Magnetic Patterning by Electron Beam-Assisted Carbon Lithography,ACS Applied Materials & Interfaces

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Magnetic Patterning by Electron Beam-Assisted Carbon Lithography
ACS Applied Materials & Interfaces ( IF 8.3 ) Pub Date : 2018-07-18 00:00:00 , DOI: 10.1021/acsami.8b07485
Pietro Genoni ₁ , Francesca Genuzio ₂ , Tevfik Onur Menteş ₂ , Benito Santos ₂ , Alessandro Sala _{2,

3} , Cristina Lenardi ₁ , Andrea Locatelli ₂

Affiliation

We report on the proof of principle of a scalable method for writing the magnetic state by electron-stimulated molecular dissociative adsorption on ultrathin Co on Re(0001). Intense microfocused low-energy electron beams are used to promote the formation of surface carbides and graphitic carbon through the fragmentation of carbon monoxide. Upon annealing at the CO desorption temperature, carbon persists in the irradiated areas, whereas the clean surface is recovered elsewhere, giving origin to chemical patterns with nanometer-sharp edges. The accumulation of carbon is found to induce an in-plane to out-of-plane spin reorientation transition in Co, manifested by the appearance of striped magnetic domains. Irradiation at doses in excess of 1000 L of CO followed by ultrahigh vacuum annealing at 380 °C determines the formation of a graphitic overlayer in the irradiated areas, under which Co exhibits out-of-plane magnetic anisotropy. Domains with opposite magnetization are separated here by chiral Neél walls. Our fabrication protocol adds lateral control to spin reorientation transitions, permitting to tune the magnetic anisotropy within arbitrary regions of mesoscopic size. We envisage applications in the nano-engineering of graphene-spaced stacks exhibiting the desired magnetic state and properties.

中文翻译：

电子束辅助碳平版印刷术的磁图案化

我们报告了一种可伸缩方法的原理证明，该方法通过在Re（0001）上的超薄Co上进行电子刺激的分子解离吸附来写入磁态。强烈的微聚焦低能电子束用于通过一氧化碳的碎裂促进表面碳化物和石墨碳的形成。在CO解吸温度下进行退火后，碳会保留在受辐照的区域，而清洁的表面会在其他地方被回收，从而产生具有纳米锐利边缘的化学图案。发现碳的积累在Co中引起面内到面外自旋重取向转变，其表现为带状磁畴的出现。以超过1000 L的CO剂量进行辐照，然后在380°C下进行超高真空退火，确定了在辐照区中形成石墨覆盖层，在该覆盖层下，Co表现出面外磁各向异性。具有相反磁化强度的磁畴在这里被手性Neél壁隔开。我们的制造协议增加了自旋重新取向转变的横向控制，从而允许在介观尺寸的任意区域内调整磁各向异性。我们设想将石墨烯隔开的堆栈进行纳米工程处理，以显示出所需的磁态和性能。允许在介观尺寸的任意区域内调整磁各向异性。我们设想将石墨烯隔开的堆叠体进行纳米工程处理，以显示出所需的磁态和性能。允许在介观尺寸的任意区域内调整磁各向异性。我们设想将石墨烯隔开的堆栈进行纳米工程处理，以显示出所需的磁态和性能。

更新日期：2018-07-18

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