The swift progression of technology in electronic fabrication is adhering to a trend of miniaturization, descending to the nanoscale. Surface contaminants, such as nanoparticles, can influence the performance of silicon wafers, thereby necessitating the evolution of novel cleaning methodologies. Surface nanobubbles (SNs) are phenomena that have attracted considerable attention over the past decade. A salient feature of SNs is their capacity to eliminate nanoparticles from silicon wafers. In this Perspective, our objective is to scrutinize whether this capability can be unequivocally ascribed to SNs. Initially, we offer a succinct elucidation of the nature of SNs; subsequently, we evaluate the claims regarding the cleaning efficacy of SNs; finally, we present our interpretation of the operative forces and propose potential scenarios of the interaction between SNs and nanoparticles. Consequently, the aim of this Perspective is to emphasize the significance of comprehending the interaction between SNs and nanoparticles with the intent to delineate new research trajectories bearing both fundamental and industrial ramifications.

中文翻译：

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通过溶剂-水交换产生的表面纳米气泡去除纳米颗粒：批判性观点


电子制造技术的快速发展正顺应小型化趋势，下降到纳米级。表面污染物（如纳米颗粒）会影响硅晶片的性能，因此需要发展新的清洁方法。表面纳米气泡 （SNs） 是在过去十年中引起广泛关注的现象。SN 的一个显着特征是它们能够从硅晶片中消除纳米颗粒。在这个视角中，我们的目标是仔细检查这种能力是否可以明确地归因于 SN。最初，我们对 SN 的性质进行了简要的阐述;随后，我们评估了有关 SNs 清洁功效的声明;最后，我们提出了我们对操作力的解释，并提出了 SNs 和纳米粒子之间相互作用的潜在情况。因此，本观点的目的是强调理解 SNs 和纳米颗粒之间相互作用的重要性，以描绘具有基础和工业影响的新研究轨迹。