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Thickness‐Dependent Refractive Index of 1L, 2L, and 3L MoS2, MoSe2, WS2, and WSe2
Advanced Optical Materials ( IF 8.0 ) Pub Date : 2019-05-06 , DOI: 10.1002/adom.201900239
Chunwei Hsu 1, 2 , Riccardo Frisenda 1 , Robert Schmidt 3 , Ashish Arora 3 , Steffen Michaelis Vasconcellos 3 , Rudolf Bratschitsch 3 , Herre S. J. der Zant 2 , Andres Castellanos‐Gomez 1
Advanced Optical Materials ( IF 8.0 ) Pub Date : 2019-05-06 , DOI: 10.1002/adom.201900239
Chunwei Hsu 1, 2 , Riccardo Frisenda 1 , Robert Schmidt 3 , Ashish Arora 3 , Steffen Michaelis Vasconcellos 3 , Rudolf Bratschitsch 3 , Herre S. J. der Zant 2 , Andres Castellanos‐Gomez 1
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An interesting aspect of 2D materials is the change of their electronic structure with the reduction of thickness. Molybdenum and tungsten‐based transition metal dichalcogenides form an important family of 2D materials, whose members show a thickness‐dependent bandgap and strong light–matter interaction. In this work, the experimental determination of the complex refractive index of 1‐, 2‐, 3‐layer thick MoS2, MoSe2, WS2, and WSe2 in the range from 400 to 850 nm of the electromagnetic spectrum is reported by using microreflectance spectroscopy and combined with calculations based on the Fresnel equations. It is further provided a comparison with the bulk refractive index values reported in the literature and a discussion of the difference/similarity between our work and the monolayer refractive index available from the literature, finding that the results from different techniques are in good agreement.
中文翻译:
MoS2,MoSe2,WS2和WSe2的1L,2L和3L厚度依赖性折射率
2D材料的一个有趣的方面是其电子结构随厚度的减小而变化。钼和钨基过渡金属二硫化碳形成了重要的二维材料族,其成员显示出与厚度有关的带隙和强烈的光-物质相互作用。在这项工作中,实验确定了1、2、3层厚的MoS 2,MoSe 2,WS 2和WSe 2的复折射率通过使用微反射光谱法,并结合基于菲涅耳方程的计算,报告了在400至850 nm范围内的电磁光谱。它进一步提供了与文献中报道的整体折射率值的比较,并讨论了我们的工作与文献中可获得的单层折射率之间的差异/相似性,发现来自不同技术的结果非常吻合。
更新日期:2019-05-06
中文翻译:

MoS2,MoSe2,WS2和WSe2的1L,2L和3L厚度依赖性折射率
2D材料的一个有趣的方面是其电子结构随厚度的减小而变化。钼和钨基过渡金属二硫化碳形成了重要的二维材料族,其成员显示出与厚度有关的带隙和强烈的光-物质相互作用。在这项工作中,实验确定了1、2、3层厚的MoS 2,MoSe 2,WS 2和WSe 2的复折射率通过使用微反射光谱法,并结合基于菲涅耳方程的计算,报告了在400至850 nm范围内的电磁光谱。它进一步提供了与文献中报道的整体折射率值的比较,并讨论了我们的工作与文献中可获得的单层折射率之间的差异/相似性,发现来自不同技术的结果非常吻合。
