沉积在（3-巯基丙基）三甲氧基硅烷（MPTMS）涂层的Si衬底上的超薄金膜中的太赫兹电导率提高。,Scientific Reports

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沉积在（3-巯基丙基）三甲氧基硅烷（MPTMS）涂层的Si衬底上的超薄金膜中的太赫兹电导率提高。
Scientific Reports ( IF 3.8 ) Pub Date : 2019-10-21 , DOI: 10.1038/s41598-019-51085-0
Youjin Lee ₁ , Dasom Kim ₂ , Jeeyoon Jeong ₁ , Jugyoung Kim ₃ , Volodymyr Shmid ₄ , Oleg Korotchenkov ₄ , Parinda Vasa ₅ , Young-Mi Bahk ₃ , Dai-Sik Kim _{1,

2}

Affiliation

当将材料减薄至纳米厚度时，各种材料特性都会发生很大变化。因此，研究人员一直试图获得具有纳米厚度的均质薄膜，但是沉积均质的几纳米厚的金膜具有挑战性，因为它倾向于形成岛状而不是均质膜。近来，研究表明，用有机缓冲剂（3-巯基丙基）三甲氧基硅烷（MPTMS）处理衬底能够沉积厚度低至5 nm的超薄金膜。已经研究了MPTMS处理超薄金膜的不同方面，例如其对可见光波长下的结构和光学性能的影响。然而，在太赫兹频率下，MPTMS处理对超薄金膜电导率的影响尚待探索。这里，我们使用太赫兹时域光谱仪测量沉积在MPTMS涂层的硅基板上的纳米厚金膜的复电导率。在对衬底进行MPTMS处理后，发现与厚度小于11 nm的金膜相比，该膜的电导率与沉积在未镀膜的衬底上的电导率相比有所提高。我们观察到厚度为7 nm的金膜的电导率提高了5倍。我们还演示了在8.2 nm厚的金膜中制造纳米缝隙天线阵列的过程。带有MPTMS涂层的纳米缝隙天线在约0.5 THz的共振频率下具有44的电场增强，而没有MPTMS涂层的纳米缝隙天线则没有共振特性。

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Enhanced terahertz conductivity in ultra-thin gold film deposited onto (3-mercaptopropyl) trimethoxysilane (MPTMS)-coated Si substrates.

Various material properties change considerably when material is thinned down to nanometer thicknesses. Accordingly, researchers have been trying to obtain homogeneous thin films with nanometer thickness but depositing homogeneous few nanometers thick gold film is challenging as it tends to form islands rather than homogenous film. Recently, studies have revealed that treating the substrate with an organic buffer, (3-mercaptopropyl) trimethoxysilane (MPTMS) enables deposition of ultra-thin gold film having thickness as low as 5 nm. Different aspects of MPTMS treatment for ultra-thin gold films like its effect on the structure and optical properties at visible wavelengths have been investigated. However, the effect of the MPTMS treatment on electrical conductivity of ultra-thin gold film at terahertz frequency remains unexplored. Here, we measure the complex conductivity of nanometer-thick gold films deposited onto an MPTMS-coated silicon substrate using terahertz time-domain spectroscopy. Following the MPTMS treatment of the substrate, the conductivity of the films was found to increase compared to those deposited onto uncoated substrate for gold films having the thickness less than 11 nm. We observed 5-fold enhancement in the conductivity for a 7 nm-thick gold film. We also demonstrate the fabrication of nanoslot-antenna arrays in 8.2-nm-thick gold films. The nanoslot-antenna with MPTMS coating has resonance at around 0.5 THz with an electric field enhancement of 44, whereas the nanoslot-antenna without MPTMS coating does not show resonant properties. Our results demonstrate that gold films deposited onto MPTMS-coated silicon substrates are promising advanced materials for fabricating ultra-thin terahertz plasmonic devices.

更新日期：2019-10-21

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