高温下3-氨基丙基硅烷偶联剂在二氧化硅和硅酸盐表面上的水解稳定性,ACS Applied Materials & Interfaces

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高温下3-氨基丙基硅烷偶联剂在二氧化硅和硅酸盐表面上的水解稳定性
ACS Applied Materials & Interfaces ( IF 8.3 ) Pub Date : 2017-02-22 00:00:00 , DOI: 10.1021/acsami.6b14343
Denis V. Okhrimenko ₁ , Akin Budi ₁ , Marcel Ceccato ₁ , Marité Cárdenas _{1,

2} , Dorte B. Johansson ₃ , Dorthe Lybye ₃ , Klaus Bechgaard ₁ , Martin P. Andersson ₁ , Susan L. S. Stipp ₁

Affiliation

3-氨基丙基硅烷（APS）偶联剂广泛用于工业，生物材料和医学应用中，以提高聚合物与无机材料的粘合力。但是，在暴露于高温和高温的环境中，沉积的APS层会分解，导致耦合效率降低，从而降低了产品质量和聚合物-无机材料界面的机械强度。因此，需要对无机表面上APS的化学状态和稳定性有更好的了解。在这项工作中，我们研究了APS在二氧化硅晶片上的附着力，并将其性能与复杂的硅酸盐表面（例如工业上使用的矿物纤维和纤维熔体晶片）的性能进行了比较。APS由水性和有机（甲苯）溶液沉积而成，并通过表面敏感技术进行了研究，包括X射线光电子能谱（XPS），原子力显微镜（AFM），流动电势，接触角和椭圆偏振光谱。使用密度泛函理论（DFT）模拟了模型二氧化硅表面在一定覆盖范围内的APS配置。我们还研究了在高湿度和高温下老化过程中吸附的APS的稳定性。我们的结果表明，APS层的形成取决于沉积所用溶剂和基材的选择。在甲苯中的二氧化硅表面上，APS形成了不稳定的多层，而从水溶液中产生了更薄，更稳定的APS层。化学成分和基材粗糙度会影响APS的沉积量。沉积了更多的APS，其在纤维熔体上的层比在硅片上更稳定。吸附的APS量的变化可以通过流电势成功地监控。这些结果将有助于改善工业和实验室规模的APS沉积方法，并提高附着力和稳定性，从而提高将APS用作偶联剂的材料的质量和有效性。

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Hydrolytic Stability of 3-Aminopropylsilane Coupling Agent on Silica and Silicate Surfaces at Elevated Temperatures

3-Aminopropylsilane (APS) coupling agent is widely used in industrial, biomaterial, and medical applications to improve adhesion of polymers to inorganic materials. However, during exposure to elevated humidity and temperature, the deposited APS layers can decompose, leading to reduction in coupling efficiency, thus decreasing the product quality and the mechanical strength of the polymer–inorganic material interface. Therefore, a better understanding of the chemical state and stability of APS on inorganic surfaces is needed. In this work, we investigated APS adhesion on silica wafers and compared its properties with those on complex silicate surfaces such as those used by industry (mineral fibers and fiber melt wafers). The APS was deposited from aqueous and organic (toluene) solutions and studied with surface sensitive techniques, including X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), streaming potential, contact angle, and spectroscopic ellipsometry. APS configuration on a model silica surface at a range of coverages was simulated using density functional theory (DFT). We also studied the stability of adsorbed APS during aging at high humidity and elevated temperature. Our results demonstrated that APS layer formation depends on the choice of solvent and substrate used for deposition. On silica surfaces in toluene, APS formed unstable multilayers, while from aqueous solutions, thinner and more stable APS layers were produced. The chemical composition and substrate roughness influence the amount of deposited APS. More APS was deposited and its layers were more stable on fiber melt than on silica wafers. The changes in the amount of adsorbed APS can be successfully monitored by streaming potential. These results will aid in improving industrial- and laboratory-scale APS deposition methods and increasing adhesion and stability, thus increasing the quality and effectiveness of materials where APS is used as a coupling agent.

更新日期：2017-02-22

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