Polymeric Photocatalysts Based on Graphitic Carbon Nitride,Advanced Materials

当前位置： X-MOL 学术 › Adv. Mater. › 论文详情

Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)

Polymeric Photocatalysts Based on Graphitic Carbon Nitride
Advanced Materials ( IF 27.4 ) Pub Date : 2015-02-20 , DOI: 10.1002/adma.201500033
Shaowen Cao ₁ , Jingxiang Low ₁ , Jiaguo Yu _{1,

2} , Mietek Jaroniec ₃

Affiliation

Semiconductor‐based photocatalysis is considered to be an attractive way for solving the worldwide energy shortage and environmental pollution issues. Since the pioneering work in 2009 on graphitic carbon nitride (g‐C₃N₄) for visible‐light photocatalytic water splitting, g‐C₃N₄‐based photocatalysis has become a very hot research topic. This review summarizes the recent progress regarding the design and preparation of g‐C₃N₄‐based photocatalysts, including the fabrication and nanostructure design of pristine g‐C₃N₄, bandgap engineering through atomic‐level doping and molecular‐level modification, and the preparation of g‐C₃N₄‐based semiconductor composites. Also, the photocatalytic applications of g‐C₃N₄‐based photocatalysts in the fields of water splitting, CO₂ reduction, pollutant degradation, organic syntheses, and bacterial disinfection are reviewed, with emphasis on photocatalysis promoted by carbon materials, non‐noble‐metal cocatalysts, and Z‐scheme heterojunctions. Finally, the concluding remarks are presented and some perspectives regarding the future development of g‐C₃N₄‐based photocatalysts are highlighted.

中文翻译：

石墨碳氮化物的聚合物光催化剂

基于半导体的光催化被认为是解决全球能源短缺和环境污染问题的一种有吸引力的方法。自2009年在用于可见光光催化水分解的石墨氮化碳（g‐C ₃ N ₄）方面的开创性工作以来，基于g‐C ₃ N ₄的光催化已成为非常热门的研究主题。这篇综述总结了基于g‐C ₃ N ₄的光催化剂的设计和制备的最新进展，包括原始g‐C ₃ N ₄的制备和纳米结构设计，通过原子级掺杂和分子级修饰的带隙工程，以及g‐C的制备₃ N ₄基半导体复合材料。此外，还综述了基于g‐C ₃ N ₄的光催化剂在水分解，CO ₂还原，污染物降解，有机合成和细菌消毒等领域的光催化应用，重点是由碳材料促进的光催化，非贵金属金属助催化剂和Z型异质结。最后，总结性发言，重点介绍了基于g‐C ₃ N ₄的光催化剂的未来发展前景。

更新日期：2015-02-20

点击分享查看原文

点击收藏

阅读更多本刊新发论文本刊介绍/投稿指南