Center for Artificial Low Dimensional Electronic Systems; Institute for Basic Science (IBS); 37673 South Korea
Division of Advanced Materials Science; Pohang University of Science and Technology (POSTECH); Pohang 37673 South Korea
Department of Physics; Harvard University; Cambridge MA 02138 USA
Advanced Materials Laboratory; National Institute for Materials Science; 1-1 Namiki Tsukuba 305-0044 Japan
Department of Materials Science and Engineering and Division of Advanced Materials Science; Pohang University of Science and Technology (POSTECH); Pohang 37673 South Korea
Different growth mechanisms of van der Waals heteroepitaxial 2D Bi2Te3/Sb2Te3 stacking by choosing different substrates are reported. Sequential Bi2Te3/Sb2Te3 stacking growth mode becomes layer‐by‐layer growth on h‐BN substrates, and 3D island growth on SiO2/Si. Compressive strain in the h‐BN substrates imposed by the lattice mismatch plays a crucial role to determine different growth modes in these 2D nucleation kinetics models.
中文翻译:
范德华异质外延法连续堆叠很少层的Bi2Te3 / Sb2Te3时,Frank–van der Merwe增长与Volmer–Weber增长的关系:有限晶格与种子基质不匹配的关键作用
通过选择不同的衬底,报道了范德华异质外延2D Bi 2 Te 3 / Sb 2 Te 3堆叠的不同生长机理。依次的Bi 2 Te 3 / Sb 2 Te 3堆叠生长模式在h ‐BN衬底上变为逐层生长,在SiO 2 / Si上变为3D岛生长。由晶格失配引起的h- BN衬底中的压缩应变对于确定这些二维成核动力学模型中的不同生长模式起着至关重要的作用。