To synthesize large-area graphene single crystals, we specifically designed a low-pressure chemical vapor deposition (LPCVD) reactor with confined reaction space (L 22 mm × W 13 mm × H 50 μm). Within the confined reaction space, a uniform distribution of reactant concentrations, reduced substrate roughness, and the shift of growth kinetics toward a diffusion-limited regime can be achieved, favoring the preparation of large-area, high-quality graphene single crystals. The gas flow field and mass transport pattern of reactants in the LPCVD system simulated with a finite element method support the advantages of using this confined reaction room for graphene growth. Using this space-confined reactor together with the optimized synthesis parameters, we obtained monolayer, highly uniform, and defect-free graphene single crystals of up to ∼0.8 mm in diameter with the field-effect mobility of μ_EF ∼ 4800 cm² V^–1 s^–1 at room temperature. In addition, structural design of the confined reaction space by adjusting the reactor’s dimensions is of facile controllability and scalability, which demonstrates the superiority and preference of this method for industrial applications.

中文翻译：

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扩散驱动化学气相沉积法在受限反应空间中生长大面积石墨烯单晶

为了合成大面积石墨烯单晶，我们专门设计了具有受限反应空间（L 22 mm×W 13 mm×H 50μm）的低压化学气相沉积（LPCVD）反应器。在受限的反应空间内，可以实现反应物浓度的均匀分布，降低的基材粗糙度以及生长动力学向扩散受限机制的转移，这有利于制备大面积，高质量的石墨烯单晶。用有限元方法模拟的LPCVD系统中反应物的气体流场和传质模式支持使用该受限反应室进行石墨烯生长的优势。使用该空间受限的反应器以及优化的合成参数，我们获得了单层，高度均匀且无缺陷的石墨烯单晶，其单晶可达〜0。_EF〜4800厘米² V ^-1小号^-1在室温下。另外，通过调节反应器的尺寸来对受限反应空间进行结构设计具有可控性和可扩展性，这证明了该方法在工业应用中的优越性和偏爱性。