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Byproduct-Free Route to Aminosiloxane Monolayers on Silicon/Silicon Dioxide
Langmuir ( IF 3.7 ) Pub Date : 2017-02-07 00:00:00 , DOI: 10.1021/acs.langmuir.6b04415 Kiran Khadka 1 , Nicholas C. Strandwitz 1 , Gregory S. Ferguson 1
Langmuir ( IF 3.7 ) Pub Date : 2017-02-07 00:00:00 , DOI: 10.1021/acs.langmuir.6b04415 Kiran Khadka 1 , Nicholas C. Strandwitz 1 , Gregory S. Ferguson 1
Affiliation
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The chemisorption of N-methyl-aza-2,2,4-trimethylsilacyclopentane from either the solution or the vapor phase produces monolayer films on silicon (oxide) substrates. The formation of a covalent siloxane linkage to the surface by this adsorbate is accompanied by ring opening, which produces no byproduct. The resulting secondary amine reacts with maleic anhydride to produce a carboxylic acid-terminated surface, accompanied by the formation of a stable amide bond. These reactions and their products were characterized by a combination of optical ellipsometry, contact-angle goniometry, and X-ray photoelectron spectroscopy.
中文翻译：
硅/二氧化硅上氨基硅氧烷单层的无副产物途径
N-甲基-氮杂-2,2,4-三甲基硅环戊烷从溶液或气相中的化学吸附在硅（氧化物）基底上产生单层膜。通过该吸附物在表面上形成共价硅氧烷键，伴随着开环，该开环不产生副产物。所得的仲胺与马来酸酐反应以产生羧酸封端的表面，同时形成稳定的酰胺键。这些反应及其产物的特征在于光学椭圆偏振法，接触角测角法和X射线光电子能谱。
更新日期：2017-02-07
中文翻译：
硅/二氧化硅上氨基硅氧烷单层的无副产物途径
N-甲基-氮杂-2,2,4-三甲基硅环戊烷从溶液或气相中的化学吸附在硅（氧化物）基底上产生单层膜。通过该吸附物在表面上形成共价硅氧烷键，伴随着开环，该开环不产生副产物。所得的仲胺与马来酸酐反应以产生羧酸封端的表面，同时形成稳定的酰胺键。这些反应及其产物的特征在于光学椭圆偏振法，接触角测角法和X射线光电子能谱。
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