3D Volumetric Energy Deposition of Focused Helium Ion Beam Lithography: Visualization, Modeling, and Applications in Nanofabrication,Advanced Materials Interfaces

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3D Volumetric Energy Deposition of Focused Helium Ion Beam Lithography: Visualization, Modeling, and Applications in Nanofabrication
Advanced Materials Interfaces ( IF 4.3 ) Pub Date : 2018-04-19 , DOI: 10.1002/admi.201800203
Jingxuan Cai _{1,

2,

3} , Zhouyang Zhu _{1,

2} , Paul F. A. Alkemade ₄ , Emile van Veldhoven ₅ , Qianjin Wang ₆ , Haixiong Ge ₆ , Sean P. Rodrigues ₇ , Wenshan Cai ₇ , Wen-Di Li _{1,

2,

3}

Affiliation

In this paper, 3D volumetric energy deposition and local crosslinking of hydrogen silsesquioxane (HSQ) are experimentally and numerically explored in focused helium ion beam lithography (HIBL). In particular, a through‐membrane exposure method is developed to make visible and subsequently to measure the 3D interaction volume and energy deposition of helium ions in HSQ. By comparing the actual dimensions of the crosslinked HSQ structures with Monte Carlo modeling of the spatial distribution of the energy deposition, the critical energy density for crosslinking HSQ is obtained. Finally, 3D nanofabrication of complex crosslinked HSQ nanostructures such as embedded nanochannels and suspended grids is demonstrated using two different exposure configurations. The proposed method expands the 2D point spread function of HIBL into three dimensions, thus opening a new avenue for nanoscale 3D fabrication.

中文翻译：

聚焦氦离子束光刻的3D体积能沉积：可视化，建模及其在纳米加工中的应用

在本文中，在聚焦氦离子束光刻（HIBL）中通过实验和数值研究了氢倍半硅氧烷（HSQ）的3D体积能沉积和局部交联。特别是，开发了一种跨膜暴露方法，以使其可见并随后测量HSQ中3D相互作用体积和氦离子的能量沉积。通过将交联的HSQ结构的实际尺寸与能量沉积空间分布的蒙特卡洛模型进行比较，可以获得用于交联HSQ的临界能量密度。最后，使用两种不同的曝光配置展示了复杂的交联HSQ纳米结构（例如嵌入式纳米通道和悬浮网格）的3D纳米加工。所提出的方法将HIBL的2D点扩展函数扩展为三个维度，

更新日期：2018-04-19

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