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Control of C3N4 and C4N3 carbon nitride nanosheets' electronic and magnetic properties through embedded atoms.
Physical Chemistry Chemical Physics ( IF 2.9 ) Pub Date : 2020-01-09 , DOI: 10.1039/c9cp06031f
Asadollah Bafekry 1 , Catherine Stampfl 2 , Berna Akgenc 3 , Mitra Ghergherehchi 4
Affiliation  

In the present work, the effect of various embedded atom impurities on tuning electronic and magnetic properties of C3N4 and C4N3 nanosheets have been studied using first-principles calculations. Our calculations show that C3N4 is a semiconductor and it exhibits extraordinary electronic properties such as dilute-magnetic semiconductor (with H, F, Cl, Be, V, Fe and Co); metal (with N, P, Mg and Ca), half-metal (with Li, Na, K, Al, Sc, Cr, Mn, and Cu) and semiconductor (with O, S, B, C, Si, Ti, Ni and Zn) with the band gaps in the range of 0.3-2.0 eV depending on the species of embedded atom. The calculated electronic properties reveal that C4N3 is a half-metal and it retains half-metallic character with embedded H, O, S, F, B, N, P, Be, Mg, Al, Sc, V, Fe, Ni and Zn atoms. The substitution of Cl, C, Cr and Mn atoms create ferromagnetic-metal character in the C4N3 nanosheet, embedded Co and Cu atoms exhibit a dilute-magnetic semiconductor nature, and embedded Ti atoms result in the system becoming a semiconductor. Therefore, our results reveal the fact that the band gap and magnetism can be modified or induced by various atom impurities, thus, offering effective possibilities to tune the electronic and magnetic properties of C3N4 and C4N3 nanosheets.

中文翻译:

通过嵌入的原子控制C3N4和C4N3氮化碳纳米片的电子和磁性。

在目前的工作中,已使用第一性原理研究了各种嵌入的原子杂质对C3N4和C4N3纳米片的电子和磁性性质的调节的影响。我们的计算表明,C3N4是一种半导体,并且具有非凡的电子性能,例如稀磁半导体(具有H,F,Cl,Be,V,Fe和Co);金属(含N,P,Mg和Ca),半金属(含Li,Na,K,Al,Sc,Cr,Mn和Cu)和半导体(含O,S,B,C,Si,Ti, Ni和Zn)的带隙在0.3-2.0 eV范围内,具体取决于嵌入原子的种类。计算得出的电子性质表明,C4N3是半金属,并且保留了半金属特征,并嵌入了H,O,S,F,B,N,P,Be,Mg,Al,Sc,V,Fe,Ni和Zn原子。Cl,C,Cr和Mn原子在C4N3纳米片中产生铁磁金属特性,埋入的Co和Cu原子表现出稀磁半导体性质,而埋入的Ti原子导致该系统成为半导体。因此,我们的结果揭示了一个事实,即带隙和磁性可以被各种原子杂质修饰或诱导,从而为调节C3N4和C4N3纳米片的电子和磁性提供了有效的可能性。
更新日期:2020-01-09
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