In this study, a series of NCN/BiWO (NCN = N-doped Graphitic Carbon Nitride, BiWO = Bi₂WO₆) were fabricated successfully, which were characterized by XRD, TEM, FTIR, BET, UV-vis spectrometry, XPS and PL. Under visible light irradiation, the optimum mass ratio of 60% NCN/BiWO can reach 93.1% removal efficiency of phenol within 5 h, which was about 6.9 times as that pure Bi₂WO₆. And the degradation rate constant of 60% NCN/BiWO (2.6726 min^-1) was about 18.5 times as that of pure Bi₂WO₆(0.1442 min^-1). According to the result of UV-vis absorption spectra, VB-XPS spectra and photoelectrochemistry performance, the photocatalytic mechanism of 60% NCN/BiWO were revealed, indicating that the narrow band gap of 60% NCN/BiWO is the main factor on high photocatalytic activity. The stable and recyclable properties also were done, showing highly suitable for practical application.

在这项研究中，成功​​地制造了一系列的NCN / BiWO（NCN = N掺杂的石墨碳氮化物，BiWO = Bi ₂ WO ₆），并通过XRD，TEM，FTIR，BET，UV-vis光谱，XPS和XS进行了表征。 PL。在可见光照射下，最佳质量比为60％的NCN / BiWO可以在5小时内达到93.1％的苯酚去除率，约为纯Bi ₂ WO _6的6.9倍。60％NCN / BiWO（2.6726 min ^-1）的降解速率常数约为纯Bi ₂ WO ₆（0.1442 min ^-1）的降解速率常数的18.5倍。）。根据紫外可见吸收光谱，VB-XPS光谱和光电化学性能的结果，揭示了60％NCN / BiWO的光催化机理，表明60％NCN / BiWO的窄带隙是影响高光催化性能的主要因素。活动。还实现了稳定和可回收的特性，显示出非常适合实际应用。