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Understanding the Oxidative Stability of Antifouling Polymer Brushes
Langmuir ( IF 3.7 ) Pub Date : 2017-07-10 00:00:00 , DOI: 10.1021/acs.langmuir.7b01681
Yong Du 1 , Jingyao Gao 1 , Tingting Chen 1 , Chao Zhang 1 , Jian Ji 1 , Zhi-Kang Xu 1
Affiliation  

Poly(oligoethylene glycol methacrylate) (POEGMA) and zwitterionic polymer brushes have been widely used for constructing biocompatible or antifouling surfaces, and their oxidative stability is very important to the practical application. Herein, POEGMA, poly(sulfobetaine methacrylate) (PSBMA), poly(2-(methacryloyloxy)ethyl phosphorylcholine) (PMPC), and poly(carboxybetaine methacrylate) (PCBMA) were grafted on quartz crystal microbalance (QCM) chips via surface-initiated atom transfer radical polymerization (SI-ATRP). XPS and MS analyses demonstrate that the mass loss of these polymer brushes in oxidative environment is due to the scission of the polymer-anchoring segments. Molecular simulation further illustrates this mass loss mechanism should be always true for those polymer brushes anchored on different substrates. In situ QCM monitoring indicates that, compared with zwitterionic polymethacrylates, POEGMA brushes show the lowest mass loss rate mainly due to their cross-linked structures. This study sheds light on the contradictory reports about the oxidative stability of POEGMA and zwitterionic polymethacrylate brushes up to now, and highlights the important role of the polymer-anchoring segments playing in the oxidative stability of polymer brushes.

中文翻译:

了解防污聚合物刷的氧化稳定性

聚(甲基丙烯酸低聚乙二醇酯)(POEGMA)和两性离子聚合物刷已被广泛用于构建生物相容性或防污表面,其氧化稳定性对实际应用非常重要。本文将POEGMA,聚甲基磺基甜菜碱(PSBMA),聚(2-(甲基丙烯酰氧基)乙基磷酰胆碱)(PMPC)和聚甲基丙烯酸羧基甜菜碱(PCBMA)通过表面引发接枝到石英微天平(QCM)芯片上原子转移自由基聚合(SI-ATRP)。XPS和MS分析表明,在氧化环境中这些聚合物刷的质量损失是由于聚合物固定链段的断裂所致。分子模拟进一步说明,对于那些锚定在不同基材上的聚合物刷,这种质量损失机制应始终正确。现场QCM监测表明,与两性离子聚甲基丙烯酸酯相比,POEGMA刷显示出最低的质量损失率,这主要是由于它们的交联结构。这项研究揭示了迄今为止有关POEGMA和两性离子聚甲基丙烯酸酯刷子的氧化稳定性的矛盾报道,并强调了聚合物固定段在聚合物刷子的氧化稳定性中的重要作用。
更新日期:2017-07-11
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