Subvalent Iridium Precursors for Atom-Efficient Chemical Vapor Deposition of Ir and IrO2 Thin Films,Organometallics

当前位置： X-MOL 学术 › Organometallics › 论文详情

Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)

Subvalent Iridium Precursors for Atom-Efficient Chemical Vapor Deposition of Ir and IrO2 Thin Films
Organometallics ( IF 2.5 ) Pub Date : 2017-06-02 00:00:00 , DOI: 10.1021/acs.organomet.7b00275
Lasse Jürgensen ₁ , Michael Frank ₁ , Myeongwhun Pyeon ₁ , Lisa Czympiel ₁ , Sanjay Mathur ₁

Affiliation

A new heteroleptic Ir(I) compound exhibiting high volatility and defined thermal decomposition under CVD conditions is reported. The new iridium precursor [(COD)Ir(ThTFP)] (COD = cyclooctadiene, ThTFP = (Z)-3,3,3-trifluoro-1-(thiazol-2-yl)prop-1-en-2-olate) unifies both reactivity and sufficient stability through its heteroleptic constitution to provide a precise control over compositional purity in CVD deposits. The solution integrity of the monomeric Ir(I) complex was investigated by 1D and 2D NMR spectroscopy and EI mass spectrometry, whereas the molecular structure was confirmed by single-crystal diffraction. CVD experiments demonstrated the suitability of the iridium compound for an atom-efficient (high molecule-to-precursor yield) gas-phase deposition of nanocrystalline iridium films that could be converted into crystalline iridium dioxide upon heat treatment to demonstrate their electrocatalytic potential in the oxygen evolution reaction.

中文翻译：

亚原子铱前驱体用于Ir和IrO ₂薄膜的原子有效化学气相沉积

报道了一种新的杂合Ir（I）化合物，该化合物在CVD条件下具有高挥发性和确定的热分解特性。新的铱前体[（COD）Ir（ThTFP）]（COD =环辛二烯，ThTFP =（Z）-3,3,3-三氟-1-（噻唑-2-基）丙-1-烯-2-醇酸酯）通过其杂配体结构兼具反应性和足够的稳定性，可精确控制CVD沉积物中的成分纯度。通过1D和2D NMR光谱和EI质谱研究单体Ir（I）配合物的溶液完整性，而单晶衍射证实了分子结构。CVD实验证明铱化合物适用于纳米晶铱膜的原子有效（分子到前体产率高）气相沉积，可以通过热处理将其转化为结晶二氧化铱，以证明其在氧气中的电催化潜力进化反应。

更新日期：2017-06-03

点击分享查看原文

点击收藏

阅读更多本刊新发论文本刊介绍/投稿指南