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12-Spin-Qubit Arrays Fabricated on a 300 mm Semiconductor Manufacturing Line
Nano Letters ( IF 9.6 ) Pub Date : 2024-12-25 , DOI: 10.1021/acs.nanolett.4c05205 Hubert C. George, Mateusz T. Mądzik, Eric M. Henry, Andrew J. Wagner, Mohammad M. Islam, Felix Borjans, Elliot J. Connors, J. Corrigan, Matthew Curry, Michael K. Harper, Daniel Keith, Lester Lampert, Florian Luthi, Fahd A. Mohiyaddin, Sandra Murcia, Rohit Nair, Rambert Nahm, Aditi Nethwewala, Samuel Neyens, Bishnu Patra, Roy D. Raharjo, Carly Rogan, Rostyslav Savytskyy, Thomas F. Watson, Josh Ziegler, Otto K. Zietz, Stefano Pellerano, Ravi Pillarisetty, Nathaniel C. Bishop, Stephanie A. Bojarski, Jeanette Roberts, James S. Clarke
Nano Letters ( IF 9.6 ) Pub Date : 2024-12-25 , DOI: 10.1021/acs.nanolett.4c05205 Hubert C. George, Mateusz T. Mądzik, Eric M. Henry, Andrew J. Wagner, Mohammad M. Islam, Felix Borjans, Elliot J. Connors, J. Corrigan, Matthew Curry, Michael K. Harper, Daniel Keith, Lester Lampert, Florian Luthi, Fahd A. Mohiyaddin, Sandra Murcia, Rohit Nair, Rambert Nahm, Aditi Nethwewala, Samuel Neyens, Bishnu Patra, Roy D. Raharjo, Carly Rogan, Rostyslav Savytskyy, Thomas F. Watson, Josh Ziegler, Otto K. Zietz, Stefano Pellerano, Ravi Pillarisetty, Nathaniel C. Bishop, Stephanie A. Bojarski, Jeanette Roberts, James S. Clarke
Intel’s efforts to build a practical quantum computer are focused on developing a scalable spin-qubit platform leveraging industrial high-volume semiconductor manufacturing expertise and 300 mm fabrication infrastructure. Here, we provide an overview of the design, fabrication, and demonstration of a new customized quantum test chip, which contains 12-quantum-dot spin-qubit linear arrays, code named Tunnel Falls. These devices are fabricated using immersion and extreme ultraviolet lithography (EUV), along with other standard high-volume manufacturing (HVM) processes as well as production-level process control. We present key device features and fabrication details as well as qubit characterization results confirming device functionality. These results corroborate our fabrication methods and are a crucial step toward scaling of extensible 2D qubit array schemes.
中文翻译:
在 300 mm 半导体生产线上制造的 12 自旋量子比特阵列
英特尔致力于构建实用的量子计算机,重点是利用工业大批量半导体制造专业知识和 300 毫米制造基础设施开发可扩展的自旋量子比特平台。在这里,我们概述了一种新的定制量子测试芯片的设计、制造和演示,该芯片包含 12 量子点自旋量子比特线性阵列,代号为 Tunnel Falls。这些器件采用浸没式和极紫外光刻 (EUV) 以及其他标准大批量制造 (HVM) 工艺以及生产级工艺控制制造。我们介绍了关键器件特性和制造细节,以及确认器件功能的量子比特表征结果。这些结果证实了我们的制造方法,是扩展可扩展 2D 量子比特阵列方案的关键一步。
更新日期:2024-12-26
中文翻译:
在 300 mm 半导体生产线上制造的 12 自旋量子比特阵列
英特尔致力于构建实用的量子计算机,重点是利用工业大批量半导体制造专业知识和 300 毫米制造基础设施开发可扩展的自旋量子比特平台。在这里,我们概述了一种新的定制量子测试芯片的设计、制造和演示,该芯片包含 12 量子点自旋量子比特线性阵列,代号为 Tunnel Falls。这些器件采用浸没式和极紫外光刻 (EUV) 以及其他标准大批量制造 (HVM) 工艺以及生产级工艺控制制造。我们介绍了关键器件特性和制造细节,以及确认器件功能的量子比特表征结果。这些结果证实了我们的制造方法,是扩展可扩展 2D 量子比特阵列方案的关键一步。