim of depositing ultrathin siloxane films on surfaces is to enable a reproducible and homogenous surface functionalization without agglomeration effects during the layer formation. To realize high-quality and large-area coatings, it is fundamental to understand the reaction conditions of the silanes, the process of the siloxane layer formation, and the possible influence of the substrate morphology. We used three typical silane types to exemplify the potential and versatility of our process: aminopropyltriethoxysilane, glycidoxypropyltrimethoxysilane, and 1H,1H,2H,2H-perfluorooctyl-trichlorosilane. The ultrathin siloxane layers, which are generally difficult to characterize, were precisely investigated with high-resolution surface-characterization methods to verify our concept in terms of reproducibility and coating quality. Our results show that this gas-phase evaporation protocol is easily adaptable to all three, widely used silane types also enabling a large-area upscale.

中文翻译：

气相沉积硅烷沉积和超薄硅氧烷涂层的高分辨率表面表征

表面的硅氧烷涂料在许多科学和工业应用中都是必不可少的。我们描述了一种在惰性气氛中简单的气相蒸发技术，并介绍了一种适用于不同硅烷类型的实用且可靠的硅烷化方案。在表面上沉积超薄硅氧烷膜的主要目的是在层形成过程中实现可重现且均匀的表面功能化，而不会产生团聚作用。为了实现高质量和大面积的涂层，了解硅烷的反应条件，硅氧烷层的形成过程以及基材形态的可能影响是至关重要的。我们使用三种典型的硅烷类型来举例说明我们工艺的潜力和多功能性：氨丙基三乙氧基硅烷，环氧丙氧基丙基三甲氧基硅烷和1H，1 H，2 H，2 H-全氟辛基-三氯硅烷。通常难以表征的超薄硅氧烷层已通过高分辨率表面表征方法进行了精确研究，以验证我们在重现性和涂层质量方面的概念。我们的结果表明，这种气相蒸发方案很容易适用于所有三种广泛使用的硅烷类型，也可实现大面积的高档化。

更新日期：2018-08-07

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