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N5– in Solution: Isotopic Labeling and Further Details of Its Synthesis by Phenyl Pentazole Reduction
The Journal of Physical Chemistry A ( IF 2.7 ) Pub Date : 2017-08-31 00:00:00 , DOI: 10.1021/acs.jpca.7b04222 Boris Bazanov 1 , Uzi Geiger 1 , Dan Grinstein 1 , Shmuel Welner 1 , Yehuda Haas 1
The Journal of Physical Chemistry A ( IF 2.7 ) Pub Date : 2017-08-31 00:00:00 , DOI: 10.1021/acs.jpca.7b04222 Boris Bazanov 1 , Uzi Geiger 1 , Dan Grinstein 1 , Shmuel Welner 1 , Yehuda Haas 1
Affiliation
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The cyclopentazolate anion, N5–, has been researched extensively over the years and detected in the gas phase more than a decade ago, but was only recently measured in solution. The process whereby aryl pentazole reduction leads to the production of N5– is still not fully understood. Here, the production of N5– in solution was investigated using isotopic labeling techniques while implementing changes to the synthesis methodologies. 15N labeled phenyl pentazole produced appropriately labeled phenyl pentazole radical anions and N5– which, upon collision induced dissociation, produced the expected N3– signals. Changing to higher purity solvent and less coated Na metal allowed for a much more rapid pace, with experiments taking less time. However, the best yields were obtained with heavily coated metal and much longer reaction times. Utilization of a vacuum line and ultrapure solvents led to no products being detected, indicating the importance of a sodium passivation layer in this reaction and the possibility that sodium is too strong a reducer. These findings can lead to better production methods of N5– and also explain past failures in implementing aryl pentazole reduction techniques.
中文翻译：
Ñ 5 -在解决方案：同位素标记和被苯基五唑还原的合成的进一步的细节
的cyclopentazolate阴离子，N 5 - ，已被广泛多年来研究和在气相超过十年前检测到的，但只在最近溶液中测得。由此芳基五唑还原导致产生N的过程5 -仍然没有完全理解。这里，N的生产5 -在溶液中使用同位素标记技术，同时执行改变到合成方法进行了研究。15 Ñ标记苯基五唑产生适当标记的苯基五唑自由基阴离子和N 5 - ，其在碰撞诱导解离，产生所期望的N 3 - signals. Changing to higher purity solvent and less coated Na metal allowed for a much more rapid pace, with experiments taking less time. However, the best yields were obtained with heavily coated metal and much longer reaction times. Utilization of a vacuum line and ultrapure solvents led to no products being detected, indicating the importance of a sodium passivation layer in this reaction and the possibility that sodium is too strong a reducer. These findings can lead to better production methods of N5– and also explain past failures in implementing aryl pentazole reduction techniques.
更新日期：2017-08-31
中文翻译：
Ñ 5 -在解决方案：同位素标记和被苯基五唑还原的合成的进一步的细节
的cyclopentazolate阴离子，N 5 - ，已被广泛多年来研究和在气相超过十年前检测到的，但只在最近溶液中测得。由此芳基五唑还原导致产生N的过程5 -仍然没有完全理解。这里，N的生产5 -在溶液中使用同位素标记技术，同时执行改变到合成方法进行了研究。15 Ñ标记苯基五唑产生适当标记的苯基五唑自由基阴离子和N 5 - ，其在碰撞诱导解离，产生所期望的N 3 - signals. Changing to higher purity solvent and less coated Na metal allowed for a much more rapid pace, with experiments taking less time. However, the best yields were obtained with heavily coated metal and much longer reaction times. Utilization of a vacuum line and ultrapure solvents led to no products being detected, indicating the importance of a sodium passivation layer in this reaction and the possibility that sodium is too strong a reducer. These findings can lead to better production methods of N5– and also explain past failures in implementing aryl pentazole reduction techniques.
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