Impact of Microstructure on MoS2 Oxidation and Friction,ACS Applied Materials & Interfaces

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Impact of Microstructure on MoS2 Oxidation and Friction
ACS Applied Materials & Interfaces ( IF 8.3 ) Pub Date : 2017-08-08 00:00:00 , DOI: 10.1021/acsami.7b06917
John F. Curry ₁ , Mark A. Wilson ₁ , Henry S. Luftman , Nicholas C. Strandwitz , Nicolas Argibay ₁ , Michael Chandross ₁ , Mark A. Sidebottom , Brandon A. Krick

Affiliation

This work demonstrates the role of microstructure in the friction and oxidation behavior of the lamellar solid lubricant molybdenum disulfide (MoS₂). We report on systematic investigations of oxidation and friction for two MoS₂ films with distinctively different microstructures—amorphous and planar/highly-ordered—before and after exposure to atomic oxygen (AO) and high-temperature (250 °C) molecular oxygen. A combination of experimental tribology, molecular dynamics simulations, X-ray photoelectron spectroscopy (XPS), and high-sensitivity low-energy ion scattering (HS-LEIS) was used to reveal new insights about the links between structure and properties of these widely utilized low-friction materials. Initially, ordered MoS₂ films showed a surprising resistance to both atomic and molecular oxygens (even at elevated temperature), retaining characteristic low friction after exposure to extreme oxidative environments. XPS shows comparable oxidation of both coatings via AO; however, monolayer resolved compositional depth profiles from HS-LEIS reveal that the microstructure of the ordered coatings limits oxidation to the first atomic layer.

中文翻译：

微观结构对MoS ₂氧化和摩擦的影响

这项工作证明了微结构在层状固体润滑剂二硫化钼（MoS ₂）的摩擦和氧化行为中的作用。我们报告了在暴露于原子氧（AO）和高温（250°C）分子氧之前和之后，两种具有明显不同的微观结构（非晶态和平面/高度有序）的MoS ₂膜的氧化和摩擦的系统研究。实验摩擦学，分子动力学模拟，X射线光电子能谱（XPS）和高灵敏度低能离子散射（HS-LEIS）的结合被用于揭示关于这些被广泛利用的结构与性质之间的联系的新见解。低摩擦材料。最初，订购了MoS ₂薄膜对原子和分子氧（即使在高温下）也表现出令人惊讶的抗性，即使暴露于极端的氧化环境下，仍能保持低摩擦特性。XPS显示通过AO两种涂层的可比氧化；然而，HS-LEIS的单层解析成分深度分布图表明，有序涂层的微观结构将氧化限制在第一原子层。

更新日期：2017-08-08

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